Abstract: An alternating stack of insulating layers and electrically conductive layers, a retro-stepped dielectric material portion overlying stepped surfaces of the alternating stack, and memory stack structures extending through the alternating stack are formed over a substrate. A patterned etch mask layer including discrete openings is formed thereabove. Via cavities through an upper region of the retro-stepped dielectric material portion by performing a first anisotropic etch process. Metal plates are selectively formed on physically exposed surfaces of a first subset of the electrically conductive layers by a selective metal deposition process. A subset of the via cavities without any metal plates therein are vertically extended downward by performing a second anisotropic etch process while the metal plates protect underlying electrically conductive layers. Via cavities can be formed without punching through electrically conductive layers.

Abstract: A method of manufacturing non-yellowing polyurethane shoe soles which comprises coating a non-yellowing polyurethane composition on the inner surface of a mould for shaping soles, subsequently casting a foamable polyurethane composition into the mould, and curing the compositions, whereby a non-yellowing polyurethane outer layer and a foamed polyurethane sole base are formed and integrally united together to give the shoe sole; and non-yellowing shoe soles thus obtained.