Patents by Inventor Junko Anzai

Junko Anzai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHOD FOR PRODUCING FLUORINE-CONTAINING POLYMER, AQUEOUS DISPERSION LIQUID, AND FLUORINE-CONTAINING POLYMER COMPOSITION
    Publication number: 20210403623
    Abstract: To provide a method for producing a fluorinated polymer which does not require an emulsifier as an essential component while an aqueous medium with little environmental burden is used.
    Type: Application
    Filed: September 9, 2021
    Publication date: December 30, 2021
    Applicant: AGC Inc.
    Inventors: Kosuke SHIBASAKI, Yukiko HATTORI, Shinya HIGUCHI, Junko ANZAI
  • Polishing agent, polishing method, and manufacturing method of semiconductor integrated circuit device
    Patent number: 9328261
    Abstract: A first polishing agent contains: cerium oxide particles; and water, wherein, in IR spectrum of the cerium oxide particle, a value A found by a formula below from a ratio (I/I?) between a value I of an absorbance of 3566 cm?1 and a value I? of an absorbance of 3695 cm?1, and a crystallite diameter XS, is 0.08 or less. A=(I/I?)/XS A second polishing agent contains: cerium oxide particles; and water, wherein, in the cerium oxide particle, a deviation B of a lattice constant found by a formula below from a theoretical lattice constant (a?) and a lattice constant (a) measured by powder X-ray diffraction, is ?0.16% or more.
    Type: Grant
    Filed: December 11, 2014
    Date of Patent: May 3, 2016
    Assignee: ASAHI GLASS COMPANY, LIMITED
    Inventors: Yuiko Yoshida, Iori Yoshida, Junko Anzai
  • POLISHING AGENT, POLISHING METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
    Publication number: 20150175848
    Abstract: A first polishing agent contains: cerium oxide particles; and water, wherein, in IR spectrum of the cerium oxide particle, a value A found by a formula below from a ratio (I/I?) between a value I of an absorbance of 3566 cm?1 and a value I? of an absorbance of 3695 cm?1, and a crystallite diameter XS, is 0.08 or less. A=(I/I?)/XS A second polishing agent contains: cerium oxide particles; and water, wherein, in the cerium oxide particle, a deviation B of a lattice constant found by a formula below from a theoretical lattice constant (a?) and a lattice constant (a) measured by powder X-ray diffraction, is ?0.16% or more.
    Type: Application
    Filed: December 11, 2014
    Publication date: June 25, 2015
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Yuiko YOSHIDA, Iori Yoshida, Junko Anzai