Abstract: A positioning method and device, the method including: extracting multiple light spots from a current image frame, wherein the current image frame is an image currently collected by an extended reality device; determining an interference light spot in the multiple light spots according to information about a historical interference light spot, and removing the interference light spot in the multiple light spots, recognizing whether there is a light spot of a luminous light source in remaining light spots after removing the interference light spot, wherein the luminous light source is a light source set on a human-computer interaction apparatus, and the human-computer interaction apparatus is used for a user to interact with the extended reality device; determining a current pose of the human-computer interaction apparatus according to the light spot of the luminous light source recognized in the remaining light spots.

Abstract: A method for processing a workpiece, a plasma processing apparatus and a semiconductor device are provided. The method includes placing a workpiece including a spacer layer on a workpiece support in a chamber; selecting a composition modulation gas to modulate a volume ratio of carbon and fluorine to process the workpiece, the composition modulation gas includes one or more molecules, the volume ratio of carbon and fluorine is indicative of a distribution of carbon-based polymer deposited on the spacer layer; generating one or more species using one or more plasmas from a process gas to create a mixture, the process gas includes an etching gas and the composition modulation gas; and exposing the workpiece to the mixture to form a polymer layer on at least a portion of the spacer layer and to etch at least a portion of the spacer layer.

Abstract: A positioning method and device, the method including: extracting multiple light spots from a current image frame, wherein the current image frame is an image currently collected by an extended reality device; determining an interference light spot in the multiple light spots according to information about a historical interference light spot, and removing the interference light spot in the multiple light spots, recognizing whether there is a light spot of a luminous light source in remaining light spots after removing the interference light spot, wherein the luminous light source is a light source set on a human-computer interaction apparatus, and the human-computer interaction apparatus is used for a user to interact with the extended reality device; determining a current pose of the human-computer interaction apparatus according to the light spot of the luminous light source recognized in the remaining light spots.

Abstract: A method for processing a workpiece, a plasma processing apparatus and a semiconductor device are provided. The method includes placing a workpiece including a spacer layer on a workpiece support in a chamber; selecting a composition modulation gas to modulate a volume ratio of carbon and fluorine to process the workpiece, the composition modulation gas includes one or more molecules, the volume ratio of carbon and fluorine is indicative of a distribution of carbon-based polymer deposited on the spacer layer; generating one or more species using one or more plasmas from a process gas to create a mixture, the process gas includes an etching gas and the composition modulation gas; and exposing the workpiece to the mixture to form a polymer layer on at least a portion of the spacer layer and to etch at least a portion of the spacer layer.

Abstract: A pressure control system is provided. The pressure control system includes a member at least partially positioned within a pumping port fluidly coupled between a multi-head processing chamber and a pump configured to evacuate gases from the multi-head processing chamber. The member is rotatable relative to the pumping port. The pressure control system includes a plurality of pressure sensors. Each of the pressure sensors is configured to obtain data indicative of a pressure of a flow of gas entering the multi-head processing chamber at a corresponding head of the multi-head processing chamber. The pressure control system includes an actuator configured to rotate the member to control a pressure of a flow of gas at a first processing head of the multi-head processing chamber.

Abstract: A method for processing a workpiece, a plasma processing apparatus, and a semiconductor device which relate to the field of semiconductor manufacturing are provided. The method includes: placing the workpiece on a workpiece support in a chamber, the workpiece includes an substrate, a portion of the substrate is exposed; performing a flushing process on the workpiece by generating one or more species using a plasma from a process gas to create a mixture, the workpiece is exposed to the mixture; and applying a bias power during the flushing process to form an oxide layer with a preset thickness on the portion of the substrate. In this way, an oxide layer with a preset thickness is obtained after the flushing process.

Abstract: A method for processing a workpiece, a plasma processing apparatus and a semiconductor device are provided. The method includes placing a workpiece including a spacer layer on a workpiece support in a chamber; selecting a composition modulation gas to modulate a volume ratio of carbon and fluorine to process the workpiece, the composition modulation gas includes one or more molecules, the volume ratio of carbon and fluorine is indicative of a distribution of carbon-based polymer deposited on the spacer layer; generating one or more species using one or more plasmas from a process gas to create a mixture, the process gas includes an etching gas and the composition modulation gas; and exposing the workpiece to the mixture to form a polymer layer on at least a portion of the spacer layer and to etch at least a portion of the spacer layer.

Abstract: The present disclosure discloses an OLED encapsulation structure, a display device and a method for manufacturing an OLED encapsulation structure. The OLED encapsulation structure includes an OLED device and a plurality of film layers covering the OLED device. The plurality of film layers includes an inorganic layer and an organic layer stacked alternately, and contacting surfaces of any two film layers in contact with each other among the plurality of film layers include complementary topographies such that the any two film layers in contact with each other are stuck with each other.

Abstract: The present disclosure provides an array substrate, a manufacturing method of an array substrate, and a display device. The array substrate includes: a base substrate; a first signal line, extending in a first direction and located on the base substrate; a second signal line, extending in a second direction and located on a side of the first signal line away from the base substrate and insulated with the first signal line, the first direction and the second direction crossing with each other. A side of the first signal line facing the second signal line is provided with a groove, the groove is located at a crossing region between the first signal line and the second signal line, in the crossing region, an otherographic projection of the second signal line on the base substrate completely falls into an orthographic projection of the groove on the base substrate.

Abstract: The present disclosure provides an array substrate, a manufacturing method of an array substrate, and a display device. The array substrate includes: a base substrate; a first signal line, extending in a first direction and located on the base substrate; a second signal line, extending in a second direction and located on a side of the first signal line away from the base substrate and insulated with the first signal line, the first direction and the second direction crossing with each other. A side of the first signal line facing the second signal line is provided with a groove, the groove is located at a crossing region between the first signal line and the second signal line, in the crossing region, an otherographic projection of the second signal line on the base substrate completely falls into an orthographic projection of the groove on the base substrate.

Abstract: A method that includes establishing a layered attribute description network according to description values of the filtering requirements; extracting description values that are in the attribute description network; establishing a mapping relationship between the filtering requirements and the attribute description network, generating a path dependency graph; performing traversal comparison between the description values included in the description information of the data object to be filtered and description values in the path dependency graph; if all description values of one description path are included in the description information of the data object to be filtered, recording the description path as a matching path of the data object to be filtered; and determining a filtering requirement that the data object to be filtered meets.

Abstract: The present disclosure discloses an OLED encapsulation structure, a display device and a method for manufacturing an OLED encapsulation structure. The OLED encapsulation structure includes an OLED device and a plurality of film layers covering the OLED device. The plurality of film layers includes an inorganic layer and an organic layer stacked alternately, and contacting surfaces of any two film layers in contact with each other among the plurality of film layers include complementary topographies such that the any two film layers in contact with each other are stuck with each other.

Abstract: A method that includes establishing a layered attribute description network according to description values of the filtering requirements; extracting description values that are in the attribute description network; establishing a mapping relationship between the filtering requirements and the attribute description network, generating a path dependency graph; performing traversal comparison between the description values included in the description information of the data object to be filtered and description values in the path dependency graph; if all description values of one description path are included in the description information of the data object to be filtered, recording the description path as a matching path of the data object to be filtered; and determining a filtering requirement that the data object to be filtered meets.