Abstract: A chemically toughenable or toughened glass has, before chemical toughening, a thickness t of at most 1100 ?m. The glass comprises the following components: 45-75 mol-% SiO2; 10-25 mol-% Al2O3; >1-11 mol-% Li2O; 0-15 mol-% P2O5; 0-8 mol-% B2O3; and 0-5 mol-% TiO2. The average number of bridging oxygen per polyhedron (BO) calculated as 2*4?2*(cmol(O)/(cmol(Si)+cmol(Al)+cmol(B)+cmol(P)+cmol(Ti))) is higher than 3.55. Upon chemical toughening, the linear dimension variation in the unit of percentage (V1) is so low that the overall geometry variation (OGV) calculated as (DoL/t)/V1 is higher than 0.8. DoL is the total depth of all ion-exchange layers on one side of the glass and DoL is more than 1 ?m, when the glass is chemically toughened with NaNO3 only, KNO3 only or with both KNO3 and NaNO3.

Abstract: The present disclosure relates to glass articles, a method of making the glass articles, and uses of the glass articles. The glass article has a UV-transmittance of more than 90% at 350 nm and at 500 nm and a total amount of Si2, B2O3 and Al2O3 of at least 75 mol %. The article is preferably used in the fields of biotechnology, MEMS, CIS, MEMS-like pressure sensor, display, micro array, electronic devices, microfluidics, semiconductor, high precision equipment, camera imaging, display technologies, sensor/semicon, electronic devices, home appliance, diagnostic product, and/or medical device.

Abstract: A drinking implement includes a first end section with a first opening and a second end section with a second opening. A wall made of glass extends from the first opening to the second opening. At least one of the first end section or the second end section is designed as a specific end section having at least partially a ridge, an outer edge, and an inner edge. An outer transition angle and an inner transition angle both have absolute values of less than 90 degrees.

Abstract: A low CTE boro-aluminosilicate glass having a low brittleness for use in wafer-level-packaging (WLP) applications is disclosed. The glass comprises a composition in mol-% of SiO2: 60-85, Al2O3: 1-17, B2O3: 8-20, Na2O: 0-5, K2O: 0-5, MgO: 0-10, CaO: 0-10, SrO: 0-10, and BaO: 0-10. An average number of non-bridging oxygen per polyhedron (NBO) is equal to or larger than ?0.2 and a ratio B2O3/Al2O3 is equal to or larger than 0.5. The NBO is defined as NBO=2×Omol/(Simol+Almol+Bmol)?4. A glass carrier wafer made from the low CTE boro-aluminosilicate glass and a use thereof as a glass carrier wafer for the processing of a silicon substrate are also disclosed, as well as a method for providing a low CTE boro-aluminosilicate glass.

Abstract: The present disclosure relates to glass articles, a method of making the glass articles, and uses of the glass articles. The glass article has a UV-transmittance of more than 90% at 350 nm and at 500 nm and a total amount of Si2, B2O3 and Al2O3 of at least 75 mol %. The article is preferably used in the fields of biotechnology, MEMS, CIS, MEMS-like pressure sensor, display, micro array, electronic devices, microfluidics, semiconductor, high precision equipment, camera imaging, display technologies, sensor/semicon, electronic devices, home appliance, diagnostic product, and/or medical device.

Abstract: The present invention is directed to a kind of machinable glass ceramic which can be chemically toughened. The machinable and chemically toughenable glass ceramic, which comprises, as represented by weight percentage based on the following compositions, 25-75 wt % of SiO2, 6-30 wt % of Al2O3, 0.1-30 wt % of Na2O, 0-15 wt % of K2O, 0-30 wt % of B2O3, 4-35 wt % of MgO, 0-4 wt % of CaO, 1-20 wt % of F, 0-10 wt % of ZrO2, 0.1-10 wt % of P2O5, 0-1 wt % of CeO2 and 0-1 wt % of SnO2, wherein P2O5+Na2O>3 wt %, and Al2O3+Na2O+P2O5>17 wt %. Mica crystalline phase can be formed in the glass ceramic and the glass ceramic can be chemically toughened by one step, two steps or multiple steps with depth of K-ion layer of at least 15 ?m and surface compress stress of at least 300 MPa. The profile on depth of the ion exchange layer follows the complementary error function. Hardness can be improved by at least 20% after chemical toughening. The dimension deviation ratio is less than 0.06% by ion-exchanging.

Abstract: A drinking implement includes: a first opening; a lumen; a second opening fluidly coupled to the first opening and the lumen; and a wall including a glass and extending from the first opening to the second opening and surrounding the lumen. The wall has an inner surface facing toward the lumen and an outer surface facing away from the lumen. The wall has a first compressive stress layer extending from the inner surface to a first depth within the wall, a second compressive stress layer extending from the outer surface to a second depth within the wall, and a tensile stress layer disposed within the wall at a depth between the first compressive stress layer and the second compressive stress layer. The second depth is from 0.05% to 25% of a thickness of the wall.

Abstract: A chemically toughenable or toughened glass is provided. The glass has, before chemical toughening, a thickness of at most 500 ?m. The glass, after chemical toughening, has a BACT (bendability and chemical toughenability) calculated as BACT=(CS*DoL)/(t*E) which is greater than 0.00050 and/or a NS (normalized stiffness) calculated as NS=CS/E which is greater than 0.0085, where CS is a compressive stress in MPa measured at one side of the glass after chemical toughening, DoL is a total depth of all ion-exchanged layers in ?m on one side of the glass after chemical toughening, t is a thickness of the glass in ?m after chemical toughening, and E is a E-modulus in MPa after chemical toughening.

Abstract: A chemically toughenable or toughened glass has, before chemical toughening, a thickness t of at most 1100 ?m. The glass comprises the following components: 45-75 mol-% SiO2; 10-25 mol-% Al2O3; >1-11 mol-% Li2O; 0-15 mol-% P2O5; 0-8 mol-% B2O3; and 0-5 mol-% TiO2. The average number of bridging oxygen per polyhedron (BO) calculated as 2*4?2*(cmol(O)/(cmol(Si)+cmol(Al)+cmol(B)+cmol(P)+cmol(Ti))) is higher than 3.55. Upon chemical toughening, the linear dimension variation in the unit of percentage (V1) is so low that the overall geometry variation (OGV) calculated as (DoL/t)/V1 is higher than 0.8. DoL is the total depth of all ion-exchange layers on one side of the glass and DoL is more than 1 ?m, when the glass is chemically toughened with NaNO3 only, KNO3 only or with both KNO3 and NaNO3.

Abstract: A method for production of a photo-structurable glass element is provided. The method includes the steps of: fixing a blank of photo-structurable glass at a first end; heating of a deformation zone of the blank; and drawing the blank. The glass includes Si4+, a crystal-agonist, a crystal-antagonist, and a pair of nucleating agents. The crystal-agonist is selected from the group consisting of Na+, K+, Li+, and any combinations thereof. The crystal-antagonist is selected from the group consisting of Al3+, B3+, Zn2+, Sr2+, Sb3+, and any combinations thereof. The pair of nucleating agents include cerium and an agent selected from the group consisting of silver, gold, copper, and any combinations thereof. The crystal-agonist has a molar proportion cat.-% in relation to a molar proportion of Si4+ that is at least 0.3 and at most 0.85.

Abstract: A sensitized, photo-structurable glasses and methods for producing are provided. The glasses includes Si4+, one or more crystal-agonist, one or more crystal-antagonist, and one or more pair of nucleating agents. The glasses are sensitized in that the glass reacts more sensitive to irradiation with UV-light and can be crystallized easier and with higher aspect ratios than a non-sensitized glass with equal composition. Furthermore, the sensitized glasses of this invention have smaller crystal sizes after irradiation and tempering than a non-sensitized glass with equal composition. The invention also relates to a structured glass product. Such product can be obtained by submitting the crystallized glass product to a subsequent etching step. The structured product can be used in components or as component for the application fields micro-technology, micro-reaction-technology, electronic packaging, micro-fluidics, FED spacer, bio-technology, interposer, and/or three-dimensional structured antennae.

Abstract: A low CTE boro-aluminosilicate glass having a low brittleness for use in wafer-level-packaging (WLP) applications is disclosed. The glass comprises a composition in mol-% of SiO2: 60-85, Al2O3: 1-17, B2O3: 8-20, Na2O: 0-5, K2O: 0-5, MgO: 0-10, CaO: 0-10, SrO: 0-10, and BaO: 0-10. An average number of non-bridging oxygen per polyhedron (NBO) is equal to or larger than ?0.2 and a ratio B2O3/Al2O3 is equal to or larger than 0.5. The NBO is defined as NBO=2×Omol/(Simol+Almol+Bmol)?4. A glass carrier wafer made from the low CTE boro-aluminosilicate glass and a use thereof as a glass carrier wafer for the processing of a silicon substrate are also disclosed, as well as a method for providing a low CTE boro-aluminosilicate glass.

Abstract: A method for continuous production of photo-sensitive glass bodies, glass bodies, and structured glass articles are provided. The glass bodies include a glass having Si4+, at least one crystal-agonist, at least one crystal-antagonist, and at least one pair of nucleating agents. The glass may be used in a method for structuring of glass. The glass bodies may be structured and/or unstructured and used in different applications such as in components or as components in micro-technology, in micro-reaction-technology, in electronic packaging, for micro-fluidic components, in or as FED spacer, for bio-technology (for example titer plates), as interposer, and in or as three-dimensional structurable antennae.

Abstract: A sensitized, photo-structurable glasses and methods for producing are provided. The glasses includes Si4+, one or more crystal-agonist, one or more crystal-antagonist, and one or more pair of nucleating agents. The glasses are sensitized in that the glass reacts more sensitive to irradiation with UV-light and can be crystallized easier and with higher aspect ratios than a non-sensitized glass with equal composition. Furthermore, the sensitized glasses of this invention have smaller crystal sizes after irradiation and tempering than a non-sensitized glass with equal composition. The invention also relates to a structured glass product. Such product can be obtained by submitting the crystallized glass product to a subsequent etching step. The structured product can be used in components or as component for the application fields micro-technology, micro-reaction-technology, electronic packaging, micro-fluidics, FED spacer, bio-technology, interposer, and/or three-dimensional structured antennae.

Abstract: A sensitized, photo-structurable glasses and methods for producing are provided. The glasses includes Si4+, one or more crystal-agonist, one or more crystal-antagonist, and one or more pair of nucleating agents. The glasses are sensitized in that the glass reacts more sensitive to irradiation with UV-light and can be crystallized easier and with higher aspect ratios than a non-sensitized glass with equal composition. Furthermore, the sensitized glasses of this invention have smaller crystal sizes after irradiation and tempering than a non-sensitized glass with equal composition. The invention also relates to a structured glass product. Such product can be obtained by submitting the crystallized glass product to a subsequent etching step. The structured product can be used in components or as component for the application fields micro-technology, micro-reaction-technology, electronic packaging, micro-fluidics, FED spacer, bio-technology, interposer, and/or three-dimensional structured antennae.

Abstract: The present invention is directed to a kind of machinable glass ceramic which can be chemically toughened. The machinable and chemically toughenable glass ceramic, which comprises, as represented by weight percentage based on the following compositions, 25-75 wt % of SiO2, 6-30 wt % of Al2O3, 0.1-30 wt % of Na2O, 0-15 wt % of K2O, 0-30 wt % of B2O3, 4-35 wt % of MgO, 0-4 wt % of CaO, 1-20 wt % of F, 0-10 wt % of ZrO2, 0.1-10 wt % of P2O5, 0-1 wt % of CeO2 and 0-1 wt % of SnO2, wherein P2O5+Na2O>3 wt %, and Al2O3+Na2O+P2O5>17 wt %. Mica crystalline phase can be formed in the glass ceramic and the glass ceramic can be chemically toughened by one step, two steps or multiple steps with depth of K-ion layer of at least 15 ?m and surface compress stress of at least 300 MPa. The profile on depth of the ion exchange layer follows the complementary error function. Hardness can be improved by at least 20% after chemical toughening. The dimension deviation ratio is less than 0.06% by ion-exchanging.

Abstract: A method for production of a photo-structurable glass element is provided. The method includes the steps of: fixing a blank of photo-structurable glass at a first end; heating of a deformation zone of the blank; and drawing the blank. The glass includes Si4+, a crystal-agonist, a crystal-antagonist, and a pair of nucleating agents. The crystal-agonist is selected from the group consisting of Na+, K+, Li+, and any combinations thereof. The crystal-antagonist is selected from the group consisting of Al3+, B3+, Zn2+, Sr2+, Sb3+, and any combinations thereof. The pair of nucleating agents include cerium and an agent selected from the group consisting of silver, gold, copper, and any combinations thereof. The crystal-agonist has a molar proportion cat.-% in relation to a molar proportion of Si4+ that is at least 0.3 and at most 0.85.

Abstract: A sensitized, photo-structurable glasses and methods for producing are provided. The glasses includes Si4+, one or more crystal-agonist, one or more crystal-antagonist, and one or more pair of nucleating agents. The glasses are sensitized in that the glass reacts more sensitive to irradiation with UV-light and can be crystallized easier and with higher aspect ratios than a non-sensitized glass with equal composition. Furthermore, the sensitized glasses of this invention have smaller crystal sizes after irradiation and tempering than a non-sensitized glass with equal composition. The invention also relates to a structured glass product. Such product can be obtained by submitting the crystallized glass product to a subsequent etching step. The structured product can be used in components or as component for the application fields micro-technology, micro-reaction-technology, electronic packaging, micro-fluidics, FED spacer, bio-technology, interposer, and/or three-dimensional structured antennae.

Abstract: A method for continuous production of photo-sensitive glass bodies, glass bodies, and structured glass articles are provided. The glass bodies include a glass having Si4+, at least one crystal-agonist, at least one crystal-antagonist, and at least one pair of nucleating agents. The glass may be used in a method for structuring of glass. The glass bodies may be structured and/or unstructured and used in different applications such as in components or as components in micro-technology, in micro-reaction-technology, in electronic packaging, for micro-fluidic components, in or as FED spacer, for bio-technology (for example titer plates), as interposer, and in or as three-dimensional structurable antennae.