Abstract: A substrate processing apparatus includes a processing chamber configured to process a substrate by using a processing gas; a rotary table that is rotatably provided in the processing chamber; a stage on which the substrate is to be placed and that is configured to be rotatable relative to the rotary table at a position spaced apart from a center of rotation of the rotary table, a lift pin configured to be displaced relative to the stage to raise and lower the substrate; and a housing configured to house the lift pin when the lift pin is not unexposed from the stage. The lift pin and the housing have a closing structure that closes a gap between the lift pin and the housing.

Abstract: A substrate processing apparatus includes: a rotary table provided inside a processing container; a stage provided on an upper surface of the rotary table in order to mount a substrate thereon, and configured to revolve by a rotation of the rotary table; a heater configured to heat the substrate mounted on the stage; and a rotation shaft provided at a location that rotates together with the rotary table to freely rotate while supporting the stage, and including a low heat conductivity body formed of a material with a heat conductivity lower than that of the stage.

Abstract: A substrate-processing apparatus includes a process chamber configured to process a plurality of substrates; a rotation table that is disposed in an interior of the process chamber so as to be rotatable and at which the substrates are to be placed at positions that are away in a radial direction of the rotation table from a center of rotation of the rotation table; a supply member configured to supply gas to the substrates placed on the rotation table; and a raising and lowering mechanism configured to raise and lower the supply member relative to the rotation table.

Abstract: A substrate processing apparatus includes a vacuum container, a rotary table provided inside the vacuum container, stages provided along a circumferential direction of the rotary table, and configured to support respective substrates disposed thereon, and a measuring instrument configured to measure characteristics of at least one substrate among the substrates disposed on the stages, wherein the stages are configured to be rotatable relative to the rotary table, wherein the measuring instrument is provided on a circumference of a circle that is centered on a central axis of the rotary table and passes through the stages in a plan view seen from a direction perpendicular to an upper surface of the rotary table.

Abstract: A substrate processing apparatus includes a vacuum chamber, a rotary table that is rotatably provided inside the vacuum chamber, a stage that is rotatable with respect to the rotary table, the stage having a center of rotation at a position spaced apart from a center of rotation of the rotary table, and the stage having a flange provided at a lower surface of the stage, a first holder and a second holder, the flange being sandwiched between the first holder and the second holder, and a pressing member configured to press the second holder in a direction in which the second holder comes closer to the first holder.

Abstract: A substrate processing apparatus includes a vacuum chamber; a rotary table rotatably provided in the vacuum chamber; and a stage configured to rotate together with the rotary table. The rotary table has an opening provided at a position spaced apart from a rotation center of the rotary table. An inner surface of the opening is continuous with an upper surface and a lower surface of the rotary table. The stage is spaced apart from the inner surface of the opening by a clearance.

Abstract: A substrate processing apparatus includes a vacuum chamber, a rotary table in the vacuum chamber, a stage, and a support that supports at least either the rotary table or stage, the support having a thermal expansion coefficient greater than the rotary table or stage that is supported. The rotary table or stage includes a protruding portion protruding toward the support. The support includes a base portion, an insertion portion protruding from a center of the base portion and being inserted into the protruding portion, and an outer edge protruding portion protruding from the base portion. An outer clearance formed between the outer edge protruding portion and the protruding portion is set to be smaller than an inner clearance formed between the insertion portion and the protruding portion at a first temperature, and the outer clearance becomes greater than the inner clearance at a second temperature higher than the first temperature.

Abstract: A rotational drive device includes a first rotator configured to rotate with respect to a stator, a plurality of second rotators configured to rotate with respect to the first rotator, a plurality of drivers configured to rotatably drive the respective second rotators, and a plurality of driver controllers configured to rotate integrally with the first rotator and to control rotation of the drivers, respectively, the respective driver controllers being connected to one another by a communication network.

Abstract: A substrate processing apparatus according to an aspect of the present disclosure includes a mounting section on which a substrate is placed, a structure member provided above the mounting section so as to face the mounting section, and an optical sensor. The optical sensor is configured to detect a height of the mounting section, a height of the structure member, and a height of the substrate, by emitting light from above the structure member to a predetermined location of the mounting section, a predetermined location of the structure member, and the substrate, and by receiving reflection light from the mounting section, the structure member, and the substrate.

Abstract: A substrate processing apparatus includes: a processing chamber; a rotary table rotatably provided inside the processing chamber; a stage that is rotatable relative to the rotary table at a position spaced apart from a rotation center of the rotary table; a process gas supplier provided above the rotary table; a separation gas supplier to supply a separation gas to separation regions, each of the separation regions being adjacent to a processing region; and a gas exhauster including exhaust ports communicating with an inside of the processing chamber, wherein the exhaust ports are provided in the processing region between the separation regions and are provided above the rotary table.

Abstract: A magnetic coupling device includes a driving magnet array having multiple annular sector-shaped, circumferentially arranged first permanent magnets, and a driven magnet array having multiple circular sector-shaped, circumferentially arranged second permanent magnets with pole surfaces facing pole surfaces of the first permanent magnets. The driven magnet array is rotated by the driving magnet array being rotated. A repulsion zone where a repulsive force acts is designed to have an area that is 5% to 15% of that of an attraction zone where an attractive force acts between a specific first permanent magnet and a specific second permanent magnet, with a radial first centerline of the specific first permanent magnet overlapping a radial second centerline of the specific second permanent magnet so that opposite poles face each other, including between first and second permanent magnets respectively adjacent the specific first and second permanent magnets with overlapping the centerlines.

Abstract: A substrate processing apparatus includes a processing chamber configured to process a substrate by using a processing gas; a rotary table that is rotatably provided in the processing chamber; a stage on which the substrate is to be placed and that is configured to be rotatable relative to the rotary table at a position spaced apart from a center of rotation of the rotary table, a lift pin configured to be displaced relative to the stage to raise and lower the substrate; and a housing configured to house the lift pin when the lift pin is not unexposed from the stage. The lift pin and the housing have a closing structure that closes a gap between the lift pin and the housing.

Abstract: A substrate processing apparatus includes a processing chamber; a rotary table that is rotatably provided in the processing chamber; a heater provided below the rotary table; a partition, provided between the rotary table and the heater with a gap with respect to a lower surface of the rotary table, configured to partition the processing chamber into a first region in which the rotary table is provided and a second region in which the heater is provided; a first processing region in which a first processing gas is supplied to an upper surface of the rotary table; a second processing region in which a second processing gas is supplied to the upper surface of the rotary table; and a separation region in which a separation gas for separating the first and second processing gas is supplied to the upper surface of the rotary table.

Abstract: A substrate processing apparatus includes: a rotary table provided in a processing container; a stage provided on the rotary table to place a substrate thereon, and configured to revolve by a rotation of the rotary table; a heater configured to heat the substrate placed on the stage; and a rotation shaft configured to rotate together with the rotary table and support the stage to be rotatable; and a deflector configured to deflect heating light emitted from the heater toward the rotation shaft.

Abstract: A substrate processing apparatus includes: a rotary table provided inside a processing container; a stage provided on an upper surface of the rotary table in order to mount a substrate thereon, and configured to revolve by a rotation of the rotary table; a heater configured to heat the substrate mounted on the stage; and a rotation shaft provided at a location that rotates together with the rotary table to freely rotate while supporting the stage, and including a low heat conductivity body formed of a material with a heat conductivity lower than that of the stage.

Abstract: A magnetic coupling device includes a driving magnet array having multiple annular sector-shaped, circumferentially arranged first permanent magnets, and a driven magnet array having multiple circular sector-shaped, circumferentially arranged second permanent magnets with pole surfaces facing pole surfaces of the first permanent magnets. The driven magnet array is rotated by the driving magnet array being rotated. A repulsion zone where a repulsive force acts is designed to have an area that is 5% to 15% of that of an attraction zone where an attractive force acts between a specific first permanent magnet and a specific second permanent magnet, with a radial first centerline of the specific first permanent magnet overlapping a radial second centerline of the specific second permanent magnet so that opposite poles face each other, including between first and second permanent magnets respectively adjacent the specific first and second permanent magnets with overlapping the centerlines.

Abstract: A substrate processing apparatus includes a vacuum chamber, a rotary table disposed inside the vacuum chamber and configure to rotate, and a housing box disposed inside the vacuum chamber and configured to rotate together with the rotary table, the housing box having an inside pressure higher than in the vacuum chamber.

Abstract: A substrate processing apparatus includes a vacuum chamber, a rotary table that is rotatably provided inside the vacuum chamber, a stage that is rotatable with respect to the rotary table, the stage having a center of rotation at a position spaced apart from a center of rotation of the rotary table, and the stage having a flange provided at a lower surface of the stage, a first holder and a second holder, the flange being sandwiched between the first holder and the second holder, and a pressing member configured to press the second holder in a direction in which the second holder comes closer to the first holder.

Abstract: A rotational drive device includes a first rotator configured to rotate with respect to a stator, a plurality of second rotators configured to rotate with respect to the first rotator, a plurality of drivers configured to rotatably drive the respective second rotators, and a plurality of driver controllers configured to rotate integrally with the first rotator and to control rotation of the drivers, respectively, the respective driver controllers being connected to one another by a communication network.

Abstract: A substrate processing apparatus according to an aspect of the present disclosure includes a mounting section on which a substrate is placed, a structure member provided above the mounting section so as to face the mounting section, and an optical sensor. The optical sensor is configured to detect a height of the mounting section, a height of the structure member, and a height of the substrate, by emitting light from above the structure member to a predetermined location of the mounting section, a predetermined location of the structure member, and the substrate, and by receiving reflection light from the mounting section, the structure member, and the substrate.