Patents by Inventor Junnosuke Taguchi
Junnosuke Taguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240060181Abstract: A substrate processing apparatus includes a vacuum chamber, a rotary table in the vacuum chamber, a stage, and a support that supports at least either the rotary table or stage, the support having a thermal expansion coefficient greater than the rotary table or stage that is supported. The rotary table or stage includes a protruding portion protruding toward the support. The support includes a base portion, an insertion portion protruding from a center of the base portion and being inserted into the protruding portion, and an outer edge protruding portion protruding from the base portion. An outer clearance formed between the outer edge protruding portion and the protruding portion is set to be smaller than an inner clearance formed between the insertion portion and the protruding portion at a first temperature, and the outer clearance becomes greater than the inner clearance at a second temperature higher than the first temperature.Type: ApplicationFiled: August 2, 2023Publication date: February 22, 2024Inventors: Manabu HONMA, Junnosuke TAGUCHI, Yasushi TAKEUCHI
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Patent number: 11885003Abstract: A rotational drive device includes a first rotator configured to rotate with respect to a stator, a plurality of second rotators configured to rotate with respect to the first rotator, a plurality of drivers configured to rotatably drive the respective second rotators, and a plurality of driver controllers configured to rotate integrally with the first rotator and to control rotation of the drivers, respectively, the respective driver controllers being connected to one another by a communication network.Type: GrantFiled: December 3, 2020Date of Patent: January 30, 2024Assignee: TOKYO ELECTRON LIMITEDInventors: Junnosuke Taguchi, Yasutomo Kimura
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Patent number: 11765879Abstract: A substrate processing apparatus according to an aspect of the present disclosure includes a mounting section on which a substrate is placed, a structure member provided above the mounting section so as to face the mounting section, and an optical sensor. The optical sensor is configured to detect a height of the mounting section, a height of the structure member, and a height of the substrate, by emitting light from above the structure member to a predetermined location of the mounting section, a predetermined location of the structure member, and the substrate, and by receiving reflection light from the mounting section, the structure member, and the substrate.Type: GrantFiled: May 7, 2020Date of Patent: September 19, 2023Assignee: Tokyo Electron LimitedInventor: Junnosuke Taguchi
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Publication number: 20230257877Abstract: A substrate processing apparatus includes: a processing chamber; a rotary table rotatably provided inside the processing chamber; a stage that is rotatable relative to the rotary table at a position spaced apart from a rotation center of the rotary table; a process gas supplier provided above the rotary table; a separation gas supplier to supply a separation gas to separation regions, each of the separation regions being adjacent to a processing region; and a gas exhauster including exhaust ports communicating with an inside of the processing chamber, wherein the exhaust ports are provided in the processing region between the separation regions and are provided above the rotary table.Type: ApplicationFiled: February 3, 2023Publication date: August 17, 2023Inventors: Ibuki HAYASHI, Yasushi TAKEUCHI, Manabu HONMA, Junnosuke TAGUCHI
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Patent number: 11670999Abstract: A magnetic coupling device includes a driving magnet array having multiple annular sector-shaped, circumferentially arranged first permanent magnets, and a driven magnet array having multiple circular sector-shaped, circumferentially arranged second permanent magnets with pole surfaces facing pole surfaces of the first permanent magnets. The driven magnet array is rotated by the driving magnet array being rotated. A repulsion zone where a repulsive force acts is designed to have an area that is 5% to 15% of that of an attraction zone where an attractive force acts between a specific first permanent magnet and a specific second permanent magnet, with a radial first centerline of the specific first permanent magnet overlapping a radial second centerline of the specific second permanent magnet so that opposite poles face each other, including between first and second permanent magnets respectively adjacent the specific first and second permanent magnets with overlapping the centerlines.Type: GrantFiled: July 28, 2021Date of Patent: June 6, 2023Assignees: PROTERIAL, LTD., TOKYO ELECTRON LIMITEDInventors: Akihiro Kimoto, Junnosuke Taguchi, Satoshi Yoshimoto, Norihiko Kishimoto, Keita Hayashi
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Publication number: 20230062671Abstract: A substrate processing apparatus includes a processing chamber; a rotary table that is rotatably provided in the processing chamber; a heater provided below the rotary table; a partition, provided between the rotary table and the heater with a gap with respect to a lower surface of the rotary table, configured to partition the processing chamber into a first region in which the rotary table is provided and a second region in which the heater is provided; a first processing region in which a first processing gas is supplied to an upper surface of the rotary table; a second processing region in which a second processing gas is supplied to the upper surface of the rotary table; and a separation region in which a separation gas for separating the first and second processing gas is supplied to the upper surface of the rotary table.Type: ApplicationFiled: August 25, 2022Publication date: March 2, 2023Inventors: Junnosuke TAGUCHI, Yasushi TAKEUCHI, Manabu HONMA
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Publication number: 20230061423Abstract: A substrate processing apparatus includes a processing chamber configured to process a substrate by using a processing gas; a rotary table that is rotatably provided in the processing chamber; a stage on which the substrate is to be placed and that is configured to be rotatable relative to the rotary table at a position spaced apart from a center of rotation of the rotary table, a lift pin configured to be displaced relative to the stage to raise and lower the substrate; and a housing configured to house the lift pin when the lift pin is not unexposed from the stage. The lift pin and the housing have a closing structure that closes a gap between the lift pin and the housing.Type: ApplicationFiled: August 16, 2022Publication date: March 2, 2023Inventors: Junnosuke TAGUCHI, Yasutomo KIMURA, Hisashi TAKAHASHI
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Publication number: 20220293439Abstract: A substrate processing apparatus includes: a rotary table provided in a processing container; a stage provided on the rotary table to place a substrate thereon, and configured to revolve by a rotation of the rotary table; a heater configured to heat the substrate placed on the stage; and a rotation shaft configured to rotate together with the rotary table and support the stage to be rotatable; and a deflector configured to deflect heating light emitted from the heater toward the rotation shaft.Type: ApplicationFiled: March 4, 2022Publication date: September 15, 2022Inventors: Yuki WADA, Junnosuke TAGUCHI, Hisashi TAKAHASHI, Manabu HONMA
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Publication number: 20220130712Abstract: A substrate processing apparatus includes: a rotary table provided inside a processing container; a stage provided on an upper surface of the rotary table in order to mount a substrate thereon, and configured to revolve by a rotation of the rotary table; a heater configured to heat the substrate mounted on the stage; and a rotation shaft provided at a location that rotates together with the rotary table to freely rotate while supporting the stage, and including a low heat conductivity body formed of a material with a heat conductivity lower than that of the stage.Type: ApplicationFiled: October 15, 2021Publication date: April 28, 2022Inventor: Junnosuke TAGUCHI
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Publication number: 20220037977Abstract: A magnetic coupling device includes a driving magnet array having multiple annular sector-shaped, circumferentially arranged first permanent magnets, and a driven magnet array having multiple circular sector-shaped, circumferentially arranged second permanent magnets with pole surfaces facing pole surfaces of the first permanent magnets. The driven magnet array is rotated by the driving magnet array being rotated. A repulsion zone where a repulsive force acts is designed to have an area that is 5% to 15% of that of an attraction zone where an attractive force acts between a specific first permanent magnet and a specific second permanent magnet, with a radial first centerline of the specific first permanent magnet overlapping a radial second centerline of the specific second permanent magnet so that opposite poles face each other, including between first and second permanent magnets respectively adjacent the specific first and second permanent magnets with overlapping the centerlines.Type: ApplicationFiled: July 28, 2021Publication date: February 3, 2022Applicants: Hitachi Metals, Ltd., Tokyo Electron LimitedInventors: Akihiro KIMOTO, Junnosuke TAGUCHI, Satoshi YOSHIMOTO, Norihiko KISHIMOTO, Keita HAYASHI
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Publication number: 20210214845Abstract: A substrate processing apparatus includes a vacuum chamber, a rotary table disposed inside the vacuum chamber and configure to rotate, and a housing box disposed inside the vacuum chamber and configured to rotate together with the rotary table, the housing box having an inside pressure higher than in the vacuum chamber.Type: ApplicationFiled: December 21, 2020Publication date: July 15, 2021Inventor: Junnosuke TAGUCHI
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Publication number: 20210217651Abstract: A substrate processing apparatus includes a vacuum chamber, a rotary table that is rotatably provided inside the vacuum chamber, a stage that is rotatable with respect to the rotary table, the stage having a center of rotation at a position spaced apart from a center of rotation of the rotary table, and the stage having a flange provided at a lower surface of the stage, a first holder and a second holder, the flange being sandwiched between the first holder and the second holder, and a pressing member configured to press the second holder in a direction in which the second holder comes closer to the first holder.Type: ApplicationFiled: December 21, 2020Publication date: July 15, 2021Inventors: Junnosuke TAGUCHI, Nobuhiro TAKAHASHI
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Publication number: 20210180187Abstract: A rotational drive device includes a first rotator configured to rotate with respect to a stator, a plurality of second rotators configured to rotate with respect to the first rotator, a plurality of drivers configured to rotatably drive the respective second rotators, and a plurality of driver controllers configured to rotate integrally with the first rotator and to control rotation of the drivers, respectively, the respective driver controllers being connected to one another by a communication network.Type: ApplicationFiled: December 3, 2020Publication date: June 17, 2021Inventors: Junnosuke TAGUCHI, Yasutomo KIMURA
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Publication number: 20200365594Abstract: A substrate processing apparatus according to an aspect of the present disclosure includes a mounting section on which a substrate is placed, a structure member provided above the mounting section so as to face the mounting section, and an optical sensor. The optical sensor is configured to detect a height of the mounting section, a height of the structure member, and a height of the substrate, by emitting light from above the structure member to a predetermined location of the mounting section, a predetermined location of the structure member, and the substrate, and by receiving reflection light from the mounting section, the structure member, and the substrate.Type: ApplicationFiled: May 7, 2020Publication date: November 19, 2020Inventor: Junnosuke TAGUCHI
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Patent number: 10763147Abstract: A substrate warpage detection device for detecting warpage of a substrate loaded on a substrate loading region having a recess shape formed on a rotary table along a circumferential direction during rotation of the rotary table, includes a light transmitting part configured to transmit a light beam obliquely upward from a side of the rotary table such that a lower portion of the light beam collides with an upper end of a side surface of the rotary table and an upper portion of the light beam positioned more upward than the lower portion of the light beam passes a portion near the surface of the rotary table, and a light receiving part installed to face the light transmitting part and configured to receive the light beam passing the portion near the surface of the rotary table so as to detect an amount of received light.Type: GrantFiled: July 3, 2018Date of Patent: September 1, 2020Assignee: TOKYO ELECTRON LIMITEDInventors: Junnosuke Taguchi, Yuya Sasaki, Toshiya Chiba
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Patent number: 10615066Abstract: There is provided a substrate warping monitoring device for monitoring a warping of a substrate mounted in a substrate mounting region formed in a rotary table along a circumferential direction during rotation of the rotary table, including: an optical displacement meter located above the rotary table and configured to irradiate a light to a predetermined position on the rotary table, receive a reflected light reflected off the rotary table and the substrate which passes through the predetermined position and measure a surface profile of the substrate; a memory part configured to store a measurement value acquired when the light is irradiated on a predetermined reference surface, as a reference value; and a calculation part configured to calculate a warping amount of the substrate based on the surface profile of the substrate measured by the optical displacement meter and the reference value stored in the memory part.Type: GrantFiled: July 2, 2018Date of Patent: April 7, 2020Assignee: TOKYO ELECTRON LIMITEDInventors: Toshiya Chiba, Yuya Sasaki, Junnosuke Taguchi
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Publication number: 20190013224Abstract: There is provided a substrate warping monitoring device for monitoring a warping of a substrate mounted in a substrate mounting region formed in a rotary table along a circumferential direction during rotation of the rotary table, including: an optical displacement meter located above the rotary table and configured to irradiate a light to a predetermined position on the rotary table, receive a reflected light reflected off the rotary table and the substrate which passes through the predetermined position and measure a surface profile of the substrate; a memory part configured to store a measurement value acquired when the light is irradiated on a predetermined reference surface, as a reference value; and a calculation part configured to calculate a warping amount of the substrate based on the surface profile of the substrate measured by the optical displacement meter and the reference value stored in the memory part.Type: ApplicationFiled: July 2, 2018Publication date: January 10, 2019Inventors: Toshiya CHIBA, Yuya SASAKI, Junnosuke TAGUCHI
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Publication number: 20190013225Abstract: A substrate warpage detection device for detecting warpage of a substrate loaded on a substrate loading region having a recess shape formed on a rotary table along a circumferential direction during rotation of the rotary table, includes a light transmitting part configured to transmit a light beam obliquely upward from a side of the rotary table such that a lower portion of the light beam collides with an upper end of a side surface of the rotary table and an upper portion of the light beam positioned more upward than the lower portion of the light beam passes a portion near the surface of the rotary table, and a light receiving part installed to face the light transmitting part and configured to receive the light beam passing the portion near the surface of the rotary table so as to detect an amount of received light.Type: ApplicationFiled: July 3, 2018Publication date: January 10, 2019Inventors: Junnosuke TAGUCHI, Yuya SASAKI, Toshiya CHIBA
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Patent number: 9576748Abstract: An electricity storage device includes an electricity storage element formed by winding an electrode body of an anode or cathode side along with a separator, an electrode leading section having an inclined edge is formed on an element end-face of the electricity storage element by a part of the electrode body.Type: GrantFiled: May 12, 2015Date of Patent: February 21, 2017Assignee: NIPPON CHEMI-CON CORPORATIONInventor: Junnosuke Taguchi
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Publication number: 20150243453Abstract: An electricity storage device includes an electricity storage element formed by winding an electrode body of an anode or cathode side along with a separator, an electrode leading section having an inclined edge is formed on an element end-face of the electricity storage element by a part of the electrode body.Type: ApplicationFiled: May 12, 2015Publication date: August 27, 2015Applicant: NIPPON CHEMI-CON CORPORATIONInventor: Junnosuke Taguchi