Patents by Inventor Junsei Tsutsumi

Junsei Tsutsumi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8294863
    Abstract: A liquid crystal display device having a plurality of pixels arranged in a matrix includes first and second substrates and a liquid crystal layer held therebetween. Switching elements are arranged in each of the pixels on the first substrate. A first organic insulating film covers signal lines, scan lines and switching elements. Common electrodes are formed in the first organic insulating film on the first substrate. Connection elements are electrically connected to the switching elements through first contact holes formed in the first organic insulating film. A second organic insulating film covers the first organic insulating film and the connection elements. Pixel electrodes having slits are formed on the second organic insulating film electrically connected to the respective connection elements through second contact holes formed in the second organic insulating film.
    Type: Grant
    Filed: June 30, 2009
    Date of Patent: October 23, 2012
    Assignee: Japan Display Central Inc.
    Inventors: Toshihiro Ninomiya, Norihisa Kakinuma, Junsei Tsutsumi
  • Publication number: 20100002178
    Abstract: A liquid crystal display device having a plurality of pixels arranged in a matrix includes first and second substrates and a liquid crystal layer held therebetween. Switching elements are arranged in each of the pixels on the first substrate. A first organic insulating film covers signal lines, scan lines and switching elements. Common electrodes are formed in the first organic insulating film on the first substrate. Connection elements are electrically connected to the switching elements through first contact holes formed in the first organic insulating film. A second organic insulating film covers the first organic insulating film and the connection elements. Pixel electrodes having slits are formed on the second organic insulating film electrically connected to the respective connection elements through second contact holes formed in the second organic insulating film.
    Type: Application
    Filed: June 30, 2009
    Publication date: January 7, 2010
    Applicant: Toshiba Mobile Display Co., Ltd.
    Inventors: Toshihiro NINOMIYA, Norihisa Kakinuma, Junsei Tsutsumi
  • Patent number: 6713748
    Abstract: An image detection device includes a pixel portion (OEF) having a photoelectric conversion film for converting incident light into a signal charge and a pixel capacitor for accumulating the signal charge, and a thin film transistor (TFT1) included in a signal detective circuit operation of which is controlled by a scanning line (G1) to read out the potential of a pixel electrode to a signal line (S1). The transistor (TFT1) having a source or drain connected to the pixel electrode is a TFT having an LDD structure on a high-potential side, a TFT having LDD structures on the high- and low-potential sides in which the LDD length is larger on the high-potential side, or a TFT having a double-gate structure.
    Type: Grant
    Filed: June 22, 1999
    Date of Patent: March 30, 2004
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Junsei Tsutsumi, Akira Kinno, Mitsushi Ikeda
  • Patent number: 6306756
    Abstract: A method for the production of a semiconductor device having an electrode line formed in a semiconducting substrate is disclosed which comprises preparing a semiconducting substrate having trenches and/or contact holes formed preparatorily in a region destined to form the electrode line, forming a conductive film formed mainly of at least one member selected from among Cu, Ag, and Au on the surface of the semiconducting substrate, heat-treating the superposed Cu film while supplying at least an oxidizing gas thereto thereby flowing the Cu film and causing never melting to fill the trenches and/or contact holes, and removing by polishing the part of the conductive film which falls outside the region of the electrode line and completing the electrode lines consequently.
    Type: Grant
    Filed: May 26, 2000
    Date of Patent: October 23, 2001
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Masahiko Hasunuma, Sachiyo Ito, Keizo Shimamura, Hisashi Kaneko, Nobuo Hayasaka, Junsei Tsutsumi, Akihiro Kajita, Junichi Wada, Haruo Okano
  • Patent number: 6090701
    Abstract: A method for the production of a semiconductor device having an electrode line formed in a semiconducting substrate is disclosed which comprises preparing a semiconducting substrate having trenches and/or contact holes formed preparatorily in a region destined to form the electrode line, forming a conductive film formed mainly of at least one member selected from among Cu, Ag, and Au on the surface of the semiconducting substrate, heat-treating the superposed Cu film while supplying at least an oxidizing gas thereto thereby flowing the Cu film to fill the trenches and/or contact holes, and removing by polishing the part of the conductive film which falls outside the region of the electrode line and completing the electrode lines consequently. During the heat treatment, a reducing gas is supplied in addition to the oxidizing gas to induce a local oxidation-reduction reaction and fluidify and/or flow the conductive film and consequently accomplish the embodiment of the conductive film in the trenches.
    Type: Grant
    Filed: June 20, 1995
    Date of Patent: July 18, 2000
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Masahiko Hasunuma, Sachiyo Ito, Keizo Shimamura, Hisashi Kaneko, Nobuo Hayasaka, Junsei Tsutsumi, Akihiro Kajita, Junichi Wada, Haruo Okano
  • Patent number: 5682041
    Abstract: An electronic part is disclosed which is furnished with an artificial super lattice obtained by alternately superposing a substance of good conductivity formed of a compound between one element selected from among the elements belonging to the transition elements of Groups 3A to 6A and the rare earth elements and an element selected from among boron, carbon, nitrogen, phosphorus, selenium, and tellurium or a compound between oxygen and a transition metal element selected from among the elements of Group 7A and Group 8 and an insulating substance formed of a compound between a simple metal element selected from among the elements belonging to Group 1A, Group 2A, and Groups 1B to 4B and an element selected from among carbon, nitrogen, oxygen, phosphorus, sulfur, selenium, tellurium, and halogen elements in thicknesses fit for obtaining a quantum size effect.
    Type: Grant
    Filed: May 21, 1996
    Date of Patent: October 28, 1997
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Takashi Kawakubo, Hideo Hirayama, Kenya Sano, Michihiro Oose, Junsei Tsutsumi