Patents by Inventor Jun-seong Kim
Jun-seong Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20190313999Abstract: Provided is an ultrasound diagnosis apparatus including: a probe configured to receive echo signals from a fetus; a processor configured to acquire Doppler data based on the received echo signals, determine a heart rate of the fetus based on period information of the Doppler data, and modulate, based on the determined heart rate, a heartbeat Doppler sound of the fetus, which is acquired from the Doppler data, into a heartbeat sound that is similar to a sound of an actual heartbeat; and a speaker configured to output the heartbeat sound.Type: ApplicationFiled: April 5, 2017Publication date: October 17, 2019Inventor: Jun-seong Kim
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Method and apparatus for generating hierarchical saliency images detection with selective refinement
Patent number: 9311563Abstract: A method of generating a saliency image, which includes: converting an input image into an input image of the first size and an input image of the second size; applying a saliency extraction scheme to the input image of the first size to generate a first saliency image; converting the first saliency image to the second size; extracting an area that satisfies a first condition from the converted first saliency image; determining an area of the input image of the second size that corresponds to the extracted area; and generating a second saliency image by multiplying an image generated by applying the saliency extraction scheme to the determined area, and the converted first saliency image.Type: GrantFiled: October 30, 2014Date of Patent: April 12, 2016Assignees: Samsung Electronics Co., Ltd., Korea University Research and Business FoundationInventors: Jong-hoon Won, Jun-seong Kim, Chang-su Kim, Kazuhiko Sugimoto, Masataka Hamada -
Patent number: 9257508Abstract: Transistors and methods of manufacturing the same may include a gate on a substrate, a channel layer having a three-dimensional (3D) channel region covering at least a portion of a gate, a source electrode over a first region of the channel layer, and a drain electrode over a second region of the channel layer.Type: GrantFiled: August 27, 2012Date of Patent: February 9, 2016Assignee: SAMSUNG ELECTRONICS CO., LTD.Inventors: Chang-seung Lee, Joo-ho Lee, Yong-sung Kim, Jun-seong Kim, Chang-youl Moon
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METHOD AND APPARATUS FOR GENERATING HIERARCHICAL SALIENCY IMAGES DETECTION WITH SELECTIVE REFINEMENT
Publication number: 20150125082Abstract: A method of generating a saliency image, which includes: converting an input image into an input image of the first size and an input image of the second size; applying a saliency extraction scheme to the input image of the first size to generate a first saliency image; converting the first saliency image to the second size; extracting an area that satisfies a first condition from the converted first saliency image; determining an area of the input image of the second size that corresponds to the extracted area; and generating a second saliency image by multiplying an image generated by applying the saliency extraction scheme to the determined area, and the converted first saliency image.Type: ApplicationFiled: October 30, 2014Publication date: May 7, 2015Inventors: Jong-hoon Won, Jun-seong Kim, Chang-su Kim, Kazuhiko Sugimoto, Masataka Hamada -
Patent number: 8861080Abstract: Wire grid polarizers, methods of fabricating a wire grid polarizer and display panels including a wire grid polarizer are provided, the methods include preparing a mold having a lower surface in which a plurality of parallel fine grooves are formed, and arranging the mold on a transparent substrate. The plurality of parallel fine grooves are filled with a conductive liquid ink. A plurality of parallel conductive nano wires are formed on the transparent substrate by curing the conductive liquid ink. The mold is removed.Type: GrantFiled: January 16, 2012Date of Patent: October 14, 2014Assignee: Samsung Electronics Co., Ltd.Inventors: Chang-seung Lee, Jun-seong Kim, Ki-deok Bae
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Publication number: 20130193412Abstract: Transistors and methods of manufacturing the same may include a gate on a substrate, a channel layer having a three-dimensional (3D) channel region covering at least a portion of a gate, a source electrode over a first region of the channel layer, and a drain electrode over a second region of the channel layer.Type: ApplicationFiled: August 27, 2012Publication date: August 1, 2013Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Chang-seung LEE, Joo-ho LEE, Yong-sung KIM, Jun-seong KIM, Chang-youl MOON
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Publication number: 20120287507Abstract: Wire grid polarizers, methods of fabricating a wire grid polarizer and display panels including a wire grid polarizer are provided, the methods include preparing a mold having a lower surface in which a plurality of parallel fine grooves are formed, and arranging the mold on a transparent substrate. The plurality of parallel fine grooves are filled with a conductive liquid ink. A plurality of parallel conductive nano wires are formed on the transparent substrate by curing the conductive liquid ink. The mold is removed.Type: ApplicationFiled: January 16, 2012Publication date: November 15, 2012Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Chang-seung Lee, Jun-seong Kim, Ki-deok Bae
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Patent number: 7915610Abstract: A ZnO-based thin film transistor (TFT) is provided herein, as is a method of manufacturing the TFT. The ZnO-based TFT has a channel layer that comprises ZnO and ZnCl, wherein the ZnCl has a higher bonding energy than ZnO with respect to plasma. The ZnCl is formed through the entire channel layer, and specifically is formed in a region near the surface of the channel layer. Since the ZnCl is strong enough not to be decomposed when exposed to plasma etching gas, an increase in the carrier concentration can be prevented. The distribution of ZnCl in the channel layer, may result from the inclusion of chlorine (Cl) in the plasma gas during the patterning of the channel layer.Type: GrantFiled: November 10, 2009Date of Patent: March 29, 2011Assignee: Samsung Electronics Co., Ltd.Inventors: Myung-kwan Ryu, Jun-seong Kim, Sang-yoon Lee, Euk-che Hwang, Tae-sang Kim, Jang-yeon Kwon, Kyung-bae Park, Kyung-seok Son, Ji-sim Jung
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Patent number: 7863111Abstract: Provided are a thin film transistor for display devices and a manufacturing method of the thin film transistor. The thin film transistor for display devices includes: a flexible substrate; a gate electrode layer formed on the flexible substrate; a first insulating layer formed on the flexible substrate and the gate electrode; a source and a drain formed on the first insulating layer; an active layer formed on the first insulating layer between the source and the drain; a second insulating layer formed on the first insulating layer, the source, the drain, and the active layer; and a drain electrode that opens the second insulating layer to be connected to the drain and is formed of a CNT dispersed conductive polymer.Type: GrantFiled: September 10, 2007Date of Patent: January 4, 2011Assignee: Samsung Electronics Co., Ltd.Inventors: Jun-seong Kim, Euk-che Hwang, Ki-deok Bae, Chang-seung Lee, Hyeon-Jin Shin
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Publication number: 20100051942Abstract: A ZnO-based thin film transistor (TFT) is provided herein, as is a method of manufacturing the TFT. The ZnO-based TFT has a channel layer that comprises ZnO and ZnCl, wherein the ZnCl has a higher bonding energy than ZnO with respect to plasma. The ZnCl is formed through the entire channel layer, and specifically is formed in a region near THE surface of the channel layer. Since the ZnCl is strong enough not to be decomposed when exposed to plasma etching gas, an increase in the carrier concentration can be prevented. The distribution of ZnCl in the channel layer, may result from the inclusion of chlorine (Cl) in the plasma gas during the patterning of the channel layer.Type: ApplicationFiled: November 10, 2009Publication date: March 4, 2010Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Myung-kwan RYU, Jun-seong KIM, Sang-yoon LEE, Euk-che HWANG, Tae-sang KIM, Jang-yeon KWON, Kyung-bae PARK, Kyung-seok SON, Ji-sim JUNG
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Patent number: 7638360Abstract: A ZnO-based thin film transistor (TFT) is provided herein, as is a method of manufacturing the TFT. The ZnO-based TFT has a channel layer that comprises ZnO and ZnCl, wherein the ZnCl has a higher bonding energy than ZnO with respect to plasma. The ZnCl is formed through the entire channel layer, and specifically is formed in a region near THE surface of the channel layer. Since the ZnCl is strong enough not to be decomposed when exposed to plasma etching gas, an increase in the carrier concentration can be prevented. The distribution of ZnCl in the channel layer, may result from the inclusion of chlorine (Cl) in the plasma gas during the patterning of the channel layer.Type: GrantFiled: December 19, 2007Date of Patent: December 29, 2009Assignee: Samsung Electronics Co., Ltd.Inventors: Myung-kwan Ryu, Jun-seong Kim, Sang-yoon Lee, Euk-che Hwang, Tae-sang Kim, Jang-yeon Kwon, Kyung-bae Park, Kyung-seok Son, Ji-sim Jung
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Publication number: 20080283831Abstract: A ZnO-based thin film transistor (TFT) is provided herein, as is a method of manufacturing the TFT. The ZnO-based TFT has a channel layer that comprises ZnO and ZnCl, wherein the ZnCl has a higher bonding energy than ZnO with respect to plasma. The ZnCl is formed through the entire channel layer, and specifically is formed in a region near THE surface of the channel layer. Since the ZnCl is strong enough not to be decomposed when exposed to plasma etching gas, an increase in the carrier concentration can be prevented. The distribution of ZnCl in the channel layer, may result from the inclusion of chlorine (Cl) in the plasma gas during the patterning of the channel layer.Type: ApplicationFiled: December 19, 2007Publication date: November 20, 2008Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Myung-kwan RYU, Jun-seong KIM, Sang-yoon LEE, Euk-che HWANG, Tae-sang KIM, Jang-yeon KWON, Kyung-bae PARK, Kyung-seok SON, Ji-sim JUNG
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Publication number: 20080224128Abstract: Provided are a thin film transistor for display devices and a manufacturing method of the thin film transistor. The thin film transistor for display devices includes: a flexible substrate; a gate electrode layer formed on the flexible substrate; a first insulating layer formed on the flexible substrate and the gate electrode; a source and a drain formed on the first insulating layer; an active layer formed on the first insulating layer between the source and the drain; a second insulating layer formed on the first insulating layer, the source, the drain, and the active layer; and a drain electrode that opens the second insulating layer to be connected to the drain and is formed of a CNT dispersed conductive polymer.Type: ApplicationFiled: September 10, 2007Publication date: September 18, 2008Inventors: Jun-seong Kim, Euk-che Hwang, Ki-deok Bae, Chang-seung Lee, Hyeon-Jin Shin
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Publication number: 20080144173Abstract: A multi-display apparatus includes a plurality of panels connected to each other and displaying an image, wherein the plurality of panels comprise a top emission type display apparatus and a bottom emission type display apparatus, and the top emission type display apparatus and the bottom emission type display apparatus are connected to each other such that the top emission type display apparatus and the bottom emission type display apparatus emit light in a same direction, and the top emission type display apparatus and the bottom emission type display apparatus are arranged with a step difference therebetween such that pixel boundaries of adjacent side boundary surfaces of the top emission type display apparatus and of the bottom emission type display apparatus overlap each other.Type: ApplicationFiled: August 2, 2007Publication date: June 19, 2008Applicant: SAMSUNG ELECTRONICS CO., LTD.Inventors: Ki-deok Bae, Jun-seong Kim, Euk-che Hwang, Chan-bong Jun
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Patent number: 7371487Abstract: A method of fabricating a black matrix of a color filter is provided. In the method, a black matrix layer formed of a hydrophobic organic material is formed on an upper surface of a transparent substrate. A black matrix is formed by patterning the black matrix layer. Side surfaces of the black matrix are made hydrophilic by irradiating a lower surface of the transparent substrate with ultraviolet rays while heating the black matrix. A black matrix provided by the method is also disclosed.Type: GrantFiled: August 16, 2006Date of Patent: May 13, 2008Assignee: Samsung Electronics Co., Ltd.Inventors: Ki-deok Bae, In-Sung Song, Chang-seung Lee, Jun-seong Kim, Sung-woong Kim, Wou-sik Kim
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Publication number: 20070122721Abstract: A method of fabricating a black matrix of a color filter is provided. In the method, a black matrix layer formed of a hydrophobic organic material is formed on an upper surface of a transparent substrate. A black matrix is formed by patterning the black matrix layer. Side surfaces of the black matrix are made hydrophilic by irradiating a lower surface of the transparent substrate with ultraviolet rays while heating the black matrix. A black matrix provided by the method is also disclosed.Type: ApplicationFiled: August 16, 2006Publication date: May 31, 2007Inventors: Ki-deok Bae, In-Sung Song, Chang-seung Lee, Jun-seong Kim, Sung-woong Kim, Wou-sik Kim