Patents by Inventor Junya OKA

Junya OKA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240119475
    Abstract: An information processing device includes a processor configured to provide an incentive to a first user who sells or returns a first vehicle in which a part of a first coating film including an easily peelable layer is not peeled off.
    Type: Application
    Filed: December 19, 2023
    Publication date: April 11, 2024
    Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA
    Inventors: Yukinori II, Kenji YAMAGUCHI, Junya OGAWA, Yuki NAGANUMA, Junya YAMAMOTO, Yuta TONE, Naoki ISHIZUKA, Tadayuki TANAKA, Keisuke ITO, Yuka YOKOI, Takashi HAYASHI, Naoya OKA, Yu HAMADA
  • Patent number: 10968514
    Abstract: There is provided a substrate mounting table for use in a plasma-based processing apparatus that performs a plasma-based process on a substrate inside a processing container, which includes a substrate mounting portion having a front surface subjected to a mirroring treatment and on which the substrate is mounted, and an edge portion located around the substrate mounting portion and treated to have an uneven shape.
    Type: Grant
    Filed: November 16, 2018
    Date of Patent: April 6, 2021
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Kohichi Satoh, Hideaki Yamasaki, Motoko Nakagomi, Junya Oka
  • Patent number: 10738374
    Abstract: There is provided a method of performing a surface treatment with respect to a metal mounting table for mounting a substrate to be plasma-processed, the mounting table functioning as a lower electrode configured to generate a plasma by a high frequency power applied between an upper electrode and the lower electrode. The method includes: performing a first surface treatment by spraying a non-sublimation blast material as a non-sublimation material onto a mounting surface of the metal mounting table on which the substrate is mounted, followed by a second surface treatment by spraying a sublimation blast material as a sublimation material onto the mounting surface.
    Type: Grant
    Filed: January 4, 2017
    Date of Patent: August 11, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Shinya Okabe, Hideaki Yamasaki, Junya Oka, Yuuji Kobayashi, Takamichi Kikuchi
  • Publication number: 20190153597
    Abstract: There is provided a substrate mounting table for use in a plasma-based processing apparatus that performs a plasma-based process on a substrate inside a processing container, which includes a substrate mounting portion having a front surface subjected to a mirroring treatment and on which the substrate is mounted, and an edge portion located around the substrate mounting portion and treated to have an uneven shape.
    Type: Application
    Filed: November 16, 2018
    Publication date: May 23, 2019
    Inventors: Kohichi SATOH, Hideaki YAMASAKI, Motoko NAKAGOMI, Junya OKA
  • Publication number: 20170204505
    Abstract: There is provided a method of performing a surface treatment with respect to a metal mounting table for mounting a substrate to be plasma-processed, the mounting table functioning as a lower electrode configured to generate a plasma by a high frequency power applied between an upper electrode and the lower electrode. The method includes: performing a first surface treatment by spraying a non-sublimation blast material as a non-sublimation material onto a mounting surface of the metal mounting table on which the substrate is mounted, followed by a second surface treatment by spraying a sublimation blast material as a sublimation material onto the mounting surface.
    Type: Application
    Filed: January 4, 2017
    Publication date: July 20, 2017
    Inventors: Shinya OKABE, Hideaki YAMASAKI, Junya OKA, Yuuji KOBAYASHI, Takamichi KIKUCHI