Abstract: A metasurface structure for an antenna. The metasurface structure includes multiple subwavelength units operable to manipulate or control amplitude, phase, polarization, frequency, and momentum of electromagnetic waves for radiation. The metasurface structure may be operably coupled with a waveguide to provide a metasurface antenna. The metasurface structure or the metasurface antenna may be operably coupled with a controller arranged to control it.

Abstract: A metasurface structure for an antenna. The metasurface structure includes multiple subwavelength units operable to manipulate or control amplitude, phase, polarization, frequency, and momentum of electromagnetic waves for radiation. The metasurface structure may be operably coupled with a waveguide to provide a metasurface antenna. The metasurface structure or the metasurface antenna may be operably coupled with a controller arranged to control it.

Abstract: A self-filtering, space-time coding, waveguide-driven metasurface antenna includes at least first and second metal layers, and first dielectric layer between the first and second metal layers. A series of vias is formed in the first dielectric layer. A substrate integrated waveguide (SIW) is formed from the first and second metal layers and from the metal vias in the first dielectric layer. A series of meta-atoms is formed in the first metal layer, each meta-atom including a slot cooperating with two switching elements for switching the meta-atom between an on and off state. Each meta-atom behaves as a magnetic dipole antenna element that radiates electromagnetic waves into free space. In this manner, the propagating guided waves inside the substrate integrated waveguide are converted and molded into arbitrary selected out-of-plane free-space waves in both a frequency domain and a momentum domain.

Abstract: A self-filtering, space-time coding, waveguide-driven metasurface antenna includes at least first and second metal layers, and first dielectric layer between the first and second metal layers. A series of vias is formed in the first dielectric layer. A substrate integrated waveguide (SIW) is formed from the first and second metal layers and from the metal vias in the first dielectric layer. A series of meta-atoms is formed in the first metal layer, each meta-atom including a slot cooperating with two switching elements for switching the meta-atom between an on and off state. Each meta-atom behaves as a magnetic dipole antenna element that radiates electromagnetic waves into free space. In this manner, the propagating guided waves inside the substrate integrated waveguide are converted and molded into arbitrary selected out-of-plane free-space waves in both a frequency domain and a momentum domain.

Abstract: A method of processing a substrate includes forming a first layer having a photosensitive response to incident radiation on the substrate, forming a first pattern in the first layer, and exposing the first pattern to ultra-violet radiation. The exposure of the first pattern to ultra-violet radiation increases the resistance of the first pattern to a developer. The method also includes forming a conformal protective layer over the first pattern and at least a portion of the substrate. The method further includes forming a second layer having a photosensitive response to incident radiation over the conformal protective layer and forming a second pattern in the second layer.

Abstract: Resist compositions containing silicon, boron, or both silicon and boron may be used with ultra-violet lithography processes and extreme ultra-violet (EUV) lithography processes to increase the reactive ion etch resistance of the resist compositions, improve transmission of the resist materials, and to dope substrates.

Abstract: Resist compositions containing silicon, boron, or both silicon and boron may be used with ultra-violet lithography processes and extreme ultra-violet (EUV) lithography processes to increase the reactive ion etch resistance of the resist compositions, improve transmission of the resist materials, and to dope substrates.