Abstract: Provided is a sample processing apparatus management system, sample processing apparatuses and a management apparatus, and a management method that can accurately and easily adjust the respective sample processing apparatuses irrespective of their individual differences. When abnormality has occurred in a sample analyzer, the sample analyzer requests approval for self-adjustment from a management server. The management server determines whether to permit performance of the self-adjustment, and when having determined to permit the self-adjustment, notifies the sample analyzer of the approval for the self-adjustment. When the approval for the self-adjustment has been notified of, the sample analyzer performs the self-adjustment.

Abstract: A sample processing apparatus includes a pipette configured to dispense a sample or a reagent and an arm supporting the pipette. A camera is configured to capture an image of a tip end of the pipette and a container to which the sample or the reagent is dispensed. A controller is programmed to determine, based on the image, an adjustment value for the arm such that the pipette is inserted into the container without collision.

Abstract: A sample processing apparatus includes a pipette configured to dispense a sample or a reagent and an arm supporting the pipette. A camera is configured to capture an image of a tip end of the pipette and a container to which the sample or the reagent is dispensed. A controller is programmed to determine, based on the image, an adjustment value for the arm such that the pipette is inserted into the container without collision.

Abstract: A managing method for a sample processing apparatus involving the sample processing apparatus and a management apparatus. The method includes requesting an approval of self-adjustment to the management apparatus from the sample processing apparatus before performing a self-adjustment. Informing the sample processing apparatus of approval of request from the management apparatus, when approving the sample processing apparatus to perform the self-adjustment, and performing a self-adjustment by the sample processing apparatus when the sample processing apparatus is informed that the request has been approved.

Abstract: A managing method for a sample processing apparatus involving the sample processing apparatus and a management apparatus. The method includes requesting an approval of self-adjustment to the management apparatus from the sample processing apparatus before performing a self-adjustment. Informing the sample processing apparatus of approval of request from the management apparatus, when approving the sample processing apparatus to perform the self-adjustment, and performing a self-adjustment by the sample processing apparatus when the sample processing apparatus is informed that the request has been approved.

Abstract: Provided is a sample processing apparatus management system, sample processing apparatuses and a management apparatus, and a management method that can accurately and easily adjust the respective sample processing apparatuses irrespective of their individual differences. When abnormality has occurred in a sample analyzer, the sample analyzer requests approval for self-adjustment from a management server. The management server determines whether to permit performance of the self-adjustment, and when having determined to permit the self-adjustment, notifies the sample analyzer of the approval for the self-adjustment. When the approval for the self-adjustment has been notified of, the sample analyzer performs the self-adjustment.

Abstract: A particle measuring apparatus surrounds a sample with a sheath liquid to hydrodynamically converge and flow them, and optically measures a particle in the sample to obtain a signal data of the particle. The apparatus provides a monitoring section for comparing a pulse width of the signal data as obtained, with a predetermined standard value to obtain a comparison value and monitoring a flow rate of the sheath liquid based on the comparison value.