Patents by Inventor JURGEN BOSSE

JURGEN BOSSE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230107919
    Abstract: A process for the purification of an aqueous hydrogen peroxide solution includes the following steps: (a) the treatment of an aqueous hydrogen peroxide solution with at least one first reverse osmosis system, (b) the treatment of the obtained hydrogen peroxide solution with at least one first stabilizer, (c) the treatment of the obtained hydrogen peroxide solution with at least one purification mean selected from adsorption resins, ion exchange resins, and combinations thereof. An aqueous hydrogen peroxide solution obtainable thereby is described. The use of the aqueous hydrogen peroxide solution in the manufacture of microelectronic components and semiconductors is also described.
    Type: Application
    Filed: July 1, 2022
    Publication date: April 6, 2023
    Applicant: Solvay SA
    Inventors: Jürgen Bosse, Matthias Dabrunz, Lennart Möhlmann, Josephine Rost
  • Publication number: 20100264360
    Abstract: The present invention relates to the use of at least one oxidant, selected from peracids, in compositions for the processing of semiconductor wafers, in particular for the cleaning and chemical mechanical polishing of semiconductor wafers. The present invention also relates to the use of a composition and composition therefore. The use of the oxidants of the invention leads to a good efficacy while limiting/avoiding the corrosion of the substrate.
    Type: Application
    Filed: April 11, 2008
    Publication date: October 21, 2010
    Applicant: SOLVAY (SOCIETE ANONYME)
    Inventors: Jurgen Bosse, Rocco Alessio, Steve Dobson, Heinz-Joachim Belt
  • Publication number: 20070095755
    Abstract: Process for the purification of aqueous peroxygen solutions comprising the treatment of an aqueous peroxygen solution with (a) at least one membrane purification step, (b) optionally at least one ion exchange purification step, (c) optionally at least one dilution step, and (d) at least one other purification step, all of which can be conducted in any sequence. Aqueous peroxygen solutions having a TOC level of less than 1 mg/kg can be obtained by this process. They can be used in the manufacture of semiconductors.
    Type: Application
    Filed: October 1, 2004
    Publication date: May 3, 2007
    Applicant: SOLVAY (SOCIETE ANONYME)
    Inventors: Robert Owen, Jurgen Bosse, Michael Sell
  • Patent number: 6346266
    Abstract: Plaster for adhesive bonding to the skin, in particular for the covering of relatively small wounds, consisting of a support material which is provided on its bottom side with a dermatologically compatible self-adhesive layer, characterized in that all or part of the top side of the support material bears a long-afterglow imprint consisting of a coating system into which a long-afterglow pigment has been incorporated.
    Type: Grant
    Filed: March 6, 1998
    Date of Patent: February 12, 2002
    Assignee: Beiersdorf AG
    Inventors: Reiner Leutz, Witta Bruss, Jürgen Bosse
  • Publication number: 20010051177
    Abstract: Plaster for adhesive bonding to the skin, in particular for the covering of relatively small wounds, consisting of a support material which is provided on its bottom side with a dermatologically compatible self-adhesive layer, characterized in that all or part of the top side of the support material bears a long-afterglow imprint consisting of a coating system into which a long-afterglow pigment has been incorporated.
    Type: Application
    Filed: March 6, 1998
    Publication date: December 13, 2001
    Inventors: REINER LEUTZ, WITTA BRUSS, JURGEN BOSSE