Patents by Inventor Jurgen F. Wustenhagen

Jurgen F. Wustenhagen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of developing and stripping positive photoresist
    Patent number: 4015986
    Abstract: Baked novolak resin based positive photoresists are either developed after exposure or stripped, following the use of the pattern resist layer as an etch mask, in aqueous solutions of a combination of permanganate and phosphoric acid.
    Type: Grant
    Filed: August 22, 1975
    Date of Patent: April 5, 1977
    Assignee: International Business Machines Corporation
    Inventors: Gabor Paal, Jurgen F. Wustenhagen