Abstract: A mechanically operated proportional flow control valve (8) which a valve spool (9) is described, which is moveable between two end limits limiting a regulating range. A device (20, 22) is described for selectively limiting the regulating range of the valve (8). This device can be used to block “locked-in” positions (F1, RH1) of the spool (9) at the end limits of the regulating range. The device includes a locking bar 20 which has locking formations (28, 29) which engage a pin (22) on a lever (11) connected with the spool (9).

Abstract: The invention concerns a vibration-decoupling device for a hydraulic circuit and in particular concerns a vibration-decoupling device for a hydraulic circuit used in an agricultural vehicle. The device has a fluid transfer element (3) able to be connected at one end (4) to a high pressure outlet of a hydraulic pump (1) and to transport fluid expelled from the pump. The another end (5) of the fluid transfer element (3) is moveably connected with a fixed element (11) such as a gear assembly housing so that the fluid can be passed to a hydraulic consumer. A support element (9) is moveably connected with the fixed element (11) and the fluid transfer element (3) and acts so that a force is exerted on the fluid transfer element (3) in one direction while the other end (5) of the fluid transfer element (3) and the fixed element (11) remain securely connected together.

Abstract: Pharmaceutical compositions comprising anti-teratogenic agents are disclosed. Additionally, pharmaceutical compositions comprising anti-neoplastic agents and anti-teratogenic agents are disclosed. Methods of assessing the teratogenicity of a compound are disclosed. The present invention further comprises applications of the aforementioned compositions and methods.

Abstract: The invention concerns a vibration-decoupling device for a hydraulic circuit and in particular concerns a vibration-decoupling device for a hydraulic circuit used in an agricultural vehicle. The device has a fluid transfer element (3) able to be connected at one end (4) to a high pressure outlet of a hydraulic pump (1) and to transport fluid expelled from the pump. The another end (5) of the fluid transfer element (3) is moveably connected with a fixed element (11) such as a gear assembly housing so that the fluid can be passed to a hydraulic consumer. A support element (9) is moveably connected with the fixed element (11) and the fluid transfer element (3) and acts so that a force is exerted on the fluid transfer element (3) in one direction while the other end (5) of the fluid transfer element (3) and the fixed element (11) remain securely connected together.

Abstract: Pharmaceutical compositions comprising anti-teratogenic agents are disclosed. Additionally, pharmaceutical compositions comprising anti-neoplastic agents and anti-teratogenic agents are disclosed. Methods of assessing the teratogenicity of a compound are disclosed. The present invention further comprises applications of the aforementioned compositions and methods.

Abstract: A mechanically operated proportional flow control valve (8) which a valve spool (9) is described, which is moveable between two end limits limiting a regulating range. A device (20, 22) is described for selectively limiting the regulating range of the valve (8). This device can be used to block “locked-in” positions (F1, RH1) of the spool (9) at the end limits of the regulating range. The device includes a locking bar 20 which has locking formations (28, 29) which engage a pin (22) on a lever (11) connected with the spool (9).

Abstract: A reversible driving arrangement for a tractor or any other vehicle in which a driver's operating station (10) including a seat (11), control panel (13) and steering wheel (12) can be rotated between a forward driving position and a reverse driving position. The operating station (10) is rotatably mounted on a floor of the vehicle via a fluid pressure operated rotary actuator (14) which includes a radially extending vane (28) which can be pressurised on one side or the other to assist in rotating the operating station between the forward and reverse driving positions. The rotary actuator is preferably pneumatically operated and part (22b, 22c) of the operator's station (10) pivots upwardly to a retracted position prior to rotation between the forward and reverse driving positions to reduce the overhang of the station.

Abstract: Auxiliary openings are assigned to openings on a mask to be transferred to a wafer. These auxiliary openings have a phase-shifting property, preferably between 160° and 200° with respect to the openings, and a cross section lying below the limiting dimension for the printing of the projection apparatus, so that the auxiliary openings themselves are not printed onto the wafer. However, the auxiliary openings do enhance the contrast of the aerial image, in particular of an associated, isolated or semi-isolated opening on the wafer. The auxiliary openings may have a distance from the opening that lies above the resolution limit of the projection apparatus but that is less than the coherence length of the light used for the projection. A phase-related utilization of the optical proximity effect results, which can produce elliptical structures from square openings on the mask when the auxiliary openings are disposed in the preferential direction.

Abstract: A photolithographic fabrication method for a microstructure on a substrate, in particular interconnects of a DRAM (dynamic random access memory), includes a first exposure with at least one alternating phase mask. Then, at least one postexposure is carried out after the first exposure with a trimming mask. The trimming mask has at least two trimming openings for producing at least one alternating phase shift. Postexposure even of very small parts of microstructures is thus possible, so that the entire microstructure can be arranged in a space-saving manner on the substrate.

Abstract: Auxiliary openings are assigned to openings on a mask to be transferred to a wafer. These auxiliary openings have a phase-shifting property, preferably between 160° and 200° with respect to the openings, and a cross section lying below the limiting dimension for the printing of the projection apparatus, so that the auxiliary openings themselves are not printed onto the wafer. However, the auxiliary openings do enhance the contrast of the aerial image, in particular of an associated, isolated or semi-isolated opening on the wafer. The auxiliary openings may have a distance from the opening that lies above the resolution limit of the projection apparatus but that is less than the coherence length of the light used for the projection. A phase-related utilization of the optical proximity effect results, which can produce elliptical structures from square openings on the mask when the auxiliary openings are disposed in the preferential direction.

Abstract: A carrier has a surface with a mask layer thereon. An irradiation-sensitive layer on the mask layer is exposed and developed to form a first exposure structure. The first exposure structure is used as an etching mask while the mask layer is etched. The first exposure structure is subsequently removed. A second irradiation-sensitive layer is applied to the mask layer and the carrier. The second irradiation-sensitive layer is exposed with a first exposure dose and a second exposure dose. The second irradiation-sensitive layer is subsequently developed to form a second exposure structure with a first and second exposure structure thickness. The carrier is etched down to a first etching depth in the region of the first exposure structure thickness and down to a second etching depth in the region of the second exposure structure thickness. The first etching depth is larger than the second etching depth.

Abstract: A photolithographic fabrication method for a microstructure on a substrate, in particular interconnects of a DRAM, includes a first exposure with at least one alternating phase mask. Then, at least one postexposure is carried out after the first exposure with a trimming mask. The trimming mask has at least two trimming openings for producing at least one alternating phase shift. Postexposure even of very small parts of microstructures is thus possible, so that the entire microstructure can be arranged in a space-saving manner on the substrate.

Abstract: For lithographically producing the smallest structures at less than the exposure wavelengths in semiconductor fabrication, a double exposure is carried out using a thick phase mask and a trimming mask, the trimming mask further structures the phase-contrast lines produced by the phase mask. Besides transparent or opaque regions, the trimming mask also has phase-shifting regions. These surround transparent regions of the trimming mask through which the phase-contrast lines produced by the first mask are locally re-exposed, that is to say interrupted. The intensity profile of successive line sections is especially rich in contrast through the addition of the phase-shifting partially transparent regions on the second mask; the distances between the line sections can be reduced. The trimming mask, otherwise used only for larger structures, is therefore suitable for the configuration of the finest dimensionally critical structures.

Abstract: A carrier has a surface with a mask layer thereon. An irradiation-sensitive layer on the mask layer is exposed and developed to form a first exposure structure. The first exposure structure is used as an etching mask while the mask layer is etched. The first exposure structure is subsequently removed. A second irradiation-sensitive layer is applied to the mask layer and the carrier. The second irradiation-sensitive layer is exposed with a first exposure dose and a second exposure dose. The second irradiation-sensitive layer is subsequently developed to form a second exposure structure with a first and second exposure structure thickness. The carrier is etched down to a first etching depth in the region of the first exposure structure thickness and down to a second etching depth in the region of the second exposure structure thickness. The first etching depth is larger than the second etching depth.

Abstract: A process is provided for the preparation of dibasic propellant charge powder by a solvent-free process, in which a continuous flow of raw powder mixture moist with water is kneaded at an elevated temperature in a set of shearing rollers, to which the raw powder mixture is continuously supplied and at one end of which the gelatinized mass is continuously removed and immediately continuously granulated. The resulting granulate is continuously delivered to an extruder by means of which it is moulded into powder strands which are worked up into the finished powder by cutting and an end treatment. The process requires only small quantities of powder within the kneading equipment and thus provides a safe and efficient continuous manufacturing facility.