Abstract: A method and apparatus for improving measurement accuracy in a gas monitoring system is provided. The apparatus can be connected to a plurality of gas sample lines each containing a gas sample. The gas samples are routed through a number of delivery channels which are fewer in number than the plurality of sample lines. Each delivery channel is alternatively coupled to a detector which identifies contaminants present in the gas samples. Each delivery channel includes a voltage sensitive orifice (VSO). The VSO's are operated by a controller and provide gas samples at a constant flow and a constant pressure to the detector independent of the length of the gas sample line being measured.

Abstract: The present invention relates to a system and method for sampling a gas flow to measure one or more contaminants within a semiconductor processing tool. The system includes a portable unit containing one or more dry traps, Tenax traps and, if desired, wet impingers. The unit is coupled to a gas flow in a clean room and the dry traps. Tenax traps and wet impingers measure contaminants contained in the gas supply for a determined sampling interval. When the sampling interval is done, the unit is sent to an analysis facility for processing.

Abstract: The present invention relates to a system and method for sampling a gas flow to measure one or more contaminants within a semiconductor processing tool. The system includes a portable unit containing one or more dry traps, Tenax traps and, if desired, wet impingers. The unit is coupled to a gas flow in a clean room and the dry traps. Tenax traps and wet impingers measure contaminants contained in the gas supply for a determined sampling interval. When the sampling interval is done, the unit is sent to an analysis facility for processing.