Patents by Inventor Jurgen Pahlitzsch

Jurgen Pahlitzsch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of producing alignment marks
    Patent number: 6635567
    Abstract: Alignment marks (overlay marks or alignment markers) are produced in a semiconductor structure with integrated circuits. Contact holes and alignment trenches are etched into an insulator layer and in each case open out at a first metal layer at their undersides. Metal is deposited into the alignment trenches and the contact holes. With a subsequent chemical mechanical polishing procedure, the metal areas are lowered in the region of the alignment trenches and form profiles for the alignment marks in a second metal layer, which is deposited on the insulator layer.
    Type: Grant
    Filed: January 11, 2001
    Date of Patent: October 21, 2003
    Assignee: Infineon Technologies AG
    Inventors: Eva Ebertseder, Matthias Lehr, Torsten Werneke, Jochen Hanebeck, Jürgen Pahlitzsch
  • Method of producing alignment marks
    Publication number: 20010019880
    Abstract: Alignment marks (overlay marks or alignment markers) are produced in a semiconductor structure with integrated circuits. Contact holes and alignment trenches are etched into an insulator layer and in each case open out at a first metal layer at their undersides. Metal is deposited into the alignment trenches and the contact holes. With a subsequent chemical mechanical polishing procedure, the metal areas are lowered in the region of the alignment trenches and form profiles for the alignment marks in a second metal layer, which is deposited on the insulator layer.
    Type: Application
    Filed: January 11, 2001
    Publication date: September 6, 2001
    Inventors: Eva Ebertseder, Matthias Lehr, Torsten Werneke, Jochen Hanebeck, Jurgen Pahlitzsch