Patents by Inventor Jurgen Soechtig

Jurgen Soechtig has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10377094
    Abstract: The invention relates to wafer-level manufacturing of optical devices such as modules comprising micro-lenses. In one aspect, passive optical components such as truncated lenses are manufactured by providing a substrate on which a multitude of precursor optical structures is present; and removing material from each of said multitude of precursor optical structures. Another aspect comprises a method for manufacturing a device comprising a set of at least two passive optical components, said method comprising the steps of using a tool obtained by carrying out the steps of manufacturing a precursor tool having a replication surface; and modifying said replication surface by removing material from said precursor tool.
    Type: Grant
    Filed: September 3, 2013
    Date of Patent: August 13, 2019
    Assignee: ams Sensors Singapore Pte. Ltd.
    Inventors: Hartmut Rudmann, Jürgen Soechtig, Nicola Spring, Alexander Bietesch
  • Publication number: 20150217524
    Abstract: The invention relates to wafer-level manufacturing of optical devices such as modules comprising micro-lenses. In one aspect, passive optical components such as truncated lenses are manufactured by providing a substrate on which a multitude of precursor optical structures is present; and removing material from each of said multitude of precursor optical structures. Another aspect comprises a method for manufacturing a device comprising a set of at least two passive optical components, said method comprising the steps of using a tool obtained by carrying out the steps of manufacturing a precursor tool having a replication surface; and modifying said replication surface by removing material from said precursor tool.
    Type: Application
    Filed: September 3, 2013
    Publication date: August 6, 2015
    Inventors: Hartmut Rudmann, Jürgen Soechtig, Nicola Spring, Alexander Bietesch
  • Publication number: 20020191286
    Abstract: A method of mass producing polarizes comprises designing by rigorous diffraction theory an optimized grating profile, replicating the profile in a polymer or other substrate, and slope evaporating a metal onto the substrate. The angle of slope evaporation, the metal, and the thickness of the metal are optimized for a given wavelength using rigorous diffraction theory.
    Type: Application
    Filed: March 11, 2002
    Publication date: December 19, 2002
    Inventors: Michael Gale, Jurgen Soechtig, Christian Zschokke, Marc Schnieper