Patents by Inventor Juri Vinshtein

Juri Vinshtein has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for X-ray scatterometry
    Patent number: 11169099
    Abstract: A method for X-ray scatterometry includes receiving a first distribution of an X-ray beam scattered from a sample. The first distribution exhibits asymmetry with respect to a reference axis. A correction is applied to the first distribution, so as to produce a second distribution in which a level of the asymmetry is reduced relative to the first distribution. One or more parameters of the sample are estimated based on the second distribution.
    Type: Grant
    Filed: July 18, 2019
    Date of Patent: November 9, 2021
    Assignee: BRUKER TECHNOLOGIES LTD.
    Inventors: Alex Krokhmal, Alex Dikopoltsev, Juri Vinshtein
  • Method and apparatus for X-ray scatterometry
    Patent number: 10684238
    Abstract: A method for X-ray scatterometry includes receiving a first distribution of an X-ray beam scattered from a sample. The first distribution exhibits asymmetry with respect to a reference axis. A correction is applied to the first distribution, so as to produce a second distribution in which a level of the asymmetry is reduced relative to the first distribution. One or more parameters of the sample are estimated based on the second distribution.
    Type: Grant
    Filed: January 5, 2017
    Date of Patent: June 16, 2020
    Assignee: BRUKER TECHNOLOGIES LTD.
    Inventors: Alex Krokhmal, Alex Dikopoltsev, Juri Vinshtein
  • METHOD AND APPARATUS FOR X-RAY SCATTEROMETRY
    Publication number: 20190339215
    Abstract: A method for X-ray scatterometry includes receiving a first distribution of an X-ray beam scattered from a sample. The first distribution exhibits asymmetry with respect to a reference axis. A correction is applied to the first distribution, so as to produce a second distribution in which a level of the asymmetry is reduced relative to the first distribution. One or more parameters of the sample are estimated based on the second distribution.
    Type: Application
    Filed: July 18, 2019
    Publication date: November 7, 2019
    Inventors: Alex Krokhmal, Alex Dikopoltsev, Juri Vinshtein
  • METHOD AND APPARATUS FOR X-RAY SCATTEROMETRY
    Publication number: 20170199136
    Abstract: A method for X-ray scatterometry includes receiving a first distribution of an X-ray beam scattered from a sample. The first distribution exhibits asymmetry with respect to a reference axis. A correction is applied to the first distribution, so as to produce a second distribution in which a level of the asymmetry is reduced relative to the first distribution. One or more parameters of the sample are estimated based on the second distribution.
    Type: Application
    Filed: January 5, 2017
    Publication date: July 13, 2017
    Inventors: Alex Krokhmal, Alex Dikopoltsev, Juri Vinshtein