Patents by Inventor Jurriaan Hendrik Koenraad Van Schaik

Jurriaan Hendrik Koenraad Van Schaik has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Deposition Method and Apparatus
    Publication number: 20150343461
    Abstract: A method for depositing a protective layer of material on a localized area on a substrate, such as a pattern of photo resist, includes forming a controlled environment around the substrate and positioning a hollow needle adjacent to the localized area on the substrate. A liquid comprising the material is directed through the hollow needle onto the localized area, so as to deposit a layer of the material on the localized area. The layer of material may act as a Z-contrast forming layer in TEM.
    Type: Application
    Filed: August 12, 2015
    Publication date: December 3, 2015
    Applicant: ASML Netherlands B.V.
    Inventors: Bartolomeus Petrus RIJPERS, Jurriaan Hendrik Koenraad VAN SCHAIK
  • Deposition method and apparatus
    Patent number: 9116086
    Abstract: A method for depositing a protective layer of material on a localized area on a substrate, such as a pattern of photo resist, includes forming a controlled environment around the substrate and positioning a hollow needle adjacent to the localized area on the substrate. A liquid comprising the material is directed through the hollow needle onto the localized area, so as to deposit a layer of the material on the localized area. The layer of material may act as a Z-contrast forming layer in TEM.
    Type: Grant
    Filed: June 16, 2010
    Date of Patent: August 25, 2015
    Assignee: ASML Netherlands B.V.
    Inventors: Bartolomeus Petrus Rijpers, Jurriaan Hendrik Koenraad Van Schaik
  • Deposition Method and Apparatus
    Publication number: 20100330280
    Abstract: A method for depositing a protective layer of material on a localized area on a substrate, such as a pattern of photo resist, includes forming a controlled environment around the substrate and positioning a hollow needle adjacent to the localized area on the substrate. A liquid comprising the material is directed through the hollow needle onto the localized area, so as to deposit a layer of the material on the localized area. The layer of material may act as a Z-contrast forming layer in TEM.
    Type: Application
    Filed: June 16, 2010
    Publication date: December 30, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Bartolomeus Petrus Rijpers, Jurriaan Hendrik Koenraad Van Schaik