Abstract: A moisture sensor comprising a flat substrate, a moisture sensitive layer formed by spraying, and a tape heater formed by spraying. On a surface of the flat substrate made of monocrystalline silicon, a silicon dioxide film is formed by thermal oxidation, which functions as an insulation layer. The flat substrate is subjected to two-step etching. First, windows are etched in silicon dioxide film on both sides, opposite each other, a tape heater is deposited on one of the surfaces of the flat substrate and the unetched part of the silicon dioxide film. Windows are then etched in the other side of the flat substrate matched with the windows in the silicon dioxide film. A moisture-sensitive layer is further sprayed on the both sides of the tape heater located above the window in the flat substrate. The tape heater additionally functioning as a sensitive element with terminals.