Abstract: A light guide comprising a polymeric layer at least 25 percent transmissive over at least a 30 nm bandwidth in a wavelength range from 180 to 280 nm over a distance of at least 100 micrometers and visible light transparent reflecting layers (UV-C mirror) that are at least 50 percent reflective over at least 30 nm bandwidth in a wavelength range from 180 to 280 nm over an incident light angle of 0 to 90 degrees and that are at least 25 percent transmissive of visible light over at least 30 nm bandwidth in a wavelength range of 400 to 800 nm over an incident light angle of 0 to 90 degrees. The light guide is useful, for example, for antimicrobial surfaces.

Abstract: A tool for cleaning semiconductor wafers includes a cleaning head with a flat face bounded by an edge. A tubular drive shaft is connected to the cleaning head and provides a conduit through which a cleaning fluid can flow. An opening into the shaft is provided in the flat face which also has a plurality of channels to distribute the cleaning fluid across the flat face. A brush is formed as a single piece of porous, elastic material with a substrate portion that has a first major surface abutting the cleaning head face. A lip of the brush extends from the substrate portion around the edge of the flat face to removably secure the brush to the cleaning head. The brush has a plurality of cylindrical nubs on the second major surface forming projections for scrubbing surfaces of semiconductor wafers.