Patents by Inventor Justin Johannes Hermanus Gerritzen
Justin Johannes Hermanus Gerritzen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11846879Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.Type: GrantFiled: November 7, 2022Date of Patent: December 19, 2023Assignee: ASML NETHERLAND B.V.Inventors: Giovanna De Simone, Marco Adrianus Peter Van Den Heuvel, Thibault Simon Mathieu Laurent, Ruud Hendrikus Martinus Johannes Bloks, Niek Jacobus Johannes Roset, Justin Johannes Hermanus Gerritzen
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Publication number: 20230260820Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.Type: ApplicationFiled: April 24, 2023Publication date: August 17, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Andre Bernardus JEUNINK, Robby Franciscus Josephus MARTENS, Youssef Karel Maria DE VOS, Ringo Petrus Cornelis VAN DORST, Gerhard Albert TEN BRINKE, Dirk Jerome Andre SENDEN, Coen Hubertus Matheus BALTIS, Justin Johannes Hermanus GERRITZEN, Jelmer Mattheüs KAMMINGA, Evelyn Wallis PACITTI, Thomas POIESZ, Arie Cornelis SCHEIBERLICH, Bert Dirk SCHOLTEN, André SCHREUDER, Abraham Alexander SOETHOUDT, Siegfried Alexander TROMP, Yuri Johannes Gabriël VAN DE VIJVER
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Patent number: 11664264Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.Type: GrantFiled: December 22, 2016Date of Patent: May 30, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Andre Bernardus Jeunink, Robby Franciscus Josephus Martens, Youssef Karel Maria De Vos, Ringo Petrus Cornelis Van Dorst, Gerhard Albert Ten Brinke, Dirk Jerome Andre Senden, Coen Hubertus Matheus Baltis, Justin Johannes Hermanus Gerritzen, Jelmer Mattheüs Kamminga, Evelyn Wallis Pacitti, Thomas Poiesz, Arie Cornelis Scheiberlich, Bert Dirk Scholten, André Schreuder, Abraham Alexander Soethoudt, Siegfried Alexander Tromp, Yuri Johannes Gabriël Van De Vijver
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Publication number: 20230054421Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.Type: ApplicationFiled: November 7, 2022Publication date: February 23, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Giovanna DE SIMONE, Marco Adrianus Peter VAN DEN HEUVEL, Thibault Simon Mathieu LAURENT, Ruud Hendrikus Martinus Johannes BLOKS, Niek Jacobus Johannes ROSET, Justin Johannes Hermanus GERRITZEN
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Patent number: 11500296Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.Type: GrantFiled: November 5, 2021Date of Patent: November 15, 2022Assignee: ASML Netherlands B.V.Inventors: Giovanna De Simone, Marco Adrianus Peter Van Den Heuvel, Thibault Simon Mathieu Laurent, Ruud Hendrikus Martinus Johannes Bloks, Niek Jacobus Johannes Roset, Justin Johannes Hermanus Gerritzen
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Patent number: 11385547Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.Type: GrantFiled: May 21, 2020Date of Patent: July 12, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Gijs Kramer, Martijn Houben, Nicholas Peter Waterson, Thibault Simon Mathieu Laurent, Yuri Johannes Gabriël Van De Vijver, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Vincentius Fransiscus Cloosterman, Siegfried Alexander Tromp, Coen Hubertus Matheus Baltis, Justin Johannes Hermanus Gerritzen, Niek Jacobus Johannes Roset
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Publication number: 20220057722Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.Type: ApplicationFiled: November 5, 2021Publication date: February 24, 2022Applicant: ASML NETHERLANDS B.V.Inventors: Giovanna DE SIMONE, Marco Adrianus Peter VAN DEN HEUVEL, Thibault Simon Mathieu LAURENT, Ruud Hendrikus Martinus Johannes BLOKS, Niek Jacobus Johannes ROSET, Justin Johannes Hermanus GERRITZEN
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Patent number: 11175594Abstract: A method of unloading an object from a support table, the object clamped to the support table during an exposure process by: applying a first pressure to a central region of the support table under a central portion of the object; and applying a second pressure to a peripheral region of the support table under a peripheral portion of the object, wherein during clamping the first pressure and the second pressure are controlled such that liquid is retained between the object and a seal member that is positioned radially between the central region and the peripheral region at an upper surface of the support table and protrudes towards the object, the method including: increasing the first pressure towards ambient pressure; removing at least some of the liquid retained between the object and the seal member by decreasing the second pressure; and increasing the second pressure towards the ambient pressure.Type: GrantFiled: May 3, 2018Date of Patent: November 16, 2021Assignee: ASML Netherlands B.V.Inventors: Giovanna De Simone, Marco Adrianus Peter Van Den Heuvel, Thibault Simon Mathieu Laurent, Ruud Hendrikus Martinus Johannes Bloks, Niek Jacobus Johannes Roset, Justin Johannes Hermanus Gerritzen
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Publication number: 20200285154Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.Type: ApplicationFiled: May 21, 2020Publication date: September 10, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Gijs KRAMER, Martijn HOUBEN, Nicholas Peter WATERSON, Thibault Simon Mathieu LAURENT, Yuri Johannes Gabriël VAN DE VIJVER, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Vincentius Fransiscus CLOOSTERMAN, Siegfried Alexander TROMP, Coen Hubertus Matheus Matheus BALTIS, Justin Johannes Hermanus GERRITZEN, Niek Jacobus Johannes ROSET
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Patent number: 10705426Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.Type: GrantFiled: April 5, 2017Date of Patent: July 7, 2020Assignee: ASML Netherlands B.V.Inventors: Gijs Kramer, Martijn Houben, Nicholas Peter Waterson, Thibault Simon Mathieu Laurent, Yuri Johannes Gabriël Van De Vijver, Marcus Martinus Petrus Adrianus Vermeulen, Simon Karel Ravensbergen, Vincentius Fransiscus Cloosterman, Siegfried Alexander Tromp, Coen Hubertus Matheus Baltis, Justin Johannes Hermanus Gerritzen, Niek Jacobus Johannes Roset
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Patent number: 10656536Abstract: A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.Type: GrantFiled: April 23, 2015Date of Patent: May 19, 2020Assignee: ASML Netherlands B.V.Inventors: Martinus Hendrikus Antonius Leenders, Niek Elout De Kruijf, Mircea Dusa, Martijn Houben, Johannes Gerardus Maria Mulder, Thomas Poiesz, Marco Adrianus Peter Van Den Heuvel, Paul Van Dongen, Justin Johannes Hermanus Gerritzen, Antonie Hendrik Verweij, Abraham Alexander Soethoudt
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Publication number: 20190163066Abstract: An extraction body for a support apparatus of a lithographic apparatus. The support apparatus is configured to support an object. The extraction body is formed with an opening at a surface thereof. The opening extends within the extraction body forming a first passageway. The first passageway is configured to fluidly communicate an extraction channel in the extraction body to liquid between the surface and the object. A first pressure in the extraction channel is less than ambient pressure. At least a part of the first passageway is sized and dimensioned such that when the liquid enters the first passageway via the opening, a second pressure in the first passageway associated with surface tension of the liquid is lower than the first pressure such that at least a portion of the liquid is retained in the first passageway.Type: ApplicationFiled: April 5, 2017Publication date: May 30, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Gijs KRAMER, Martijn HOUBEN, Nicholas Peter WATERSON, Thibault Simon Mathieu LAURENT, Yuri Johannes Gabriël VAN DE VIJVER, Marcus Martinus Petrus Adrianus VERMEULEN, Simon Karel RAVENSBERGEN, Vincentius Fransiscus CLOOSTERMAN, Siegfried Alexander TROMP, Coen Hubertus Matheus BALTIS, Justin Johannes Hermanus GERRITZEN, Niek Jacobus Johannes ROSET
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Publication number: 20190043749Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.Type: ApplicationFiled: December 22, 2016Publication date: February 7, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Andre Bernardus JEUNINK, Robby Franciscus Josephus MARTENS, Youssef Karel Maria DE VOS, Ringo Petrus Cornelis VAN DORST, Gerhard Albert TEN BRINKE, Dirk Jerome Andre SENDEN, Coen Hubertus Matheus BALTIS, Justin Johannes Hermanus GERRITZEN, Jelmer Mattheüs KAMMINGA, Evelyn Wallis PACITTI, Thomas POIESZ, Arie Cornelis SCHEIBERLICH, Bert Dirk SCHOLTEN, André SCHREUDER, Abraham Alexander SOETHOUDT, Siegfried Alexander TROMP, Yuri Johannes Gabriël VAN DE VIJVER
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Publication number: 20170192359Abstract: A substrate support, includes: a substrate support location configured to support a substrate, and a vacuum clamping device configured to clamp the substrate on the substrate support location, wherein the vacuum clamping device includes at least one reduced pressure source to create a reduced pressure, at least one vacuum section connected to the at least one reduced pressure source, wherein the at least one vacuum section is configured to attract the substrate towards the substrate support location, and a control device configured to control a spatial pressure profile along the at least one vacuum section with which the substrate is attracted by the vacuum clamping device, wherein the control device includes a substrate shape data input to receive substrate shape data representing shape data of the substrate to be clamped, and wherein the control device is configured to adapt the spatial pressure profile in dependency of the substrate shape data.Type: ApplicationFiled: April 23, 2015Publication date: July 6, 2017Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Martinus Hendrikus Antonius LEENDERS, Niek Elout DE KRUIJF, Mircea DUSA, Martijn HOUBEN, Johannes Gerardus Maria MULDER, Thomas POIESZ, Marco Adrianus Peter VAN DEN HEUVEL, Paul VAN DONGEN, Justin Johannes Hermanus GERRITZEN, Antonie Hendrik VER WEIJ, Abraham Alexander SOETHOUDT
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Patent number: 8988657Abstract: A lithographic apparatus having a component that moves in a first direction, the component including a passive gas flow system. The passive gas flow system has a gas inlet to drive gas into the passive gas flow system when the component moves in the first direction and a gas outlet, connected to the gas inlet by a gas conduit, to direct the gas that is driven into the passive gas flow system in a certain direction.Type: GrantFiled: July 3, 2012Date of Patent: March 24, 2015Assignee: ASML Netherlands B.V.Inventors: Frank Johannes Jacobus Van Boxtel, Jeroen Gerard Gosen, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens, Jean-Philippe Xavier Van Damme, Peter Schoenmakers, Franciscus Joannes Anthonius Evers, Jaap Wilhelmus Petrus Van Empel, Léon Hubert Joseph Coumans, Justin Johannes Hermanus Gerritzen
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Publication number: 20130010270Abstract: A lithographic apparatus having a component that moves in a first direction, the component including a passive gas flow system. The passive gas flow system has a gas inlet to drive gas into the passive gas flow system when the component moves in the first direction and a gas outlet, connected to the gas inlet by a gas conduit, to direct the gas that is driven into the passive gas flow system in a certain direction.Type: ApplicationFiled: July 3, 2012Publication date: January 10, 2013Applicant: ASML NETHERLANDS B.V.Inventors: Frank Johannes Jacobus VAN BOXTEL, Jeroen Gerard Gosen, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens, Jean-Philippe Xavier Van Damme, Peter Schoenmakers, Franciscus Joannes Anthonius Evers, Jaap Wilhelmus Petrus Van Empel, Léon Hubert Joseph Coumans, Justin Johannes Hermanus Gerritzen