Abstract: A system for dispensing beverages into a receptacle controls both the dispense flow rate of a carbonated beverage and also uses bottom filling of the receptacle to limit entrainment and bubble formation during the dispense process. More particularly, the present application provides for using two separate flow paths for dispensing beverage with a first path employed initially for a low flow rate and a second path employed thereafter to fill the receptacle.

Abstract: A system for dispensing beverages into a receptacle controls both the dispense flow rate of a carbonated beverage and also uses bottom filling of the receptacle to limit entrainment and bubble formation during the dispense process. More particularly, the present application provides for using two separate flow paths for dispensing beverage with a first path employed initially for a low flow rate and a second path employed thereafter to fill the receptacle.

Abstract: The present application relates generally to a system which provides for cleaning of beverage supply lines and fittings. More particularly, the system provides for equalizing of flows and pressures between parallel beverage lines being cleaned.

Abstract: The present application relates generally to a system which provides for cleaning of beverage supply lines and fittings. More particularly, the system provides for equalising of flows and pressures between parallel beverage lines being cleaned.

Abstract: A plasma system (1) has a circuit including a DC source (6), a power supply line (9), an electrodes (2, 3), and a return line (18). A perturbation signal source (8) delivers a perturbation signal into the circuit in addition to DC voltage from the DC source (6). Acquisition (10) and analysis (11) systems measure response to the perturbation. The analysis system (11) measures variation in impedance of the circuit and phase between voltage and current in the circuit. It also uses a frequency domain reflectrometry technique to measure signal reflection modulus of a supply line of the circuit over a defined frequency range.

Abstract: A plasma system (1) has a circuit including a DC source (6), a power supply line (9), an electrodes (2, 3), and a return line (18). A perturbation signal source (8) delivers a perturbation signal into the circuit in addition to DC voltage from the DC source (6). Acquisition (10) and analysis (11) systems measure response to the perturbation. The analysis system (11) measures variation in impedance of the circuit and phase between voltage and current in the circuit. It also uses a frequency domain reflectrometry technique to measure signal reflection modulus of a supply line of the circuit over a defined frequency range.

Abstract: A method for detecting electrical arcing in a plasma process powered by an AC source comprises the steps of sampling at least one Fourier component of the AC source waveform distorted by the non-linear response of the plasma, determining when a change in amplitude of the component, irrespective of the direction of the change, exceeds any one of a plurality of different threshold levels, and determining the duration that each such threshold is exceeded. Each threshold is a predetermined fraction of a running average of the amplitude of the component.

Abstract: A method of fault identification in a plasma process powered by an RF source comprises initially determining, in respect of a given baseline plasma process, the changes in magnitude of a plurality of Fourier components of the RF source resulting from changes in a plurality of the process input parameters from their baseline values. These magnitude changes are stored as reference data. During a subsequent production run, the plasma process is monitored for faults and if one is found the baseline process is repeated with input parameter values nominally the same as the original baseline values. The changes in the Fourier components from the original baseline values are determined and compared with the reference data to determine which input parameter(s) have changed.