Patents by Inventor Justin Lloyd

Justin Lloyd has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12298257
    Abstract: Systems, apparatuses, and methods are provided for detecting a particle on a substrate surface. An example method can include receiving, by a grating structure, coherent radiation from a radiation source. The method can further include generating, by the grating structure, a focused coherent radiation beam based on the coherent radiation. The method can further include transmitting, by the grating structure, the focused coherent radiation beam toward a region of a surface of a substrate. The method can further include receiving, by the grating structure, photons scattered from the region in response to illuminating the region with the focused coherent radiation beam. The method can further include measuring, by a photodetector, the photons received by the grating structure. The method can further include generating, by the photodetector and based on the measured photons, an electronic signal for detecting a particle located in the region of the surface of the substrate.
    Type: Grant
    Filed: June 9, 2021
    Date of Patent: May 13, 2025
    Assignee: ASML Netherlands B.V.
    Inventors: Ilse Van Weperen, Arjan Johannes Anton Beukman, Mohamed Swillam, Justin Lloyd Kreuzer, Stephen Roux
  • Publication number: 20250130512
    Abstract: Systems, apparatuses, and methods are provided for measuring intensity using off-axis illumination. An example method can include illuminating a region of a surface of a substrate with a first radiation beam at a first incident angle and, in response, measuring a first set of photons diffracted from the region. The example method can further include illuminating the region with a second radiation beam at a second incident angle and, in response, measuring a second set of photons diffracted from the region. The example method can further include generating measurement data for the region based on the measured first set of photons and the measured second set of photons.
    Type: Application
    Filed: July 21, 2022
    Publication date: April 24, 2025
    Applicant: ASML Netherlands B.V.
    Inventors: Mohamed SWILLAM, Stephen ROUX, Justin Lloyd KREUZER, Roxana REZVANI NARAGHI
  • Patent number: 12269458
    Abstract: Systems and methods are described for emissions control of a hybrid vehicle. An instruction to switch from a combustion engine power mode of the hybrid vehicle to an electric power mode of the hybrid vehicle is received. A temperature of a catalyst associated with a combustion engine of the hybrid vehicle is identified, where exhaust gases from the combustion engine are passed over the catalyst. If the temperature of the catalyst is at, or above, a threshold level, the hybrid vehicle is switched to the electric power mode, and the combustion engine is switched off. If the temperature of the catalyst is below the threshold level, the hybrid vehicle is switched to the electric power mode, and the catalyst temperature is maintained at, or above, the threshold level.
    Type: Grant
    Filed: November 2, 2022
    Date of Patent: April 8, 2025
    Assignee: Ford Global Technologies, LLC
    Inventors: Peter Deakin, Justin Lloyd
  • Patent number: 12216414
    Abstract: Systems, apparatuses, and methods are provided for determining the alignment of a substrate. An example method can include emitting a multi-wavelength radiation beam including a first wavelength and a second wavelength toward a region of a surface of a substrate. The example method can further include measuring a first diffracted radiation beam indicative of first order diffraction at the first wavelength in response to an irradiation of the region by the multi-wavelength radiation beam. The example method can further include measuring a second diffracted radiation beam indicative of first order diffraction at the second wavelength in response to the irradiation of the region by the multi-wavelength radiation beam. Subsequently, the example method can include generating, based on the measured first set of photons and the measured second set of photons, an electronic signal for use in determining an alignment position of the substrate.
    Type: Grant
    Filed: June 9, 2021
    Date of Patent: February 4, 2025
    Assignee: ASML Holding N.V.
    Inventors: Mohamed Swillam, Justin Lloyd Kreuzer, Stephen Roux
  • Patent number: 12135505
    Abstract: A metrology system comprises a radiation source, an optical element, first and second detectors, an integrated optical device comprising a multimode waveguide, and a processor. The radiation source generates radiation. The optical element directs radiation toward a target to generate scattered radiation from the target. The first detector receives a first portion of the scattered radiation and generates a first detection signal based on the received first portion. The multimode waveguide interferes a second portion of the scattered radiation using modes of the multimode waveguide. The second detector receives the interfered second portion and generates a second detection signal based on the received interfered second portion. The processor receives the first and second detection signals. The processor analyzes the received first portion, the received interfered second portion, and a propagation property of the multimode waveguide. The processor determines the property of the target based on the analysis.
    Type: Grant
    Filed: June 29, 2021
    Date of Patent: November 5, 2024
    Assignee: ASML Holding N.V.
    Inventors: Mohamed Swillam, Justin Lloyd Kreuzer, Stephen Roux
  • Patent number: 12124177
    Abstract: A detection system (200) includes an illumination system (210), a first optical system (232), a phase modulator (220), a lock-in detector (255), and a function generator (230). The illumination system is configured to transmit an illumination beam (218) along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target (204) on a substrate (202). The first optical system is further configured to transmit a signal beam including diffraction order sub-beams (222, 224, 226) that are diffracted by the diffraction target. The phase modulator is configured to modulate the illumination beam or the signal beam based on a reference signal. The lock-in detector is configured to collect the signal beam and to measure a characteristic of the diffraction target based on the signal beam and the reference signal. The function generator is configured to generate the reference signal for the phase modulator and the lock-in detector.
    Type: Grant
    Filed: November 18, 2020
    Date of Patent: October 22, 2024
    Assignees: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Mohamed Swillam, Simon Reinald Huisman, Justin Lloyd Kreuzer
  • Publication number: 20240272058
    Abstract: An inspection system includes a projection system including a radiation source configured to transmit an illumination beam along an illumination path and an aperture stop configured to select a portion of the illumination beam. The inspection system also includes an aperture stop that selects a portion of the illumination beam and an optical system that transmits the selected portion of the illumination beam towards an object and transmit a signal beam scattered from the object. The inspection system also includes a detector that detects the signal beam.
    Type: Application
    Filed: May 24, 2022
    Publication date: August 15, 2024
    Applicant: ASML Netherlands B.V.
    Inventors: Michal Emanuel PAWLOWSKI, Justin Lloyd KREUZER
  • Patent number: 11994808
    Abstract: A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.
    Type: Grant
    Filed: September 23, 2020
    Date of Patent: May 28, 2024
    Assignee: ASML Holding N.V.
    Inventors: Mohamed Swillam, Tamer Mohamed Tawfik Ahmed Elazhary, Stephen Roux, Yuxiang Lin, Justin Lloyd Kreuzer
  • Publication number: 20240140395
    Abstract: Systems and methods are described for emissions control of a hybrid vehicle. An instruction to switch from a combustion engine power mode of the hybrid vehicle to an electric power mode of the hybrid vehicle is received. A temperature of a catalyst associated with a combustion engine of the hybrid vehicle is identified, where exhaust gases from the combustion engine are passed over the catalyst. If the temperature of the catalyst is at, or above, a threshold level, the hybrid vehicle is switched to the electric power mode, and the combustion engine is switched off. If the temperature of the catalyst is below the threshold level, the hybrid vehicle is switched to the electric power mode, and the catalyst temperature is maintained at, or above, the threshold level.
    Type: Application
    Filed: November 2, 2022
    Publication date: May 2, 2024
    Inventors: Peter Deakin, Justin Lloyd
  • Patent number: 11966169
    Abstract: A system includes a radiation source, first and second phased arrays, and a detector. The first and second phased arrays include optical elements, a plurality of ports, waveguides, and phase modulators. The optical elements radiate radiation waves. The waveguides guide radiation from a port of the plurality of ports to the optical elements. Phase modulators adjust phases of the radiation waves. One or both of the first and second phased arrays form a first beam and/or a second beam of radiation directed toward a target structure based on the port coupled to the radiation source. The detector receives radiation scattered by the target structure and generates a measurement signal based on the received radiation.
    Type: Grant
    Filed: September 23, 2020
    Date of Patent: April 23, 2024
    Assignee: ASML Holding N.V.
    Inventors: Mohamed Swillam, Tamer Mohamed Tawfik Ahmed Elazhary, Stephen Roux, Yuxiang Lin, Justin Lloyd Kreuzer
  • Publication number: 20240094641
    Abstract: The system includes a radiation source, a diffractive element, an optical system, a detector, and a processor. The radiation source generates radiation. The diffractive element diffracts the radiation to generate a first beam and a second beam. The first beam includes a first non-zero diffraction order and the second beam includes a second non-zero diffraction order that is different from the first non-zero diffraction order. The optical system receives a first scattered beam and a second scattered radiation beam from a target structure and directs the first scattered beam and the second scattered beam towards a detector. The detector generates a detection signal. The processor analyzes the detection signal to determine a target structure property based on at least the detection signal. The first beam is attenuated with respect to the second beam or the first scattered beam is purposely attenuated with respect to the second scattered beam.
    Type: Application
    Filed: December 2, 2021
    Publication date: March 21, 2024
    Applicants: ASML Holding N.V., ASML Netherlands B.V.
    Inventors: Justin Lloyd KREUZER, Simon Reinald HUISMAN, Sebastianus Adrianus GOORDEN, Filippo ALPEGGIANI
  • Publication number: 20240077308
    Abstract: A metrology system includes a radiation source, an adjustable diffractive element, an optical system, an optical element, and a processor. The radiation source generates radiation. The adjustable diffractive element diffracts the radiation to generate first and second beams of radiation. The first and second beams have first and second different non-zero diffraction orders, respectively. The optical system directs the first and second beams toward a target structure such that first and second scattered beams of radiation are generated based on the first and second beams, respectively. The metrology system adjusts a phase difference of the first and second scattered beams. The optical element interferes the first and second scattered beams at an imaging detector that generates a detection signal. The processor receives and analyzes the detection signal to determine a property of the target structure based on the adjusted phase difference.
    Type: Application
    Filed: January 4, 2022
    Publication date: March 7, 2024
    Applicant: ASML Holding N.V.
    Inventors: Mohamed SWILLAM, Justin Lloyd KREUZER, Stephen ROUX, Michael Leo NELSON, Muhsin ERALP
  • Publication number: 20240027913
    Abstract: A metrology system (400) includes a multi-source radiation system. The multi-source radiation system includes a waveguide device (502) and the multi-source radiation system is configured to generate one or more beams of radiation. The metrology system (400) further includes a coherence adjuster (500) including a multimode waveguide device (504). The multimode waveguide device (504) includes an input configured to receive the one or more beams of radiation from the multi-source radiation system (514) and an output (518) configured to output a coherence adjusted beam of radiation for irradiating a target (418). The metrology system (400) further includes an actuator (506) coupled to the waveguide device (502) and configured to actuate the waveguide device (502) so as to change an impingement characteristic of the one or more beams of radiation at the input of the multimode waveguide device (504).
    Type: Application
    Filed: December 2, 2021
    Publication date: January 25, 2024
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Sergei SOKOLOV, Simon Reinald HUISMAN, Jin LIAN, Sebastianus Adrianus GOORDEN, Muhsin ERALP, Henricus Petrus Maria PELLEMANS, Justin Lloyd KREUZER
  • Patent number: 11841628
    Abstract: An apparatus for and method of sensing multiple alignment marks in which the optical axis of a detector is divided into multiple axes each of which can essentially simultaneously detect a separate alignment mark to generate a signal which can then be multiplexed and presented to a single detector or multiple detectors thus permitting more rapid detection of multiple marks.
    Type: Grant
    Filed: January 21, 2021
    Date of Patent: December 12, 2023
    Assignee: ASML Holding N.V.
    Inventors: Krishanu Shome, Justin Lloyd Kreuzer
  • Publication number: 20230273531
    Abstract: A metrology system comprises a radiation source, an optical element, first and second detectors, an integrated optical device comprising a multimode waveguide, and a processor. The radiation source generates radiation. The optical element directs radiation toward a target to generate scattered radiation from the target. The first detector receives a first portion of the scattered radiation and generates a first detection signal based on the received first portion. The multimode waveguide interferes a second portion of the scattered radiation using modes of the multimode waveguide. The second detector receives the interfered second portion and generates a second detection signal based on the received interfered second portion. The processor receives the first and second detection signals. The processor analyzes the received first portion, the received interfered second portion, and a propagation property of the multimode waveguide. The processor determines the property of the target based on the analysis.
    Type: Application
    Filed: June 29, 2021
    Publication date: August 31, 2023
    Applicant: ASML Holding N.V.
    Inventors: Mohamed SWILLAM, Justin Lloyd KREUZER, Stephen ROUX
  • Publication number: 20230266681
    Abstract: Systems, apparatuses, and methods are provided for determining the alignment of a substrate. An example method can include emitting a multi-wavelength radiation beam including a first wavelength and a second wavelength toward a region of a surface of a substrate. The example method can further include measuring a first diffracted radiation beam indicative of first order diffraction at the first wavelength in response to an irradiation of the region by the multi-wavelength radiation beam. The example method can further include measuring a second diffracted radiation beam indicative of first order diffraction at the second wavelength in response to the irradiation of the region by the multi-wavelength radiation beam. Subsequently, the example method can include generating, based on the measured first set of photons and the measured second set of photons, an electronic signal for use in determining an alignment position of the substrate.
    Type: Application
    Filed: June 9, 2021
    Publication date: August 24, 2023
    Applicant: ASML Holding N.V.
    Inventors: Mohamed SWILLAM, Justin Lloyd KREUZER, Stephen ROUX
  • Publication number: 20230266255
    Abstract: Systems, apparatuses, and methods are provided for detecting a particle on a substrate surface. An example method can include receiving, by a grating structure, coherent radiation from a radiation source. The method can further include generating, by the grating structure, a focused coherent radiation beam based on the coherent radiation. The method can further include transmitting, by the grating structure, the focused coherent radiation beam toward a region of a surface of a substrate. The method can further include receiving, by the grating structure, photons scattered from the region in response to illuminating the region with the focused coherent radiation beam. The method can further include measuring, by a photodetector, the photons received by the grating structure. The method can further include generating, by the photodetector and based on the measured photons, an electronic signal for detecting a particle located in the region of the surface of the substrate.
    Type: Application
    Filed: June 9, 2021
    Publication date: August 24, 2023
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Ilse VAN WEPEREN, Arjan Johannes Anton BEUKMAN, Mohamed SWILLAM, Justin Lloyd KREUZER, Stephen ROUX
  • Patent number: 11662198
    Abstract: An inspection apparatus, including: an optical system configured to provide a beam of radiation to a surface to be measured and to receive redirected radiation from the surface; and a detection system configured to measure the redirected radiation, wherein the optical system includes an optical element to process the radiation, the optical element including a Mac Neille-type multilayer polarizing coating configured to produce a reduced chromatic offset of the radiation.
    Type: Grant
    Filed: September 14, 2018
    Date of Patent: May 30, 2023
    Assignee: ASML Holding N.V.
    Inventors: Parag Vinayak Kelkar, Justin Lloyd Kreuzer
  • Publication number: 20230142459
    Abstract: An inspection system (1600), a lithography apparatus, and an inspection method are provided. The inspection system (1600) includes an illumination system (1602), a detection system (1606), and processing circuitry (1622). The illumination system generates a first illumination beam (1610) at a first wavelength and a second illumination beam (1618) at a second wavelength. The first wavelength is different from the second wavelength. The illumination system irradiates an object (1612) simultaneously with the first illumination beam and the second illumination beam. The detection system receives radiation (1620) scattered by a particle (1624) present at a surface (1626) of the object at the first wavelength. The detection system generates a detection signal. The processing circuitry determines a characteristic of the particle based on the detection signal.
    Type: Application
    Filed: April 8, 2021
    Publication date: May 11, 2023
    Applicant: ASML Holding N.V.
    Inventors: Andrew JUDGE, Ravi Chaitanya KALLURI, Michal Emanuel PAWLOWSKI, James Hamilton WALSH, Justin Lloyd KREUZER
  • Publication number: 20230116318
    Abstract: An apparatus for and method of sensing multiple alignment marks in which the optical axis of a detector is divided into multiple axes each of which can essentially simultaneously detect a separate alignment mark to generate a signal which can then be multiplexed and presented to a single detector or multiple detectors thus permitting more rapid detection of multiple marks.
    Type: Application
    Filed: January 21, 2021
    Publication date: April 13, 2023
    Applicant: ASML Holding N.V.
    Inventors: Krishanu SHOME, Justin Lloyd KREUZER