Abstract: A system to abate an emission stream from a semiconductor manufacturing process is disclosed. The system includes a plurality of sections configured to pass an emission stream therethrough. The sections include a metal oxide media section to remove a hydride from the emission stream; a desiccate media section downstream to the metal oxide media section to remove moisture from the emission stream; and a catalytic media section downstream to the desiccate media section to remove a nitrogen oxide (NOx) from the emission stream. The abatement system provides carbon-free abatement of nitrogen oxide and hydride(s). The abatement system has significantly lower cost to manufacture and operate.

Abstract: A system to abate an emission from a first semiconductor process is disclosed. The system includes an abatement apparatus, such as a gas scrubber, to remove hazardous and toxic gas species from the emission. The abatement apparatus may combust the emission to remove these gas species using a fuel and oxidant. The system includes a fuel assembly fluidly coupled to the abatement apparatus which transmits the fuel from at least one source through the abatement apparatus. The fuel assembly may include a supply tank which contains a volume of fuel, a recovery apparatus which recovers and contains a recovery volume of fuel from a second semiconductor process, and a mass flow controller which may transmit fuel from at least one of the supply tank and the recovery apparatus through the abatement apparatus.