Patents by Inventor Justin Matthew Verdirame
Justin Matthew Verdirame has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10844921Abstract: This invention relates to the constraint of a flexible body with low distortion and low uncertainty in its location. A class of mechanisms involving at least one pivot rocker is disclosed. These mechanisms fully constrain a body in space, but when constrained allow the flexible body to vibrate in the shape of one or more of its free mode shapes. Such a set of constraints yields a constrained system with high natural frequencies without over-constraining the body.Type: GrantFiled: October 30, 2016Date of Patent: November 24, 2020Inventors: Samir Ali Nayfeh, Justin Matthew Verdirame
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Patent number: 10788763Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.Type: GrantFiled: November 17, 2016Date of Patent: September 29, 2020Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Jan Steven Christiaan Westerlaken, Ruud Hendrikus Martinus Johannes Bloks, Peter A. Delmastro, Thibault Simon Mathieu Laurent, Martinus Hendrikus Antonius Leenders, Mark Josef Schuster, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Justin Matthew Verdirame, Samir A. Nayfeh
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Patent number: 9977351Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.Type: GrantFiled: July 13, 2017Date of Patent: May 22, 2018Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William Ebert, Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame
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Publication number: 20170307986Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.Type: ApplicationFiled: July 13, 2017Publication date: October 26, 2017Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William EBERT, Johannes ONVLEE, Samir A. NAYFEH, Mark Josef SCHUSTER, Peter A. DELMASTRO, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Abdullah ALIKHAN, Daniel Nathan BURBANK, Daniel Nicholas GALBURT, Justin Matthew VERDIRAME
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Patent number: 9766557Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.Type: GrantFiled: February 21, 2017Date of Patent: September 19, 2017Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William Ebert, Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame
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Publication number: 20170160652Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.Type: ApplicationFiled: February 21, 2017Publication date: June 8, 2017Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William EBERT, Johannes ONVLEE, Samir A. NAYFEH, Mark Josef SCHUSTER, Peter A. DELMASTRO, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Abdullah ALIKHAN, Daniel Nathan BURBANK, Daniel Nicholas GALBURT, Justin Matthew VERDIRAME
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Publication number: 20170122400Abstract: This invention relates to the constraint of a flexible body with low distortion and low uncertainty in its location. A class of mechanisms involving at least one pivot rocker is disclosed. These mechanisms fully constrain a body in space, but when constrained allow the flexible body to vibrate in the shape of one or more of its free mode shapes. Such a set of constraints yields a constrained system with high natural frequencies without over-constraining the body.Type: ApplicationFiled: October 30, 2016Publication date: May 4, 2017Inventors: Samir Ali Nayfeh, Justin Matthew Verdirame
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Patent number: 9632433Abstract: A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.Type: GrantFiled: October 21, 2013Date of Patent: April 25, 2017Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William Ebert, Jr., Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame
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Patent number: 9632434Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.Type: GrantFiled: April 29, 2015Date of Patent: April 25, 2017Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William Ebert, Jr., Johannes Onvlee, Samir A. Nayfeh, Mark Josef Schuster, Peter A. Delmastro, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Abdullah Alikhan, Daniel Nathan Burbank, Daniel Nicholas Galburt, Justin Matthew Verdirame, Thomas Venturino
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Publication number: 20170068175Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.Type: ApplicationFiled: November 17, 2016Publication date: March 9, 2017Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Jan Steven Christiaan WESTERLAKEN, Ruud Hendrikus Martinus Johannes BLOKS, Peter A. DELMASTRO, Thibault Simon Mathieu LAURENT, Martinus Hendrikus Antonius LEENDERS, Mark Josef SCHUSTER, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Justin Matthew VERDIRAME, Samir A. NAYFEH
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Patent number: 9513568Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.Type: GrantFiled: June 5, 2013Date of Patent: December 6, 2016Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Jan Steven Christiaan Westerlaken, Ruud Hendrikus Martinus Johannes Bloks, Peter A. Delmastro, Thibault Simon Mathieu Laurent, Martinus Hendrikus Antonius Leenders, Mark Josef Schuster, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Justin Matthew Verdirame, Samir A. Nayfeh
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Publication number: 20150301456Abstract: A patterning device support (1100) for controlling a temperature of a patterning device (1102) can include a movable component (1104). The movable component can include a gas inlet (1108) for supplying a gas flow across a surface of the patterning device and a gas outlet (1110) for extracting the gas flow. The patterning device support can also include a gas flow generator (1118) coupled to a duct (1114, 1116) for recirculating the gas flow from the gas outlet to the gas inlet.Type: ApplicationFiled: October 21, 2013Publication date: October 22, 2015Applicants: ASML Holding N.V., ASML Neherlands B.V.Inventors: Earl William EBERT, JR., Johannes ONVLEE, Samir A. NAYFEH, Mark Josef SCHUSTER, Peter A. DELMASTRO, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Abdullah ALIKHAN, Daniel Nathan BURBANK, Daniel Nicholas GALBURT, Justin Matthew VERDIRAME
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Publication number: 20150241796Abstract: A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.Type: ApplicationFiled: April 29, 2015Publication date: August 27, 2015Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Earl William EBERT, JR., Johannes ONVLEE, Samir A. NAYFEH, Mark Josef SCHUSTER, Peter A. DELMASTRO, Christopher Charles WARD, Frank Johannes Jacobus VAN BOXTEL, Abdullah ALIKHAN, Daniel Nathan BURBANK, Daniel Nicholas GALBURT, Justin Matthew VERDIRAME, Thomas VENTURINO
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Publication number: 20150168854Abstract: A lithographic apparatus has a support structure configured to support a patterning device, the patterning device serving to pattern a radiation beam according to a desired pattern and having a planar main surface through which the radiation beam passes; an outlet opening configured to direct a flow of a gas onto the patterning device; and an inlet opening configured to extract the gas which has exited the outlet opening, wherein the outlet opening and inlet opening are in a facing surface facing the planar main surface of the patterning device.Type: ApplicationFiled: June 5, 2013Publication date: June 18, 2015Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Jan Steven Christiaan Westerlaken, Ruud Hendrikus Martinus Johannes Bloks, Peter A. Delmastro, Thibault Simon Mathieu Laurent, Martinus Hendrikus Antonius Leenders, Mark Josef Schuster, Christopher Charles Ward, Frank Johannes Jacobus Van Boxtel, Justin Matthew Verdirame, Samir A. Nayfeh
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Patent number: 8976336Abstract: A lithographic apparatus is described that comprises a support structure to hold an object. The object may be a patterning device or a substrate to be exposed. The support structure comprises a chuck, on which the object is supported, and an array of shear-compliant elongated elements normal to the chuck and the stage, such that first ends of the elongated elements contact a surface of the chuck and second ends of the elongated elements contact a stage. Through using the array of elongated elements, a transfer of stress between the stage and the chuck is substantially uniform, resulting in minimization of slippage of the object relative to the surface of the chuck during a deformation of the chuck due to the stress.Type: GrantFiled: April 23, 2014Date of Patent: March 10, 2015Assignee: ASML Holding N.V.Inventors: Samir A. Nayfeh, Mark Edd Williams, Justin Matthew Verdirame
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Publication number: 20140233009Abstract: A lithographic apparatus is described that comprises a support structure to hold an object. The object may be a patterning device or a substrate to be exposed. The support structure comprises a chuck, on which the object is supported, and an array of shear-compliant elongated elements normal to the chuck and the stage, such that first ends of the elongated elements contact a surface of the chuck and second ends of the elongated elements contact a stage. Through using the array of elongated elements, a transfer of stress between the stage and the chuck is substantially uniform, resulting in minimization of slippage of the object relative to the surface of the chuck during a deformation of the chuck due to the stress.Type: ApplicationFiled: April 23, 2014Publication date: August 21, 2014Applicant: ASML Holding N.V.Inventors: Samir A. NAYFEH, Mark Edd Williams, Justin Matthew Verdirame
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Patent number: 8786832Abstract: A lithographic apparatus is described that comprises a support structure to hold an object. The object may be a patterning device or a substrate to be exposed. The support structure comprises a chuck, on which the object is supported, and an array of shear-compliant elongated elements normal to the chuck and the stage, such that first ends of the elongated elements contact a surface of the chuck and second ends of the elongated elements contact a stage. Through using the array of elongated elements, a transfer of stress between the stage and the chuck is substantially uniform, resulting in minimization of slippage of the object relative to the surface of the chuck during a deformation of the chuck due to the stress.Type: GrantFiled: July 10, 2013Date of Patent: July 22, 2014Assignee: ASML Holding N.V.Inventors: Samir A. Nayfeh, Mark Edd Williams, Justin Matthew Verdirame
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Publication number: 20140016110Abstract: A lithographic apparatus is described that comprises a support structure to hold an object. The object may be a patterning device or a substrate to be exposed. The support structure comprises a chuck, on which the object is supported, and an array of shear-compliant elongated elements normal to the chuck and the stage, such that first ends of the elongated elements contact a surface of the chuck and second ends of the elongated elements contact a stage. Through using the array of elongated elements, a transfer of stress between the stage and the chuck is substantially uniform, resulting in minimization of slippage of the object relative to the surface of the chuck during a deformation of the chuck due to the stress.Type: ApplicationFiled: July 10, 2013Publication date: January 16, 2014Applicant: ASML Holding N.V.Inventors: Samir A. NAYFEH, Mark Edd WILLIAMS, Justin Matthew VERDIRAME
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Publication number: 20110013164Abstract: A lithographic apparatus is described that comprises a support structure (300) to hold an object (210). The object may be a patterning device or a substrate to be exposed. The support structure comprises a chuck (321), on which the object is supported, and an array of shear-compliant elongated elements (325) normal to the chuck and the stage (230), such that first ends of the elongated elements contact a surface of the chuck and second ends of the elongated elements contact a stage. Through using the array of elongated elements, a transfer of stress between the stage and the chuck is substantially uniform, resulting in minimization of slippage of the object relative to the surface of the chuck during a deformation of the chuck due to the stress.Type: ApplicationFiled: April 7, 2009Publication date: January 20, 2011Applicant: ASML Holding N.V.Inventors: Samir A. Nayfeh, Mark Edd Williams, Justin Matthew Verdirame