Abstract: A resonator includes a CMOS substrate having a first electrode and a second electrode. The CMOS substrate is configured to provide one or more control signals to the first electrode. The resonator also includes a resonator structure including a silicon material layer. The resonator structure is coupled to the CMOS substrate and configured to resonate in response to the one or more control signals.

Abstract: Embodiments relate to systems and methods for the management of mainframe resources in a pre-boot environment. According to embodiments, a network management platform, for instance a platform equipped or compatible with pre-boot discovery and management tools such as the known pre-boot execution environment (PXE), can integrate a set of mainframe-based virtual machines using a pre-boot management engine. The pre-boot management engine can reside in or communicate with the mainframe operating system, and present a set of resources to the network management platform to allow the platform to include time-sliced or other virtual machines or resources, into the pre-boot protocol.

Abstract: A method for producing a topographical pattern on or in a papermachine fabric. The method for creating the pattern on or in an fabric, includes producing a topographical polymer pattern on or in a papermachine fabric using a rotary screen. The instant abstract is neither intended to define the invention disclosed in this specification nor intended to limit the scope of the invention in any way.

Abstract: A method for fabricating a micro electromechanical device includes providing a first substrate including control circuitry. The first substrate has a top surface and a bottom surface. The method also includes forming an insulating layer on the top surface of the first substrate, removing a first portion of the insulating layer so as to form a plurality of standoff structures, and bonding a second substrate to the first substrate. The method further includes thinning the second substrate to a predetermined thickness and forming a plurality of trenches in the second substrate. Each of the plurality of trenches extends to the top surface of the first substrate. Moreover, the method includes filling at least a portion of each of the plurality of trenches with a conductive material, forming the micro electromechanical device in the second substrate, and bonding a third substrate to the second substrate.

Abstract: A press fabric having a plurality of surface pressing plates on a sheet side of the fabric imparts an impression onto a sheet of paper web during a pressing process. The surface pressing plates are preferably resin pressing plates, and form at least one of a random pattern of dots, a predetermined pattern of dots, a grid pattern of dots, a regular grid pattern of lines, an irregular grid pattern of lines a plurality of squiggly lines, a plurality of wavy lines, a plurality of straight lines, words and pictures.

Abstract: A method for manufacturing a fabric-like clothing, in particular for a machine for producing web material, in particular paper or paperboard, including the measures: a) providing a fabric-like substrate with at least one seam region extending essentially in the substrate transverse direction (CMD); b) applying a coating onto the fabric-like substrate such that the coating extends over at least one seam region; and c) cutting through the coating along at least one seam region.

Abstract: A method of performing overlay error correction includes forming a photoresist layer over a substrate and exposing a first set of apertures to incident radiation. The method also includes determining an overlay error associated with the first set of apertures and determining an overlay correction as a function of the determined overlay error. The method further includes exposing a data area and a second set of apertures. The data area and the second set of apertures are exposed based, in part, on the determined overlay correction. Moreover, the method includes verifying the determined overlay correction.

Abstract: An optical deflection device for a display application includes a semiconductor substrate comprising an upper surface region defining an upper surface plane. The optical deflection device also includes one or more electrode devices provided overlying the upper surface region and a hinge device including a silicon material and coupled to the upper surface region at a predetermined height above the upper surface plane. The optical deflection device further comprises a plurality of landing pads including a silicon material and coupled to the upper surface region at the predetermined height from the upper surface plane and a mirror structure. The mirror structure includes a post portion coupled to the hinge device and a mirror plate portion coupled to the post portion.

Abstract: A fabric for an advanced dewatering system having a woven fabric, the woven fabric having a paper side and a roll side, the paper side having a paper side surface and the roll side having a roll side surface and a polymer material. The polymer material is deposited onto the fabric and extends above the paper side surface. The polymer material has at least one of a random pattern, a random motif, a pseudo-random pattern, a pseudo-random motif, a predetermined pattern, and a predetermined motif.

Abstract: A method of forming a package for a MEMS structure coupled to a substrate includes depositing an encapsulant material on the substrate and patterning the encapsulant material to form a plurality of encapsulated structures. The method also includes depositing a first capping layer on the substrate and forming one or more release hole patterns in the first capping layer. The method further includes removing the encapsulant material and depositing a second capping layer.

Abstract: A press fabric having a plurality of surface pressing plates on a sheet side of the fabric imparts an impression onto a sheet of paper web during a pressing process. The surface pressing plates are preferably resin pressing plates, and form at least one of a random pattern of dots, a predetermined pattern of dots, a grid pattern of dots, a regular grid pattern of lines, an irregular grid pattern of lines a plurality of squiggly lines, a plurality of wavy lines, a plurality of straight lines, words and pictures.

Abstract: A resonator includes a CMOS substrate having a first electrode and a second electrode. The CMOS substrate is configured to provide one or more control signals to the first electrode. The resonator also includes a resonator structure including a silicon material layer. The resonator structure is coupled to the CMOS substrate and configured to resonate in response to the one or more control signals.

Abstract: A method for manufacturing a fabric-like skin, in particular for a machine for producing web material, in particular paper or paperboard, including the measures: a) providing a fabric-like substrate with at least one seam region extending essentially in the substrate transverse direction (CMD); b) applying a coating onto the fabric-like substrate such that the coating extends over at least one seam region; and c) cutting through the coating along at least one seam region.

Abstract: A fabric for an advanced dewatering system having a woven fabric, the woven fabric having a paper side and a roll side. The paper side has a paper side surface and the roll side has a roll side surface; and a polymer material is deposited onto the fabric that extends above the paper side surface. The polymer material has at least one of a random pattern, a random motif, a pseudo-random pattern, a pseudo-random motif, a predetermined pattern, and a predetermined motif.

Abstract: A method for the production of a fabric for industrial use comprising extruding polymer material onto a carrier structure to produce a patterned design on the carrier structure, wherein a cross-sectional profile of the extruded polymer material is substantially convex. An apparatus for carrying out the method comprising a polymer extrusion apparatus structured and arranged to move in three mutually perpendicular directions. A fabric comprising a carrier structure and a patterned design comprising extruded polymer material arranged on the carrier structure, wherein the extruded polymer material is arranged to form a substantially convex cross section on the carrier structure. The instant abstract is neither intended to define the invention disclosed in this specification nor intended to limit the scope of the invention in any way.

Abstract: A display system includes a light source and a first optical system coupled to the light source and adapted to provide an illumination beam along an illumination path. The display system also includes a spatial light modulator positioned in the illumination path. The spatial light modulator includes a semiconductor substrate including a plurality of electrode devices and a hinge structure coupled to the semiconductor substrate. The hinge structure includes silicon material. The spatial light modulator also includes a mirror post coupled to the hinge structure and extending to a predetermined distance from the semiconductor substrate and a mirror plate coupled to the mirror post and overlying the plurality of electrode devices. The display system further includes a second optical system coupled to the spatial light modulator and adapted to project an image onto a projection surface.

Abstract: A method for forming an optical deflection device includes providing a semiconductor substrate comprising an upper surface region and a plurality of drive devices within one or more portions of the semiconductor substrate. The upper surface region includes one or more patterned structure regions and at least one open region to expose a portion of the upper surface region to form a resulting surface region. The method also includes forming a planarizing material overlying the resulting surface region to fill the at least one open region and cause formation of an upper planarized layer using the fill material. The method further includes forming a thickness of silicon material at a temperature of less than 300 ° C. to maintain a state of the planarizing material.

Abstract: An optical deflection device for a display application. The optical deflection device includes a semiconductor substrate including an upper surface region and one or more electrode devices provided overlying the upper surface region. The optical deflection device also includes a hinge device including a silicon material and coupled to the upper surface region. The optical deflection device further includes a spacing defined between the upper surface region and the hinge device and a mirror structure including a post portion coupled to the hinge device and a mirror plate portion coupled to the post portion and overlying the hinge device.

Abstract: A fabric, in particular for a paper making machine, includes a plurality of helically wound coil members arranged side by side with respect to each other in an intermeshing manner, such that connecting channels are formed by adjacent intermeshing coil members, a hinge member being introduced into and extending along each connecting channel for interconnecting adjacent coil members, a stuffer channel being formed within each coil member extending along and between two connecting channels associated to a respective coil member, at least a part of the stuffer channels being filled with stuffer members extending longitudinally within the stuffer channels, a stuffer material being provided at least in regions of the fabric for filling spaces formed within the fabric between the coil members, the hinge members and the stuffer members.

Abstract: A method for creating a pattern on or in an fabric, comprising producing a topographical polymer pattern on or in a papermachine fabric using a rotary screen. A fabric, comprising a papermachine fabric including a topographical polymer pattern as an external or internal feature. The instant abstract is neither intended to define the invention disclosed in this specification nor intended to limit the scope of the invention in any way.