Abstract: A system to abate an emission stream from a semiconductor manufacturing process is disclosed. The system includes a media canister to abate the emission stream in response to an abatement fault in an abatement apparatus. The media canister includes a reaction chamber configured to receive the emission stream in response to the abatement fault, and a dry media disposed within the reaction chamber to abate the emission stream. The dry media includes at least one reactive and/or absorbent material which catalyzes at least one chemical reaction to remove at least one pollutant from the emission stream and yield exhaust substantially free of the at least one pollutant.

Abstract: A system to abate an emission stream from a semiconductor manufacturing process is disclosed. The system includes an abatement apparatus, such as a gas scrubber, to remove hazardous and toxic gas species from the emission stream and to yield an emission having carbon dioxide. The system condenses the emission having carbon dioxide to an effluent, and transmits the effluent through a reduction tower. The reduction tower catalyzes a chemical reaction which absorbs carbon dioxide from the effluent using a solution and yields an exhaust substantially free of carbon dioxide. The reduction tower is coupled to an exchanger which catalyzes a thermogenic reaction to release absorbed carbon dioxide from the solution. The system may include a closed-loop system that transmits solution substantially free of carbon dioxide from the exchanger and through the reduction tower to absorb carbon dioxide from additional effluent.