Patents by Inventor Jutarou Miura

Jutarou Miura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System, method and computer program product for modeling EDFA
    Publication number: 20060028712
    Abstract: A system, method and computer program product for determining excited state absorption (ESA) dependent parameters (gain and noise figure) of an EDF and an EDFA corresponding to a determined average inversion value of an EDF. Also, a system, method and computer program product for using an EDFA model that incorporates ESA parameters to in calculating an EDFA gain and noise figure to design laser systems with high accuracy.
    Type: Application
    Filed: May 9, 2005
    Publication date: February 9, 2006
    Applicants: FURUKAWA AMERICA, INC, OFS FITEL, LLC
    Inventors: Tomoko Ohtsuki, Jutarou Miura, Masaru Fukushima, Baishi Wang