Patents by Inventor Juyeon Chang

Juyeon Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200190361
    Abstract: The invention provides a chemical-mechanical polishing composition comprising an abrasive, a self-stopping agent, an aqueous carrier, and a cationic polymer. This invention additionally provides a method suitable for polishing a dielectric substrate.
    Type: Application
    Filed: February 21, 2020
    Publication date: June 18, 2020
    Inventors: Alexander W. Hains, Juyeon Chang, Tina C. Li, Viet Lam, Ji Cui, Sarah Brosnan, Chul Woo Nam
  • Patent number: 10619075
    Abstract: The invention provides a chemical-mechanical polishing composition comprising an abrasive, a self-stopping agent, an aqueous carrier, and optionally, a cationic polymer, and provides a method suitable for polishing a substrate.
    Type: Grant
    Filed: March 23, 2018
    Date of Patent: April 14, 2020
    Assignee: Cabot Microelectronics Corporation
    Inventors: Alexander W. Hains, Juyeon Chang, Tina C. Li, Viet Lam, Ji Cui, Sarah Brosnan, Chul Woo Nam
  • Patent number: 10619076
    Abstract: The invention provides a chemical-mechanical polishing composition comprising an abrasive, a self-stopping agent, an aqueous carrier, and optionally, a cationic polymer, and provides a method suitable for polishing a substrate.
    Type: Grant
    Filed: February 8, 2019
    Date of Patent: April 14, 2020
    Assignee: Cabot Microelectronics Corporation
    Inventors: Alexander W. Hains, Juyeon Chang, Tina C. Li, Viet Lam, Ji Cui, Sarah Brosnan, Chul Woo Nam
  • Publication number: 20190185716
    Abstract: The invention provides a chemical-mechanical polishing composition comprising an abrasive, a self-stopping agent, an aqueous carrier, and optionally, a cationic polymer, and provides a method suitable for polishing a substrate.
    Type: Application
    Filed: February 8, 2019
    Publication date: June 20, 2019
    Inventors: Alexander W. HAINS, Juyeon CHANG, Tina C. LI, Viet LAM, Ji CUI, Sarah BROSNAN, Chul Woo NAM
  • Publication number: 20180244956
    Abstract: The invention provides a chemical-mechanical polishing composition comprising an abrasive, a self-stopping agent, an aqueous carrier, and optionally, a cationic polymer, and provides a method suitable for polishing a substrate.
    Type: Application
    Filed: March 23, 2018
    Publication date: August 30, 2018
    Inventors: Alexander W. HAINS, Juyeon CHANG, Tina C. LI, Viet LAM, Ji CUI, Sarah BROSNAN, Chul Woo NAM
  • Patent number: 9597768
    Abstract: The invention provides a chemical-mechanical polishing composition comprising, consisting essentially of, or consisting of (a) about 0.01 wt. % to about 1 wt. % of wet-process ceria, (b) about 10 ppm to about 200 ppm of a cationic polymer comprising quaternary amino groups, (c) about 10 ppm to about 2000 ppm of a non-fluorinated nonionic surfactant, (d) an amino acid, and (e) water, wherein the polishing composition has a pH of about 3 to about 8. The invention further provides a method of polishing a substrate with the polishing composition.
    Type: Grant
    Filed: September 9, 2015
    Date of Patent: March 21, 2017
    Assignee: Cabot Microelectronics Corporation
    Inventors: Prativa Pandey, Juyeon Chang, Brian Reiss
  • Publication number: 20170066102
    Abstract: The invention provides a chemical-mechanical polishing composition comprising, consisting essentially of, or consisting of (a) about 0.01 wt. % to about 1 wt. % of wet-process ceria, (b) about 10 ppm to about 200 ppm of a cationic polymer comprising quaternary amino groups, (c) about 10 ppm to about 2000 ppm of a non-fluorinated nonionic surfactant, (d) an amino acid, and (e) water, wherein the polishing composition has a pH of about 3 to about 8. The invention further provides a method of polishing a substrate with the polishing composition.
    Type: Application
    Filed: September 9, 2015
    Publication date: March 9, 2017
    Inventors: Prativa PANDEY, Juyeon CHANG, Brian REISS
  • Patent number: 7955586
    Abstract: A method for preparing III-VI2 nanoparticles and a thin film of polycrystalline light absorber layers. The method for preparing I-III-VI2 nanoparticles comprises the steps of: (a1) preparing a mixed solution by mixing each element from groups I, III and VI in the periodic table with a solvent; (a2) sonicating the mixed solution; (a3) separating the solvent from the sonicated mixed solution; and (a4) drying the product resulted from the above step (a3) to obtain nanoparticles.
    Type: Grant
    Filed: June 17, 2008
    Date of Patent: June 7, 2011
    Assignee: Sungkyunkwan University Foundation For Corporate Collaboration
    Inventors: Duk-Young Jung, Jae Eok Han, Juyeon Chang
  • Publication number: 20100120192
    Abstract: A method for preparing III-VI2 nanoparticles and a thin film of polycrystalline light absorber layers. The method for preparing I-III-VI2 nanoparticles comprises the steps of: (a1) preparing a mixed solution by mixing each element from groups I, III and VI in the periodic table with a solvent; (a2) sonicating the mixed solution; (a3) separating the solvent from the sonicated mixed solution; and (a4) drying the product resulted from the above step (a3) to obtain nanoparticles.
    Type: Application
    Filed: June 17, 2008
    Publication date: May 13, 2010
    Applicant: SUNGKYUNKWAN UNIVERSITY
    Inventors: Duk-Young Jung, Jae Eok Han, Juyeon Chang