Abstract: A multi-shifting shift register is adapted for outputting a selected address signal to a memory unit, and includes a control circuit for outputting a number (i) of shift signals and a timing pulse signal. One of the shift signals is at an enabled state and the other ones of the shift signals are at a disabled state during each cycle of the timing pulse signal. A multi-shifting circuit includes a number (N), which is larger than the number (i), of cascaded register units, each of which has a flip-flop that has an input end, and an output end for generating an address signal, and a selector that has the number (i) of select inputs for receiving the number (i) of the shift signals respectively from the control circuit, the number (i) of address signal inputs, and an output. The output end of the flip-flop is connected to a first one of the address signal inputs of the selector.

Abstract: A method of manufacturing a metal oxide semiconductor device, wherein a gate dielectric layer, a conductive layer and a patterned mask layer are successively formed on the substrate. Using the mask layer as a mask, the conductive layer is slant-etched and the remaining portion of the conductive layer becomes a spacer wall of a gate and between the two sides of the gate, and exposes a portion of the gate dielectric layer. The gate is located directly below the mask layer. Using the mask layer and the spacer wall as a mask, ion implantation is performed, thereby forming a source/drain region within the substrate between the two sidewalls of the spacer walls. An annealing process is performed. Using the mask layer as a mask to etch away the spacer wall, a lightly doped drain is formed with the substrate between the two sidewalls of the gate, thereby completing a MOS device.

Abstract: A memory device includes a global decoder circuit and two memory cell array devices, each of which is disposed adjacent to a respective one of opposing first and second sides of the global decoder circuit, and has global word lines coupled to the global decoder circuit. Each of two data input buffers is disposed at a third side of the global decoder circuit adjacent to a respective one of the memory cell arrays, and is coupled to the respective one of the memory cell arrays. A write control circuit is coupled to and is disposed adjacent to the third side of the global decoder circuit. A write clock buffer is disposed adjacent to the third side of the global decoder circuit, and is coupled to the data input buffers. A read control circuit is coupled to and is disposed adjacent to a fourth side of the global decoder circuit. Each of two multiplexer sets is coupled to bit lines of a respective one of the memory cell array devices.

Abstract: A fabrication method for a dual damascene structure comprising an air-gap is provided. The method includes forming sequentially a first dielectric layer, a stop layer and a second dielectric layer on a substrate comprising a first metal layer. The first and the second dielectric layers are then defined to form a via. opening exposing the first metal layer and an opening in a predetermined position on the first and second dielectric layers. An oxide layer is then formed on the second dielectric layer covering the opening and forming a gap. The oxide layer and the second dielectric layer are then defined to form a trench, which exposes the first metal layer. A second metal layer and a via plug are then formed in the trench and the via. opening, wherein the second metal layer and the first metal layer are electrically connected through the via plug.

Abstract: After the formation of a gate oxide layer, a polysilicon layer is formed right away. The polysilicon layer is used for patterning the gate oxide layer. The photolithography and etching processes of forming the buried contact window are combined with the step of removing the gate oxide layer at the periphery circuit region. Then, after the formation of the gate oxide layer at the memory cell region, one thermal oxidation process is performed to form the gate oxide layer at the periphery circuit region.