Abstract: The present invention provides a plasma torch device. The device comprises a front electrode, a back electrode and a vortex flow generator. The torch roots of the back electrode are moved by fixed magnets. By controlling the magnets coordinated with vortex air flow, the torch roots are moved back and forth periodically on inner surface of the back electrode. The torch roots do not stay at the same place for long for preventing increasing local heat burden of the electrode. Thus, life time and maintenance cycle of the electrode is prolonged with reduced operational cost of plasma torch and enhanced reliability of the device.

Abstract: A dual-mode non-thermal plasma reactor includes an air-buffering chamber, a magnetic element provided on the air-buffering chamber, a first electrode disposed in the air-buffering chamber, a second electrode disposed in the air-buffering chamber opposite to the first electrode, a high-voltage power supply connected to the first and second electrodes and an air-swirling chamber located between the first and second electrodes. The air-swirling chamber includes a first isolating film covering on an internal side of the first electrode, a second isolating film covering on an internal side of the second electrode and an isolating tube placed between the first and second isolating films. An air passageway is defined through the first and second isolating films. An air-swirling space is defined by the first and second isolating films and the isolating tube. The isolating tube includes at least one tunnel in communication with the air-swirling space.

Abstract: A dual-mode non-thermal plasma reactor includes an air-buffering chamber, a magnetic element provided on the air-buffering chamber, a first electrode disposed in the air-buffering chamber, a second electrode disposed in the air-buffering chamber opposite to the fist electrode, a high-voltage power supply connected to the first and second electrodes and an air-swirling chamber located between the first and second electrodes. The air-swirling chamber includes a first isolating film covering on an internal side of the first electrode, a second isolating film covering on an internal side of the second electrode and an isolating tube placed between the first and second isolating films. An air passageway is defined through the first and second isolating films. An air-swirling space is defined by the first and second isolating films and the isolating tube. The isolating tube includes at least one tunnel in communication with the air-swirling space.

Abstract: A non-thermal plasma reactor includes a reactor chamber, a first electrode unit disposed in the top portion of chamber and a second electrode unit disposed in the bottom of the chamber, so that a plasma treatment region is defined between the first and second electrode units. The first electrode unit includes at least one or arrays of dual discharging-electrode structure embedded in an isolating layer. A high-voltage power supply is connected to the first and second electrode units. An external gas introducing unit is used to allow auxiliary gas into the plasma reaction region so that arrays of dual discharging-electrode structure can enhance the gas discharge process and thus promote the plasma assisted chemical reaction for cleaning purpose.

Abstract: There is disclosed a normal-pressure plasma-based apparatus for processing waste water by mixing the waste water with working gas. The apparatus includes a waste water supply, a gas supply, a plasma-based processing unit connected to both of the waste water supply and the gas supply, a reservoir connected to the plasma-based processing unit and a washing tower connected to both of the reservoir and the plasma-based processing unit. The plasma-based processing unit and the washing tower are used together to mix the waste water with the working gas at least twice. The plasma-based processing unit produces active substances to decompose organic compounds and eliminate the colors of the organic compounds. Thus, performance in processing the waste water is excellent while the consumption of time and energy is low.

Abstract: Atmospheric gas discharge plasma is generated in a gas whirlpool cavity. Then the plasma is sprayed out in a gas flow to clean an object. The whole process is simple with merits of utility and cost savings. And objects can be cleaned one after one continuously.

Abstract: The present invention provides a reactor utilizing high-voltage discharge for processing exhausted hydrogen gas emitted during membrane plating, etching, or washing of semiconductors, where higher than 95% of destruction and removal efficiency (DRE) of hydrogen gas is obtained.

Abstract: Atmospheric gas discharge plasma is generated in a gas whirlpool cavity. Then the plasma is sprayed out in a gas flow to clean an object. The whole process is simple with merits of utility and cost savings. And objects can be cleaned one after one continuously.

Abstract: The present invention provides a reactor utilizing high-voltage discharge for processing exhausted hydrogen gas emitted during membrane plating, etching, or washing of semiconductors, where higher than 95% of destruction and removal efficiency (DRE) of hydrogen gas is obtained.