Patents by Inventor Jyoji Ihata

Jyoji Ihata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photosensitive and heat-sensitive polymers, process for producing the same and process for recording information using the same
    Patent number: 5187047
    Abstract: A photosensitive and heat-sensitive polymer having conjugated polyenes and sulfonic acid groups and an absorbance ratio of a strong band in the region of 1200 cm.sup.-1 to 1300 cm.sup.-1 assignable to sulfonic acid groups adjacent to conjugated polyenes of at least 3 sequence lengths to a strong band near 1050 cm.sup.-1 assignable to sulfonic acid groups in the IR spectrum of at least 0.6.
    Type: Grant
    Filed: April 2, 1991
    Date of Patent: February 16, 1993
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Yasuki Shimamura, Jyoji Ihata
  • Photosensitive and heat-sensitive polymers, process for producing the same and process for recording information using the same
    Patent number: 5025266
    Abstract: A photosensitive and heat-sensitive polymer having conjugated polyenes and sulfonic acid groups and an absorbance ratio of a strong band in the region of 1200 cm.sup.-1 to 1300 cm.sup.-1 assignable to sulfonic acid groups adjacent to conjugated polyenes of at least 3 sequence lengths to a strong band near 1050 cm.sup.-1 assignable to sulfonic acid groups in the IR spectrum of at least 0.6.
    Type: Grant
    Filed: July 20, 1990
    Date of Patent: June 18, 1991
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Yasuki Shimamura, Jyoji Ihata
  • Photosensitive and heat-sensitive polymers, process for producing the same and process for recording information using the same
    Patent number: 4965322
    Abstract: A photosensitive and heat-sensitive polymer having conjugated polyenes and sulfonic acid groups and an absorbance ratio of a strong band in the region of 1200 cm.sup.-1 to 1300 cm.sup.-1 assignable to sulfonic acid groups adjacent to conjugated polyenes of at least 3 sequence lengths to a strong band near 1050 cm.sup.-1 assignable to sulfonic acid groups in the IR spectrum of at least 0.6. The photosensitive and heat-sensitive polymer is obtained by the sulfonation of a polymer of an ethylenically unsaturated monomer having a number average molecular weight of at least 10,000 or a polymer having conjugated polyenes and a number average molecular weight of at least 10,000 and selected from specified polymers and copolymers. The photosensitive and heat-sensitive polymer is useful for information recording materials capable of being recorded by a laser beam or a thermal head for preparing printing plates, especially offset printing plates.
    Type: Grant
    Filed: March 22, 1988
    Date of Patent: October 23, 1990
    Assignee: Asahi Kasei Kogyo Kabushiki Kaisha
    Inventors: Yasuki Shimamura, Jyoji Ihata