Patents by Inventor Jyun-Ming Lin
Jyun-Ming Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240072155Abstract: A method includes forming a transistor, which includes forming a dummy gate stack over a semiconductor region, and forming an Inter-Layer Dielectric (ILD). The dummy gate stack is in the ILD, and the ILD covers a source/drain region in the semiconductor region. The method further includes removing the dummy gate stack to form a trench in the first ILD, forming a low-k gate spacer in the trench, forming a replacement gate dielectric extending into the trench, forming a metal layer to fill the trench, and performing a planarization to remove excess portions of the replacement gate dielectric and the metal layer to form a gate dielectric and a metal gate, respectively. A source region and a drain region are then formed on opposite sides of the metal gate.Type: ApplicationFiled: November 8, 2023Publication date: February 29, 2024Inventors: Kuo-Hua Pan, Je-Wei Hsu, Hua Feng Chen, Jyun-Ming Lin, Chen-Huang Peng, Min-Yann Hsieh, Java Wu
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Patent number: 11862708Abstract: A method includes forming a transistor, which includes forming a dummy gate stack over a semiconductor region, and forming an Inter-Layer Dielectric (ILD). The dummy gate stack is in the ILD, and the ILD covers a source/drain region in the semiconductor region. The method further includes removing the dummy gate stack to form a trench in the first ILD, forming a low-k gate spacer in the trench, forming a replacement gate dielectric extending into the trench, forming a metal layer to fill the trench, and performing a planarization to remove excess portions of the replacement gate dielectric and the metal layer to form a gate dielectric and a metal gate, respectively. A source region and a drain region are then formed on opposite sides of the metal gate.Type: GrantFiled: February 22, 2021Date of Patent: January 2, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Kuo-Hua Pan, Je-Wei Hsu, Hua Feng Chen, Jyun-Ming Lin, Chen-Huang Peng, Min-Yann Hsieh, Java Wu
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Publication number: 20210202713Abstract: A method includes forming a transistor, which includes forming a dummy gate stack over a semiconductor region, and forming an Inter-Layer Dielectric (ILD). The dummy gate stack is in the ILD, and the ILD covers a source/drain region in the semiconductor region. The method further includes removing the dummy gate stack to form a trench in the first ILD, forming a low-k gate spacer in the trench, forming a replacement gate dielectric extending into the trench, forming a metal layer to fill the trench, and performing a planarization to remove excess portions of the replacement gate dielectric and the metal layer to form a gate dielectric and a metal gate, respectively. A source region and a drain region are then formed on opposite sides of the metal gate.Type: ApplicationFiled: February 22, 2021Publication date: July 1, 2021Inventors: Kuo-Hua Pan, Je-Wei Hsu, Hua Feng Chen, Jyun-Ming Lin, Chen-Huang Peng, Min-Yann Hsieh, Java Wu
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Patent number: 10930752Abstract: A method includes forming a transistor, which includes forming a dummy gate stack over a semiconductor region, and forming an Inter-Layer Dielectric (ILD). The dummy gate stack is in the ILD, and the ILD covers a source/drain region in the semiconductor region. The method further includes removing the dummy gate stack to form a trench in the first ILD, forming a low-k gate spacer in the trench, forming a replacement gate dielectric extending into the trench, forming a metal layer to fill the trench, and performing a planarization to remove excess portions of the replacement gate dielectric and the metal layer to form a gate dielectric and a metal gate, respectively. A source region and a drain region are then formed on opposite sides of the metal gate.Type: GrantFiled: November 30, 2018Date of Patent: February 23, 2021Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Kuo-Hua Pan, Je-Wei Hsu, Hua Feng Chen, Jyun-Ming Lin, Chen-Huang Peng, Min-Yann Hsieh, Java Wu
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Patent number: 10879127Abstract: Embodiments of a semiconductor device structure and a method for forming the same are provided. The semiconductor device structure includes a substrate and a first metal gate structure formed over the substrate. The first metal gate structure has a first width. The semiconductor device structure further includes a first contact formed adjacent to the first metal gate structure and a second metal gate structure formed over the substrate. The second metal gate structure has a second width smaller than the first width. The semiconductor device structure further includes an insulating layer formed over the second metal gate structure and a second contact self-aligned to the second metal gate structure.Type: GrantFiled: December 27, 2019Date of Patent: December 29, 2020Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Wei-Shuo Ho, Tsung-Yu Chiang, Chia-Ming Chang, Jyun-Ming Lin
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Publication number: 20200144127Abstract: Embodiments of a semiconductor device structure and a method for forming the same are provided. The semiconductor device structure includes a substrate and a first metal gate structure formed over the substrate. The first metal gate structure has a first width. The semiconductor device structure further includes a first contact formed adjacent to the first metal gate structure and a second metal gate structure formed over the substrate. The second metal gate structure has a second width smaller than the first width. The semiconductor device structure further includes an insulating layer formed over the second metal gate structure and a second contact self-aligned to the second metal gate structure.Type: ApplicationFiled: December 27, 2019Publication date: May 7, 2020Inventors: Wei-Shuo HO, Tsung-Yu CHIANG, Chia-Ming CHANG, Jyun-Ming LIN
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Patent number: 10522412Abstract: Embodiments of a semiconductor device structure and a method for forming the same are provided. The semiconductor device structure includes a substrate and a first metal gate structure formed over the substrate. The first metal gate structure has a first width. The semiconductor device structure further includes a first contact formed adjacent to the first metal gate structure and a second metal gate structure formed over the substrate. The second metal gate structure has a second width smaller than the first width. The semiconductor device structure further includes an insulating layer formed over the second metal gate structure and a second contact self-aligned to the second metal gate structure.Type: GrantFiled: February 19, 2018Date of Patent: December 31, 2019Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Wei-Shuo Ho, Tsung-Yu Chiang, Chia-Ming Chang, Jyun-Ming Lin
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Patent number: 10516030Abstract: A method includes forming a transistor, which includes forming a dummy gate stack over a semiconductor region, and forming an Inter-Layer Dielectric (ILD). The dummy gate stack is in the ILD, and the ILD covers a source/drain region in the semiconductor region. The method further includes removing the dummy gate stack to form a trench in the first ILD, forming a low-k gate spacer in the trench, forming a replacement gate dielectric extending into the trench, forming a metal layer to fill the trench, and performing a planarization to remove excess portions of the replacement gate dielectric and the metal layer to form a gate dielectric and a metal gate, respectively. A source region and a drain region are then formed on opposite sides of the metal gate.Type: GrantFiled: June 1, 2017Date of Patent: December 24, 2019Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Kuo-Hua Pan, Je-Wei Hsu, Hua Feng Chen, Jyun-Ming Lin, Chen-Huang Peng, Min-Yann Hsieh, Java Wu
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Patent number: 10304942Abstract: A semiconductor device and method for fabricating such a device are presented. The semiconductor device includes a first gate electrode of a transistor, a first sidewall spacer along a sidewall of the gate pattern, a first insulating layer in contact with the first sidewall spacer and having a planarized top surface, and a second sidewall spacer formed on the planarized top surface of the first insulating layer. The second sidewall spacer may be formed over the first sidewall spacer. A width of the second sidewall spacer is equal to or greater than a width of the first sidewall spacer.Type: GrantFiled: January 9, 2018Date of Patent: May 28, 2019Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Jyun-Ming Lin, Hua Feng Chen, Kuo-Hua Pan, Min-Yann Hsieh, C. H. Wu
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Publication number: 20190103473Abstract: A method includes forming a transistor, which includes forming a dummy gate stack over a semiconductor region, and forming an Inter-Layer Dielectric (ILD). The dummy gate stack is in the ILD, and the ILD covers a source/drain region in the semiconductor region. The method further includes removing the dummy gate stack to form a trench in the first ILD, forming a low-k gate spacer in the trench, forming a replacement gate dielectric extending into the trench, forming a metal layer to fill the trench, and performing a planarization to remove excess portions of the replacement gate dielectric and the metal layer to form a gate dielectric and a metal gate, respectively. A source region and a drain region are then formed on opposite sides of the metal gate.Type: ApplicationFiled: November 30, 2018Publication date: April 4, 2019Inventors: Kuo-Hua Pan, Je-Wei Hsu, Hua Feng Chen, Jyun-Ming Lin, Chen-Huang Peng, Min-Yann Hsieh, Java Wu
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Publication number: 20180197970Abstract: A method includes forming a transistor, which includes forming a dummy gate stack over a semiconductor region, and forming an Inter-Layer Dielectric (ILD). The dummy gate stack is in the ILD, and the ILD covers a source/drain region in the semiconductor region. The method further includes removing the dummy gate stack to form a trench in the first ILD, forming a low-k gate spacer in the trench, forming a replacement gate dielectric extending into the trench, forming a metal layer to fill the trench, and performing a planarization to remove excess portions of the replacement gate dielectric and the metal layer to form a gate dielectric and a metal gate, respectively. A source region and a drain region are then formed on opposite sides of the metal gate.Type: ApplicationFiled: June 1, 2017Publication date: July 12, 2018Inventors: Kuo-Hua Pan, Je-Wei Hsu, Hua Feng Chen, Jyun-Ming Lin, Chen-Huang Peng, Min-Yann Hsieh, Java Wu
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Publication number: 20180174916Abstract: Embodiments of a semiconductor device structure and a method for forming the same are provided. The semiconductor device structure includes a substrate and a first metal gate structure formed over the substrate. The first metal gate structure has a first width. The semiconductor device structure further includes a first contact formed adjacent to the first metal gate structure and a second metal gate structure formed over the substrate. The second metal gate structure has a second width smaller than the first width. The semiconductor device structure further includes an insulating layer formed over the second metal gate structure and a second contact self-aligned to the second metal gate structure.Type: ApplicationFiled: February 19, 2018Publication date: June 21, 2018Inventors: Wei-Shuo HO, Tsung-Yu CHIANG, Chia-Ming CHANG, Jyun-Ming LIN
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Publication number: 20180151697Abstract: A semiconductor device and method for fabricating such a device are presented. The semiconductor device includes a first gate electrode of a transistor, a first sidewall spacer along a sidewall of the gate pattern, a first insulating layer in contact with the first sidewall spacer and having a planarized top surface, and a second sidewall spacer formed on the planarized top surface of the first insulating layer. The second sidewall spacer may be formed over the first sidewall spacer. A width of the second sidewall spacer is equal to or greater than a width of the first sidewall spacer.Type: ApplicationFiled: January 9, 2018Publication date: May 31, 2018Inventors: Jyun-Ming LIN, Hua Feng CHEN, Kuo-Hua PAN, Min-Yann HSIEH, C.H. WU
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Patent number: 9899265Abstract: Embodiments of a semiconductor device structure and a method for forming the same are provided. The semiconductor device structure includes a substrate and a first metal gate structure formed over the substrate. The first metal gate structure has a first width. The semiconductor device structure further includes a first contact formed adjacent to the first metal gate structure and a second metal gate structure formed over the substrate. The second metal gate structure has a second width smaller than the first width. The semiconductor device structure further includes an insulating layer formed over the second metal gate structure and a second contact self-aligned to the second metal gate structure.Type: GrantFiled: December 19, 2016Date of Patent: February 20, 2018Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Wei-Shuo Ho, Tsung-Yu Chiang, Chia-Ming Chang, Jyun-Ming Lin
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Patent number: 9882023Abstract: A semiconductor device and method for fabricating such a device are presented. The semiconductor device includes a first gate electrode of a transistor, a first sidewall spacer along a sidewall of the gate pattern, a first insulating layer in contact with the first sidewall spacer and having a planarized top surface, and a second sidewall spacer formed on the planarized top surface of the first insulating layer. The second sidewall spacer may be formed over the first sidewall spacer. A width of the second sidewall spacer is equal to or greater than a width of the first sidewall spacer.Type: GrantFiled: February 29, 2016Date of Patent: January 30, 2018Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Jyun-Ming Lin, Hua Feng Chen, Kuo-Hua Pan, Min-Yann Hsieh, C. H. Wu
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Publication number: 20170250264Abstract: A semiconductor device and method for fabricating such a device are presented. The semiconductor device includes a first gate electrode of a transistor, a first sidewall spacer along a sidewall of the gate pattern, a first insulating layer in contact with the first sidewall spacer and having a planarized top surface, and a second sidewall spacer formed on the planarized top surface of the first insulating layer. The second sidewall spacer may be formed over the first sidewall spacer. A width of the second sidewall spacer is equal to or greater than a width of the first sidewall spacer.Type: ApplicationFiled: February 29, 2016Publication date: August 31, 2017Inventors: Jyun-Ming LIN, Hua Feng CHEN, Kuo-Hua PAN, Min-Yann HSIEH, C.H. WU
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Patent number: 9711415Abstract: A semiconductor device having five gate stacks on different regions of a substrate and methods of making the same are described. The device includes a semiconductor substrate and isolation features to separate the different regions on the substrate. The different regions include a p-type field-effect transistor (pFET) core region, an input/output pFET (pFET IO) region, an n-type field-effect transistor (nFET) core region, an input/output nFET (nFET IO) region, and a high-resistor region.Type: GrantFiled: May 11, 2012Date of Patent: July 18, 2017Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Jyun-Ming Lin, Wei Cheng Wu, Sheng-Chen Chung, Bao-Ru Young, Hak-Lay Chuang
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Publication number: 20170098581Abstract: Embodiments of a semiconductor device structure and a method for forming the same are provided. The semiconductor device structure includes a substrate and a first metal gate structure formed over the substrate. The first metal gate structure has a first width. The semiconductor device structure further includes a first contact formed adjacent to the first metal gate structure and a second metal gate structure formed over the substrate. The second metal gate structure has a second width smaller than the first width. The semiconductor device structure further includes an insulating layer formed over the second metal gate structure and a second contact self-aligned to the second metal gate structure.Type: ApplicationFiled: December 19, 2016Publication date: April 6, 2017Inventors: Wei-Shuo HO, Tsung-Yu CHIANG, Chia-Ming CHANG, Jyun-Ming LIN
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Patent number: 9524965Abstract: Embodiments of a semiconductor device structure and a method for forming the same are provided. The semiconductor device structure includes a substrate and a first metal gate structure formed over the substrate. The first metal gate structure has a first width. The semiconductor device structure further includes a first contact formed adjacent to the first metal gate structure and a second metal gate structure formed over the substrate. The second metal gate structure has a second width smaller than the first width. The semiconductor device structure further includes an insulating layer formed over the second metal gate structure and a second contact self-aligned to the second metal gate structure.Type: GrantFiled: February 12, 2014Date of Patent: December 20, 2016Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Wei-Shuo Ho, Tsung-Yu Chiang, Chia-Ming Chang, Jyun-Ming Lin
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Patent number: 9472636Abstract: The present disclosure provides a method of fabricating a semiconductor device. The method includes forming a first gate structure and a second gate structure over a substrate. The first and second gate structures each include a high-k dielectric layer located over the substrate, a capping layer located over the high-k dielectric layer, an N-type work function metal layer located over the capping layer, and a polysilicon layer located over the N-type work function metal layer. The method includes forming an inter-layer dielectric (ILD) layer over the substrate, the first gate structure, and the second gate structure. The method includes polishing the ILD layer until a surface of the ILD layer is substantially co-planar with surfaces of the first gate structure and the second gate structure. The method includes replacing portions of the second gate structure with a metal gate. A silicidation process is then performed to the semiconductor device.Type: GrantFiled: July 7, 2015Date of Patent: October 18, 2016Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Ming Zhu, Bao-Ru Young, Harry-Hak-Lay Chuang, Jyun-Ming Lin, Wei Cheng Wu