Patents by Inventor Jyun-You LU

Jyun-You LU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for forming micro-lens array and photomask therefor
    Patent number: 12174398
    Abstract: A method for forming a micro-lens array is provided. According to the method, a substrate is provided, and a hard-mask layer is formed. A lithography process is performed on the hard-mask layer by a hard-mask to form a first pattern and a second pattern. Then, the first pattern and the second pattern are reflowed to form a first lens structure and a second lens structure respectively. The photomask includes a first pattern segment and a second pattern segment, and the second pattern segment includes a transparent region and an opaque region. An area of the transparent region of the second pattern segment is larger than 18% of an area of the second pattern segment.
    Type: Grant
    Filed: April 12, 2021
    Date of Patent: December 24, 2024
    Assignee: VISERA TECHNOLOGIES COMPANY LIMITED
    Inventors: Jyun-You Lu, Hsin-Yen Tsai, Hao-Min Chen
  • EXPOSURE MASK
    Publication number: 20220244631
    Abstract: An exposure mask is provided. The exposure mask includes a plurality of pattern blocks for defining a plurality of pattern profiles. Each pattern block includes a plurality of pattern units having mask patterns, and the mask patterns are formed in an asymmetric arrangement. The exposure mask may be a binary exposure mask for forming pattern profiles with curved surfaces.
    Type: Application
    Filed: February 3, 2021
    Publication date: August 4, 2022
    Inventors: Yueh-Ching CHENG, Linya TSENG, Jyun-You LU
  • METHOD FOR FORMING MICRO-LENS ARRAY AND PHOTOMASK THEREFOR
    Publication number: 20210231840
    Abstract: A method for forming a micro-lens array is provided. According to the method, a substrate is provided, and a hard-mask layer is formed. A lithography process is performed on the hard-mask layer by a hard-mask to form a first pattern and a second pattern. Then, the first pattern and the second pattern are reflowed to form a first lens structure and a second lens structure respectively. The photomask includes a first pattern segment and a second pattern segment, and the second pattern segment includes a transparent region and an opaque region. An area of the transparent region of the second pattern segment is larger than 18% of an area of the second pattern segment.
    Type: Application
    Filed: April 12, 2021
    Publication date: July 29, 2021
    Inventors: Jyun-You LU, Hsin-Yen TSAI, Hao-Min CHEN
  • METHOD FOR FORMING MICRO-LENS ARRAY AND PHOTOMASK THEREFOR
    Publication number: 20190339422
    Abstract: A method for forming a micro-lens array is provided. According to the method, a substrate is provided, and a hard-mask layer is formed. A lithography process is performed on the hard-mask layer by a hard-mask to form a first pattern and a second pattern. Then, the first pattern and the second pattern are reflowed to form a first lens structure and a second lens structure respectively. The photomask includes a first pattern segment and a second pattern segment, and the second pattern segment includes a transparent region and an opaque region. An area of the transparent region of the second pattern segment is larger than 18% of an area of the second pattern segment.
    Type: Application
    Filed: May 3, 2018
    Publication date: November 7, 2019
    Inventors: Jyun-You LU, Hsin-Yen TSAI, Hao-Min CHEN