Patents by Inventor Jyunichi Mizuta

Jyunichi Mizuta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positive photoresist composition
    Patent number: 6869742
    Abstract: A positive photoresist composition includes (A) an alkali-soluble novolak resin containing 1,2-naphthoquinonediazidosulfonyl groups substituting for part of hydrogen atoms of phenolic hydroxyl groups, (B) an ester of, for example, a compound represented by the following formula with a naphthoquinonediazidosulfonyl compound, and (C) a sensitizer:
    Type: Grant
    Filed: April 1, 2002
    Date of Patent: March 22, 2005
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Jyunichi Mizuta, Kouji Yonemura, Akira Katano, Satoshi Niikura, Kousuke Doi
  • Positive photoresist composition
    Publication number: 20020182531
    Abstract: A positive photoresist composition includes (A) an alkali-soluble novolak resin containing 1,2-naphthoquinonediazidosulfonyl groups substituting for part of hydrogen atoms of phenolic hydroxyl groups, (B) an ester of, for example, a compound represented by the following formula with a naphthoquinonediazidosulfonyl compound, and (C) a sensitizer: 1
    Type: Application
    Filed: April 1, 2002
    Publication date: December 5, 2002
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Jyunichi Mizuta, Kouji Yonemura, Akira Katano, Satoshi Niikura, Kousuke Doi