Patents by Inventor Jyunji Kido

Jyunji Kido has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Sputtering target, method for producing same, sputtering thin film formed by using such sputtering target, and organic EL device using such thin film
    Patent number: 8029655
    Abstract: Provided is a sputtering target which can give a high water barrier property and a high flexibility to a sputtering film, can keep a high film forming rate certainly in sputtering, and can make damages to an objective substance wherein a film is to be formed as small as possible. In order to realize this, a mixed powder which contains 20 to 80% by weight of a SiO powder, the balance of the powder being made of a TiO2 powder and/or a Ti powder, is pressed and sintered. The sintered body has a composition of Si?Ti?O? wherein ?, ? and ? are mole ratios of Si, Ti and O, respectively, and the ratio of ?/? ranges from 0.45 to 7.25 and the ratio of ?/(?+?) ranges from 0.80 to 1.70.
    Type: Grant
    Filed: July 3, 2006
    Date of Patent: October 4, 2011
    Assignees: OSAKA Titanium technologies Co., Ltd., ROHM Co., Ltd.
    Inventors: Jyunji Kido, Yoshitake Natsume, Tadashi Ogasawara, Kazuomi Azuma, Koichi Mori
  • SPUTTERING TARGET, METHOD FOR PRODUCING SAME, SPUTTERING THIN FILM FORMED BY USING SUCH SPUTTERING TARGET, AND ORGANIC EL DEVICE USING SUCH THIN FILM
    Publication number: 20090127108
    Abstract: Provided is a sputtering target which can give a high water barrier property and a high flexibility to a sputtering film, can keep a high film forming rate certainly in sputtering, and can make damages to an objective substance wherein a film is to be formed as small as possible. In order to realize this, a mixed powder which contains 20 to 80% by weight of a SiO powder, the balance of the powder being made of a TiO2 powder and/or a Ti powder, is pressed and sintered. The sintered body has a composition of Si?Ti?O? wherein ?, ? and ? are mole ratios of Si, Ti and O, respectively, and the ratio of ?/? ranges from 0.45 to 7.25 and the ratio of ?/(?+?) ranges from 0.80 to 1.70.
    Type: Application
    Filed: July 3, 2006
    Publication date: May 21, 2009
    Applicants: OSAKA TITANIUM TECHNOLOGIES CO., LTD, INT'L MANUFACTURING & ENGINEERING SRVCS CO., LTD
    Inventors: Jyunji Kido, Yoshitake Natsume, Tadashi Ogasawara, Kazuomi Azuma, Koichi Mori