Abstract: A method for forming a patterned photoresist layer aligned with a predetermined layer is described. A photoresist layer is formed on a substrate and then exposed. The overlay offset between the exposed portions of the photoresist layer and the predetermined layer is measured for determining whether the exposed portions of the photoresist layer are aligned with the predetermined layer. A development step is performed when the exposed portions of the photoresist layer are found to align with the predetermined layer. An apparatus for forming a patterned photoresist layer is also described, which utilizes the aforementioned method and has a mechanism capable of feeding back the overlay offset in real time for reducing the cycle time and the rework time in the lithography process.

Abstract: The present invention discloses a removable wafer mounting tray for positioning a wafer in a microscope by utilizing a tray body that is generally constructed in a disk shape and has a recess in its top surface for receiving a wafer to be tested. The wafer mounting tray further includes a handle that extends outwardly from the tray adapted for gripping by a machine arm or by a human hand for placement of the wafer mounting tray into a test machine. The novel wafer mounting tray shelters and protects a wafer during transit to and from a test machine such that wafer breakage or scratching problems can be substantially reduced.

Abstract: Apparatus and method for securing an airway of a patient using gas capnography. Multiple gas-aspirating conduits are included upon a flexible and steerable tube or stylet. The conduits transport gases including carbon dioxide (CO.sub.2) exhaled from the airway (trachea) of a patient. The concentration or strength of the CO.sub.2 transported through each conduit is analyzed and converted into a graphic display (capnograms) on the monitor of a personal computer. When the stylet is in the main stream of the gas path emitting from the patient's trachea, the CO.sub.2 reading for the capnograms relative to each conduit will be substantially equal. Manipulating the flexible stylet to maintain substantial identity of the capnograms provides a guide to the location of the patient's trachea. Once the stylet is guided into the trachea, an endotracheal tube can be slipped over the stylet in the usual manner and intubation thereafter accomplished to gain control of the patient's airway.