Patents by Inventor K. Koya

K. Koya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Pyrimidine compounds
    Publication number: 20040048873
    Abstract: This invention features pyrimidine compounds of formula (I): 1
    Type: Application
    Filed: September 5, 2003
    Publication date: March 11, 2004
    Applicant: Synta Pharmaceuticals Corp., a Delaware corporatio
    Inventors: Mitsunori Ono, Shijie Zhang, Teresa Przewloka, K. Koya, Elena Kostik, Yuniko Wada, Lijun Sun, Weiwen Ying
  • Pyrimidine compounds
    Patent number: 6693097
    Abstract: This invention features pyrimidine compounds of formula (I): aryl, or heteroaryl; each of R2 and R4, independently, is Rc, halogen, nitro, cyano, isothionitro, SRc, or ORc; or R2 and R4, taken together, is carbonyl; R3 is Rc, alkenyl, alkynyl, ORc, OC(O)Rc, SO2Rc, S(O)Rc, S(O2)NRcRd, SRc, NRcRd, NRcCORd, NRcC(O)ORd, NRcC(O)NRcRd, NRcSO2Rd, CORc, C(O)ORc, or C(O)NRcRd; R5 is H or alkyl; n is 0, 1, 2, 3, 4, 5, or 6; X is O, S, S(O), S(O2), or NRc; Y is a covalent bond, CH2, C(O), C═N—Rc, C═N—ORc, C═N—SRc, O, S, S(O), S(O2), or NRc; Z is N or CH; one of U and V is N, and the other is CRc; and W is O, S, S(O), S(O2), NRc, or NC(O)Rc; in which each of Ra and Rb, independently, is H, alkyl, aryl, heteroaryl; and each of Rc and Rd, independently, is H, alkyl, aryl, heteroaryl, cyclyl, heterocyclyl, or alkylcarbonyl.
    Type: Grant
    Filed: November 30, 2001
    Date of Patent: February 17, 2004
    Assignee: Synta Pharmaceuticals Corp.
    Inventors: Mitsunori Ono, Shijie Zhang, Teresa Przewloka, K. Koya, Elena Kostik, Yuniko Wada, Lijun Sun, Weiwen Ying
  • Pyrimidine compounds
    Publication number: 20030139403
    Abstract: This invention features pyrimidine compounds of formula (I): 1 2
    Type: Application
    Filed: November 30, 2001
    Publication date: July 24, 2003
    Inventors: M. Ono, Lijun Sun, Teresa Przewloka, Shijie Zhang, Elena Kostic, Weiwen Ying, Yumiko Wada, K. Koya