Patents by Inventor Kadthala Narendrnath

Kadthala Narendrnath has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PAD PROPERTIES USING NANOPARTICLE ADDITIVES
    Publication number: 20090278081
    Abstract: A method for forming a polishing media and an article of manufacture is described. The article of manufacture may be formed into a polishing article. The polishing article includes a polymer base material and a plurality of nano-scale structures disposed in or on the polymer base material.
    Type: Application
    Filed: March 25, 2009
    Publication date: November 12, 2009
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Hichem M'Saad, Lakshmanan Karuppiah, Hung Chih Chen, Jeonghoon Oh, Robert Lum, Stan D. Tsai, Cassio Conceicao, Ashish Bhatnagar, Michael Perry, Kadthala Narendrnath, Yosi Shacham-Diamand
  • Electrostatic chuck having a plurality of gas inlet channels
    Patent number: 6370006
    Abstract: An electrostatic chuck and a process of manufacturing an electrostatic chuck for supporting a semiconductor wafer during wafer processing and for providing a plurality of gas inlet channels extending through the chuck and through which thermal transfer gas can be supplied to the back side of the wafer to enhance the thermal transfer between the wafer and the chuck, embedding a plurality of inserts in a ceramic electrostatic chuck, each insert comprising a matrix of the ceramic of which the electrostatic chuck is made and a plurality of removable elongate members, and removing the elongate members to form a plurality of elongate holes providing the plurality of gas inlet channels.
    Type: Grant
    Filed: February 17, 2000
    Date of Patent: April 9, 2002
    Assignee: Applied Materials, Inc.
    Inventors: Ananda H. Kumar, Kadthala Narendrnath, Shamouil Shamouilian