Patents by Inventor Kai-Chung Liu

Kai-Chung Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • RESIDUAL BATTERY CAPACITY ESTIMATION SYSTEM THAT ADDS TWO MUTUALLY PERPENDICULAR COMPONENTS AND THE METHOD THEREOF
    Publication number: 20140095090
    Abstract: A residual battery capacity estimation system that adds two mutually perpendicular components and the method thereof are provided. The mechanism detects the battery voltage, current and temperature as the sensing parameters, and uses the preset electrical characteristic parameters and capacity change to look up a table for the battery dynamic internal resistance component. The mechanism uses the sensing parameters and the Coulomb counting method to calculate the component of the battery Coulomb counting charge. Afterwards, the battery dynamic internal resistance component and the battery Coulomb counting capacity component are then added to calculate the actual residual power of the battery. The mechanism achieves the goal of increasing the accuracy in estimating the battery residual power.
    Type: Application
    Filed: December 26, 2012
    Publication date: April 3, 2014
    Applicant: METAL INDUSTRIES RESEARCH & DEVELOPMENT CENTRE
    Inventors: Sheng Wei CHEN, Kuan Yuen LIAO, Wen Jiun LIU, Kai Chung LIU, Li Hsuan CHUNG
  • Dimension monitoring method and system
    Patent number: 7460251
    Abstract: A system and method are disclosed for monitoring a dimensional change of a pattern for an object having a transparent layer exposed through the pattern and a non-transparent pattern laminated therewith. According to the method, a first beam is projected to the pattern. A second beam resulted from the first beam passing through the transparent layer exposed by the pattern, or from the first beam reflected from the non-transparent layer of the pattern, is detected. A value of a predetermined property from the second beam detected is obtained. A variation of the value is monitored for identifying the dimensional change of the pattern.
    Type: Grant
    Filed: October 5, 2005
    Date of Patent: December 2, 2008
    Assignee: Taiwan Semiconductor Manufacturing Co.
    Inventors: Shih-Ming Chang, Chen-Yuan Hsia, Wen-Chuan Wang, Chi-Lun Lu, Yen-Bin Huang, Chang-Cheng Hung, Chia-Jen Chen, Kai-Chung Liu, Hsin-Chang Lee, Hong-Chang Hsieh
  • Dimension monitoring method and system
    Publication number: 20070075037
    Abstract: A system and method are disclosed for monitoring a dimensional change of a pattern for an object having a transparent layer exposed through the pattern and a non-transparent pattern laminated therewith. According to the method, a first beam is projected to the pattern. A second beam resulted from the first beam passing through the transparent layer exposed by the pattern, or from the first beam reflected from the non-transparent layer of the pattern, is detected. A value of a predetermined property from the second beam detected is obtained. A variation of the value is monitored for identifying the dimensional change of the pattern.
    Type: Application
    Filed: October 5, 2005
    Publication date: April 5, 2007
    Inventors: Shih-Ming Chang, Chen-Yuan Hsia, Wen-Chuan Wang, Chi-Lun Lu, Yen-Bin Huang, Chang-Cheng Hung, Chia-Jen Chen, Kai-Chung Liu, Hsin-Chang Lee, Hong Hsieh