Abstract: A method for diagnosing a user program for controlling movement and positioning tasks of drives operated to execute a movement path of an apparatus, wherein the apparatus and movement path are depicted as a three-dimensional view in a first output element, to depict the movement path, a graphic element formed as a polygonal chain is generated for movement sections, which is operated in a force sensitive manner so that a user can select a location on the polygonal chain with a pointer device and obtain a display of an output field with a line of code that has the program instruction that is responsible through the execution for reaching the location within the movement section of the apparatus or position vector, and a recording method was performed in which the current position vector and the associated line of code or a code line index are recorded at sampling time points.

Abstract: A method for communication between function modules in drive engineering is described, wherein a first function module has a first sensor interface, wherein a second function module has a second sensor interface, wherein the first sensor interface is functionally assigned to the second sensor interface, wherein the first function module is assigned to a first automation component, wherein the second function module is assigned to a second automation component, wherein an address, in particular a logical address, for the transfer of sensor data is automatically specified.

Abstract: A method for communication between function modules in drive engineering is described, wherein a first function module has a first sensor interface, wherein a second function module has a second sensor interface, wherein the first sensor interface is functionally assigned to the second sensor interface, wherein the first function module is assigned to a first automation component, wherein the second function module is assigned to a second automation component, wherein an address, in particular a logical address, for the transfer of sensor data is automatically specified.

Abstract: In a method for communication between function modules in the field of automation systems, a first function module has a first communication interface, and a second function module has a second communication interface. The first communication interface is assigned to the second communication interface, and the assignment is stored.

Abstract: The invention is directed to an arrangement for generating extreme ultraviolet radiation from a plasma generated by an energy beam with high conversion efficiency, particularly for application in radiation sources for EUV lithography. It is the object of the invention to find a novel possibility for generating EUV radiation by means of a plasma induced by an energy beam that permits a more efficient conversion of the energy radiation into EUV radiation in the wavelength region of 13.5 nm and ensures a long lifetime of the optical components and the injection device.

Abstract: It is the object of a device and method for generating extreme ultraviolet (EUV) radiation to overcome the obstacles formerly posed by the use of efficient metal emitters so that the conversion efficiency can be optimized and, as a result, the radiation output can be increased without shortening the useful life of the collector optics and electrode system. An injection nozzle of an injection device is directed to a discharge area located in a discharge chamber. The injection nozzle supplies a series of individual volumes of a source materials for the electric discharge serving to generate radiation at a repetition rate that corresponds to the frequency of the gas discharge. Further, provision is made for successively vaporizing the individual volumes in the discharge area.

Abstract: The invention is directed to an arrangement for providing target material for the generation of short-wavelength electromagnetic radiation, in particular EUV radiation. It is the object of the invention to find a novel possibility for providing target material for the generation of short-wavelength radiation based on an energy beam induced plasma which makes it possible to supply a reproducible successive flow of mass-limited targets in the interaction chamber in such a way that only the amount of target material needed for efficient generation of radiation achieves plasma generation. This object is met, according to the invention, in that the target generator opens into a selection chamber which precedes the interaction chamber and which has, along the target path, an outlet opening into the interaction chamber and in which a target selector is arranged.

Abstract: The invention is directed to an arrangement for providing a reproducible target flow for the energy beam-induced generation of short-wavelength radiation. It is the object of the invention to find a novel possibility for providing a reproducibly supplied target flow for the generation of a plasma that emits short-wavelength radiation which ensures a high directional stability of the target flow over a large number of individual plasma generation process for any target materials under given process conditions. According to the invention, this object is met in that a nozzle protection device is provided in the interaction chamber between the target nozzle and the interaction point for the generation of the plasma, and the nozzle protection device contains a gas pressure chamber which has an aperture along the target path for unobstructed passage of the target flow and which is filled with a buffer gas that is maintained at a pressure of some 10 mbar.

Abstract: The invention is directed to an arrangement for generating extreme ultraviolet radiation from a plasma generated by an energy beam with high conversion efficiency, particularly for application in radiation sources for EUV lithography. It is the object of the invention to find a novel possibility for generating EUV radiation by means of a plasma induced by an energy beam that permits a more efficient conversion of the energy radiation into EUV radiation in the wavelength region of 13.5 nm and ensures a long lifetime of the optical components and the injection device.

Abstract: The invention is directed to a collector mirror for short-wavelength radiation based on a plasma. It is the object of the invention to find a novel possibility for managing the temperature of a collector mirror for focusing short-wavelength radiation generated from a plasma which allows an efficient thermal connection to be produced between the optically active mirror surface and a thermostat system without the disadvantages relating to space requirements or high-precision manufacture of the collector mirror. This object is met, according to the invention, in that the collector mirror has a solid, rotationally symmetric substrate which comprises a material with high thermal conductivity of more than 50 W/mK and in which channels for cooling and temperature management are incorporated in the substrate so that a heat transport medium can flow through directly and for rapidly stabilizing the temperature of the optically active mirror surface.

Abstract: The invention is directed to an apparatus for generating soft x-radiation, particularly EUV radiation, by laser-induced plasma. The object of the invention, to find a novel possibility for generating EUV radiation by means of a laser-induced plasma by which a temporally stable radiation emission in the desired wavelength region is ensured when interacting with the target without active regulation of the laser beam, is met according to the invention in that at least one laser is directed to the target, wherein the laser has at least one defined plane with a highly stable spatial distribution of the power density of the laser, and this defined plane is imaged on the target by an optical imaging system so as to be reduced so that the optical image of the defined plane is active for the plasma generation instead of the laser focus. The invention is applied in exposure machines for semiconductor lithography for spatially stable generation of radiation.

Abstract: The invention is directed to a method and an arrangement for the plasma-based generation of intensive short-wavelength radiation, particularly EUV radiation.

Abstract: In a radiation source for the generation of short-wavelength radiation, it is the object of the invention to effectively increase the protection of the collimator optics by a buffer gas without substantially reducing the radiation transmission. A vacuum chamber which encloses a radiation-emitting plasma and is outfitted with at least one feed line and one outlet line for a buffer gas in order to ensure protection against debris for at least one optical element which directs the radiation to a radiation outlet opening in the vacuum chamber has chamber areas with particle deceleration of varying magnitude by the buffer gas. The particle deceleration is greater at least in a first chamber area in which the optical element is arranged than in any other chamber area.

Abstract: The invention is directed to an arrangement for generating a pulsed laser beam with high average output, in particular for generating a hot plasma which emits extreme ultraviolet (EUV) radiation. It is the object of the invention to find a novel possibility for generating a laser beam with a high repetition rate and average output which allows the repetition frequency and, therefore, the output of the laser system to be increased by connecting together a plurality of individual lasers having limited repetition rate without degradation of the beam quality on the target compared to that of an individual laser.

Abstract: The invention is directed to a method and an arrangement for plasma-based generation of soft x-radiation, particularly for the generation of extreme ultraviolet (EUV) radiation. The object of the invention, to find a novel possibility for providing a target for a plasma-based radiation source which permits a reduction in the heating and erosion of the nozzle and therefore permits an improved temperature control at the injection device, is met according to the invention in that a closure device is arranged between the target nozzle and the interaction region which interrupts an opening for temporarily passing the target flow by mechanically moving elements, wherein at least a portion of the target flow that is provided in a reproducible manner is separated in order to interact with the energy beam only during those time intervals in which an optical transmission from the interaction region to the target nozzle is prevented by the closure device.

Abstract: A short-wavelength radiation is generated which is stable over time from a plasma generated by energy input into a target jet, in which intensity variations due to altered coupling of excitation radiation into the target jet are minimized. Measuring devices are provided for successive detection over time of deviations of at least one of the directions of the target jet or the energy beam from an intersection point of the two directions that is provided as an interaction point. The measuring devices have output signals which are suitable as regulating variables for the orientation of the directions on the interaction point, and actuating elements are provided for adjusting and tracking at least one of the directions of either the target jet or the energy beam depending on the output signal of the measuring devices in the manner of a control loop.

Abstract: The object of a plasma radiation source is to ensure a more effective protection against debris and, in particular, to counteract secondary sputtering. A target flow that is provided by a target generator by means of a target nozzle and a plasma that is generated by a pulsed excitation beam are enclosed within a vacuum chamber by a gas flow directed transverse to the optical axis.

Abstract: The invention is directed to a collector mirror for short-wavelength radiation based on a plasma. It is the object of the invention to find a novel possibility for managing the temperature of a collector mirror for focusing short-wavelength radiation generated from a plasma which allows an efficient thermal connection to be produced between the optically active mirror surface and a thermostat system without the disadvantages relating to space requirements or high-precision manufacture of the collector mirror. This object is met, according to the invention, in that the collector mirror has a solid, rotationally symmetric substrate which comprises a material with high thermal conductivity of more than 50 W/mK and in which channels for cooling and temperature management are incorporated in the substrate so that a heat transport medium can flow through directly and for rapidly stabilizing the temperature of the optically active mirror surface.

Abstract: In a radiation source for the generation of short-wavelength radiation, it is the object of the invention to effectively increase the protection of the collimator optics by a buffer gas without substantially reducing the radiation transmission. A vacuum chamber which encloses a radiation-emitting plasma and is outfitted with at least one feed line and one outlet line for a buffer gas in order to ensure protection against debris for at least one optical element which directs the radiation to a radiation outlet opening in the vacuum chamber has chamber areas with particle deceleration of varying magnitude by the buffer gas. The particle deceleration is greater at least in a first chamber area in which the optical element is arranged than in any other chamber area.

Abstract: It is the object of a device and method for generating extreme ultraviolet (EUV) radiation to overcome the obstacles formerly posed by the use of efficient metal emitters so that the conversion efficiency can be optimized and, as a result, the radiation output can be increased without shortening the useful life of the collector optics and electrode system. An injection nozzle of an injection device is directed to a discharge area located in a discharge chamber. The injection nozzle supplies a series of individual volumes of a starting material serving to generate radiation at a repetition rate that corresponds to the frequency of the gas discharge. Further, provision is made for successively vaporizing the individual volumes in the discharge area.