Patents by Inventor Kai Hsiao

Kai Hsiao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070190884
    Abstract: Fibers of square cross sections are presented in the invention. The square fiber leads to higher packing density and results in higher wind resistance in fabrics as compared to the conventional round fibers and other polygonal fibers. Therefore, the square fiber is more suitable for manufacture of the windproof clothing. In addition, the square fibers exhibit higher luster than the round fibers and other polygonal fibers due to the flat and shiny fiber surface.
    Type: Application
    Filed: February 20, 2007
    Publication date: August 16, 2007
    Applicant: Industrial Technology Research Institute
    Inventors: Lien-Tai Chen, Kai Hsiao, Shu Hui Cheng, Zhi Jue
  • Publication number: 20070077840
    Abstract: The present invention provides a new tetragon fiber and a method for fabricating the same. The present invention includes: heating a thermoplastic material, extruding it from a tetragon-shaped nozzle, passing it through an airless zone, then cooling and solidifying to form threadlike substances, rolling up then processing the threadlike substances to form fibers with tetragon cross sections. The fabrics of present invention comprises a property of fine air-tightness.
    Type: Application
    Filed: July 17, 2006
    Publication date: April 5, 2007
    Applicant: Industrial Technology Research Institute
    Inventors: Lien Chen, Kai Hsiao, Shu Cheng, Zhi Jue
  • Publication number: 20050231621
    Abstract: The present invention describes an integrated image detecting apparatus with low noise, which transforms optical current to voltage and comprises an optical detecting element, an integrated circuit, a correlated double sampling circuit, and an output circuit. The present invention is a CMOS process and is designed for different CMOS image application systems, which keeps the advantages of low power consumption and better integration. Shifts of circuit characteristics caused by process variation are furthermore eliminated.
    Type: Application
    Filed: April 20, 2004
    Publication date: October 20, 2005
    Inventors: Wen Su, Chun Hsu, Hung Lin, Kai Hsiao