Abstract: A method for controlling semiconductor production through use of a Focus Exposure Matrix (FEM) model includes taking measurements of characteristics of a two-dimensional mark formed onto a substrate, the two-dimensional mark including two different patterns along two different cut-lines, and comparing the measurements with a FEM model to determine focus and exposure conditions used to form the two-dimensional mark. The FEM model was created using measurements taken of corresponding two-dimensional marks formed onto a substrate under varying focus and exposure conditions.

Abstract: A controller and one or more access points that dynamically modify data collection in a system that includes a WLAN is described. In particular, during operation the access point may receive data for a type of data from an electronic device in the WLAN. Then, access point may aggregate the data based on an aggregation interval, where the aggregation interval is predefined for a group of types of data that includes the type of data. Moreover, the access point may transmit the aggregated data to the controller based on a reporting interval, where the reporting interval is predefined for the group of types of data. Next, the access point may receive an instruction from the controller to modify the aggregation interval and/or the reporting interval for the group of types of data. Furthermore, the access point may modify the aggregation interval and/or the reporting interval based on the instruction.

Abstract: A controller and one or more access points that dynamically modify data collection in a system that includes a WLAN is described. In particular, during operation the access point may receive data for a type of data from an electronic device in the WLAN. Then, access point may aggregate the data based on an aggregation interval, where the aggregation interval is predefined for a group of types of data that includes the type of data. Moreover, the access point may transmit the aggregated data to the controller based on a reporting interval, where the reporting interval is predefined for the group of types of data. Next, the access point may receive an instruction from the controller to modify the aggregation interval and/or the reporting interval for the group of types of data. Furthermore, the access point may modify the aggregation interval and/or the reporting interval based on the instruction.

Abstract: A method for controlling semiconductor production through use of a Focus Exposure Matrix (FEM) model includes taking measurements of characteristics of a two-dimensional mark formed onto a substrate, the two-dimensional mark including two different patterns along two different cut-lines, and comparing the measurements with a FEM model to determine focus and exposure conditions used to form the two-dimensional mark. The FEM model was created using measurements taken of corresponding two-dimensional marks formed onto a substrate under varying focus and exposure conditions.