Patents by Inventor Kai Hua HOU

Kai Hua HOU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11398481
    Abstract: Semiconductor cell structure and forming method thereof are provided. The semiconductor cell structure includes: a substrate including a first section and third regions on both sides of the first section in a first direction; and a first gate structure group including one or more first gate structures on the substrate. The first section includes a first region and a second region aligned along the first direction in the first section. The first region and the second region are configured to form transistors have a type opposite to a type of transistors configured to be formed in the third regions. The one or more first gate structures extend along the first direction across the first region, the second region, and the third regions on both sides of the first section.
    Type: Grant
    Filed: May 28, 2020
    Date of Patent: July 26, 2022
    Assignees: Semiconductor Manufacturing International (Shanghai) Corporation, Semiconductor Manufacturing International (Beijing) Corporation
    Inventors: Yan Fei Cai, Yuan Chai, Kai Hua Hou, Jian Chen, Jun Wang
  • Patent number: 11303267
    Abstract: A flip-flop is provided. The flip-flop includes: a first inverter including an input terminal to receive data signal and an output terminal coupled to an input terminal of the master latch, a second inverter, a master latch including an output terminal coupled to an input terminal of a slave latch, and the slave latch including an output terminal coupled to an input terminal of the second inverter. An output terminal of the second inverter is configured as an output terminal of the flip-flop. A duration of the first clock signal inputted to the master latch is greater than a duration of the first clock signal inputted to the slave latch. A duration of the second clock signal inputted to the master latch is greater than a duration of the second clock signal inputted to the slave latch.
    Type: Grant
    Filed: September 10, 2020
    Date of Patent: April 12, 2022
    Assignees: Semiconductor Manufacturing International (Shanghai) Corporation, Semiconductor Manufacturing International (Beijing) Corporation
    Inventors: Yan Fei Cai, Kai Hua Hou, Yuan Chai, Jian Chen, Jun Wang
  • Publication number: 20210075407
    Abstract: A flip-flop is provided. The flip-flop includes: a first inverter including an input terminal to receive data signal and an output terminal coupled to an input terminal of the master latch, a second inverter, a master latch including an output terminal coupled to an input terminal of a slave latch, and the slave latch including an output terminal coupled to an input terminal of the second inverter. An output terminal of the second inverter is configured as an output terminal of the flip-flop. A duration of the first clock signal inputted to the master latch is greater than a duration of the first clock signal inputted to the slave latch. A duration of the second clock signal inputted to the master latch is greater than a duration of the second clock signal inputted to the slave latch.
    Type: Application
    Filed: September 10, 2020
    Publication date: March 11, 2021
    Inventors: Yan Fei CAI, Kai Hua HOU, Yuan CHAI, Jian CHEN, Jun WANG
  • Publication number: 20200381433
    Abstract: Semiconductor cell structure and forming method thereof are provided. The semiconductor cell structure includes: a substrate including a first section and third regions on both sides of the first section in a first direction; and a first gate structure group including one or more first gate structures on the substrate. The first section includes a first region and a second region aligned along the first direction in the first section. The first region and the second region are configured to form transistors have a type opposite to a type of transistors configured to be formed in the third regions. The one or more first gate structures extend along the first direction across the first region, the second region, and the third regions on both sides of the first section.
    Type: Application
    Filed: May 28, 2020
    Publication date: December 3, 2020
    Inventors: Yan Fei CAI, Yuan CHAI, Kai Hua HOU, Jian CHEN, Jun WANG