Abstract: Provided are a method for generating an installed capacity of a power system, a device, a medium, and a product. The method includes: acquiring an expected upper limit of a one-time investment coefficient and an expected lower limit of a new energy consumption rate for a target power system; determining an installed capacity of the target power system by using a power system installed capacity generation model. The installed capacity is defined by an installed capacity upper bound and an installed capacity lower bound, and the power system installed capacity generation model is obtained by training a Convolutional Neural Network (CNN)-Bidirectional Long Short-Term Memory (BiLSTM)-Bidirectional Gated Recurrent Unit (BiGRU) neural network model using a training dataset. The training dataset is established using a multi-objective coronavirus disease optimization algorithm and a wave search algorithm.

Abstract: Provided are a method for regulating a wind-photovoltaic-storage power station based on electricity, green certificate, and carbon price prediction, a device, a medium, and a product.

Abstract: Provided are a method for power production simulation and configuration optimization based on numerical simulation, a device, and a product.

Abstract: The present disclosure provides a pharmaceutical composition comprising an echinocandin analog and a preparation method for the pharmaceutical composition. Specifically, the present disclosure provides a pharmaceutical composition, comprising a compound represented by formula (I) or a pharmaceutically acceptable salt thereof, a solubilizer, and a buffer. The composition has excellent stability.

Abstract: The present disclosure provides protection apparatus and methods for a driver. An example protection apparatus includes a meter, a loop unit, and a controller. The detection unit is configured to detect a current flowing through an inverter unit. The loop unit is configured to connect a positive terminal to a negative terminal of a DC bus or disconnect the positive terminal from the negative terminal of o the DC bus. The control unit is configured to, in response to power on of the driver, control the loop unit to connect the DC bus, and determine, based on a detection result of the detection unit, whether a three-phase AC power is connected to the three-phase motor wiring terminal, wherein in the case that a three-phase AC power is connected to the three-phase motor wiring terminal, the control unit stops.

Abstract: Patterning compositions are described based on organo tin dodecamers with hydrocarbyl ligands, oxo ligands, hydroxo ligands and carboxylato ligands. Alternative dodecamer embodiments have organo tin ligands in place of hydrocarbyl ligands. The organo tin ligands can be incorporated into the dodecamers from a monomer with the structure (RCC)3SnQ, where R is a hydrocarbyl group and Q is a alkyl tin moiety with a carbon bonded to the Sn atom of the monomer and with a Sn bonded as a replacement of a quaternary carbon atom with bonds to 4 carbon atoms. Some or all of the carboxylato and hydroxyl ligands can be replaced with fluoride ions. Good EUV patterning results are obtained with the dodecamer based patterning compositions.

Abstract: Organometallic precursors are described for the formation of high resolution lithography patterning coatings based on metal oxide hydroxide chemistry. The precursor compositions generally comprise ligands readily hydrolysable by water vapor or other OH source composition under modest conditions. The organometallic precursors generally comprise a radiation sensitive organo ligand to tin that can result in a coating that can be effective for high resolution patterning at relatively low radiation doses and is particularly useful for EUV patterning. The precursors compositions are readily processable under commercially suitable conditions. Solution phase processing with in situ hydrolysis or vapor based deposition can be used to form the coatings.

Abstract: Organometallic precursor solutions containing one or more phosphonate, such as methylphosphonic acid, tert-butylphosphonic acid, diethoxyalyllphosphonate, benzylphosphonic acid, and phenylphosphonic acid, are described. Corresponding methods for forming radiation patternable coatings as well as methods for forming a pattern using a solventless developing process are also described. The incorporation of a phosphonate into an organometallic photoresist composition, such as an organotin photoresist composition, is described as a way to increase stability of organometallic precursor solutions, to improve the homogeneity of organometallic photoresist films, and/or to improve the patterning performance of organometallic photoresist coatings.

Abstract: Patterning compositions are described based on organo tin dodecamers with hydrocarbyl ligands, oxo ligands, hydroxo ligands and carboxylato ligands. Alternative dodecamer embodiments have organo tin ligands in place of hydrocarbyl ligands. The organo tin ligands can be incorporated into the dodecamers from a monomer with the structure (RCC)3SnQ, where R is a hydrocarbyl group and Q is a alkyl tin moiety with a carbon bonded to the Sn atom of the monomer and with a Sn bonded as a replacement of a quaternary carbon atom with bonds to 4 carbon atoms. Some or all of the carboxylato and hydroxyl ligands can be replaced with fluoride ions. Good EUV patterning results are obtained with the dodecamer based patterning compositions.

Abstract: Patterning of organometallic radiation sensitive compositions is facilitated using alkylsulfonic acid developer compositions and patterning methods. The alkylsulfonic acid developer compositions comprise an alkylsulfonic acid composition and a solvent, such as water or an organic solvent. In some embodiments, contact with an alkylsulfonic acid developer composition can be performed on an organometallic composition having a latent image to form a developed, physical pattern. The latent image may be formed by irradiation of an organometallic composition with a pattern of radiation, such as EUV radiation. In some embodiments, contact with an alkylsulfonic acid developer composition can be performed on an organometallic composition having a physical pattern to form a higher contrast, descummed pattern.

Abstract: Organometallic radiation resist compositions are described based on tin ions with alkyl ligands. Some of the compositions have branched alkyl ligands to provide for improved patterning contrast while maintaining a high degree of solution stability. Blends of compounds with distinct alkyl ligands can provide further improvement in the patterning. High resolution patterning with a half-pitch of no more than 25 nm can be achieved with a line width roughness of no more than about 4.5 nm. Synthesis techniques have been developed that allow for the formation of alkyl tin oxide hydroxide compositions with very low metal contamination.

Abstract: Developer compositions are described based on blends of solvents, in which the developers are particularly effective for EUV patterning using organometallic based patterning compositions. Methods for use of these developing compositions are described. The blends of solvents can be selected based on Hansen solubility parameters. Generally, one solvent has low polarity as express by the sum of ?P+?H, and a second solvent component of the developer has a higher value of ?P+?H. Corresponding solvent compositions are described.

Abstract: Organometallic precursor solutions containing one or more peroxide compositions, such as hydrogen peroxide, urea hydrogen peroxide, and organo peroxydisulfates, are described. Corresponding coated substrates and radiation patterned substrates as well as methods of preparing organometallic precursor solutions containing a peroxide composition are also described. Novel organo peroxydisulfates and a technique for synthesizing an organo peroxydisulfate are further described. The incorporation of a peroxide composition into an organometallic photoresist composition is described as a way to increase stability of organometallic precursor solutions and/or to improve the patterning performance of organometallic photoresist coatings.

Abstract: Organometallic precursors are described for the formation of high resolution lithography patterning coatings based on metal oxide hydroxide chemistry. The precursor compositions generally comprise ligands readily hydrolysable by water vapor or other OH source composition under modest conditions. The organometallic precursors generally comprise a radiation sensitive organo ligand to tin that can result in a coating that can be effective for high resolution patterning at relatively low radiation doses and is particularly useful for EUV patterning. The precursors compositions are readily processable under commercially suitable conditions. Solution phase processing with in situ hydrolysis or vapor based deposition can be used to form the coatings.

Abstract: A power assembly includes a motor, a controller and a first cooling unit. The controller is electrically connected with the motor. The first cooling unit includes a first coolant flow passage and a second coolant flow passage, wherein the first coolant flow passage is configured to be capable of exchanging heat with a heating element of the controller, and the second coolant flow passage is configured to be capable of exchanging heat with an outer housing of the motor. The first coolant flow passage and the second coolant flow passage are connected in series or in parallel.

Abstract: Developer compositions are described based on blends of solvents, in which the developers are particularly effective for EUV patterning using organometallic based patterning compositions. Methods for use of these developing compositions are described. The blends of solvents can be selected based on Hansen solubility parameters. Generally, one solvent has low polarity as express by the sum of ?P+?H, and a second solvent component of the developer has a higher value of ?P+?H. Corresponding solvent compositions are described.

Abstract: Provided are an electronic seal label apparatus, an electric motor assembly with the electronic seal label apparatus, and an electronic seal label verification method. The electronic seal label apparatus includes: a magnet configured on a first component; and a sensing element configured on a second component and fixed opposite the magnet. When relative motion takes place between the first component and the second component, the sensing element generates a first signal according to the Wiegand effect, so that a disassembly or assembly state between the first component and the second component, which can be removed from each other, can be detected automatically.

Abstract: Methods and apparatus for transferring a signal from a first stage of an amplification circuit to a second stage of an amplification circuit via a matching network are described. An example matching network generally includes a transformer, a first coil selectively coupled, inductively, to the transformer, and inductive path(s) coupled between a first input node and a first output node of the transformer. Each inductive path includes a respective second coil selectively coupled, inductively, to the transformer. The transformer includes: the first input node and a second input node for coupling to the first stage; the first output node and a second output node for coupling to the second stage; a primary winding coupled between the first input node and the second input node; and a secondary winding inductively coupled to the primary winding and coupled between the first output node and the second output node.

Abstract: A grafting device and a grafting method based on a UV (Ultraviolet Rays) adhesive are provided. The grafting device includes a workbench, a transfer mechanism, a seedling loading mechanism, a cutting mechanism, an adhesive spraying mechanism, a curing mechanism and a seedling unloading mechanism. Along the circumferential direction of the transfer mechanism, a seedling loading station, an adhesive spraying station, a curing station and a seedling unloading station are sequentially arranged. The seedling loading mechanism is configured for bearing a rootstock and a scion, and the cutting mechanism is configured for cutting the rootstock and the scion. The transfer mechanism is configured for receiving and fixing the rootstock and the scion, and transporting the rootstock and the scion intermittently from the seedling loading station, the adhesive spraying station, the curing station and the seedling unloading station in turn to obtain a grafted seedling.

Abstract: As described herein, photosensitive composition comprises RSnL3, where R is a hydrocarbyl ligand with 1-20 carbon atoms and one or more silicon and/or germanium heteroatoms and L is an acetylide ligand (—C?CA, where A is a silyl group with 0 to 6 carbon atoms or an organo group with 1 to 10 carbon atoms). Methods are described wherein photosensitive compositions are synthesized by reacting RX, where X is a halide, and MSnL3, where M is an alkali metal, alkali earth metal or a pseudo-alkali earth metal, L is an acetylide or a dialkylamide. The radiation sensitive compositions are effective for radiation based patterning, such as with EUV light.