Patents by Inventor Kai Jiang

Kai Jiang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12756366
    Abstract: Methods and apparatus for transferring a signal from a first stage of an amplification circuit to a second stage of an amplification circuit via a matching network are described. An example matching network generally includes a transformer, a first coil selectively coupled, inductively, to the transformer, and inductive path(s) coupled between a first input node and a first output node of the transformer. Each inductive path includes a respective second coil selectively coupled, inductively, to the transformer. The transformer includes: the first input node and a second input node for coupling to the first stage; the first output node and a second output node for coupling to the second stage; a primary winding coupled between the first input node and the second input node; and a secondary winding inductively coupled to the primary winding and coupled between the first output node and the second output node.
    Type: Grant
    Filed: February 26, 2024
    Date of Patent: October 6, 2026
    Assignee: QUALCOMM Incorporated
    Inventors: Kai Jiang, Sean Joel Lyn, Shahram Abdollahi-Alibeik, Amit Jha, Hyun Min Park
  • Publication number: 20260299407
    Abstract: Additives are described to modify and improve radiation patterning properties of organotin compositions. These additives can be organized into five genera of compositions falling within the general formula X—RQ-Q, where X is a hydrogen or a group with a heteroatom, RQ can be a short chain alkyl group or an aromatic moiety depending on which of the five genera are considered. Q can be designed for specific hydrophobic properties or can have specific structures with heteroatoms that can interact with tin cations within the patterning material. The five genera of additive compositions generally function to slow hydrolysis of hydrolysable ligands bound to the tin atoms in the patterning material. Additives are described in the context of precursor solutions as well as in patternable coatings. To achieve a desirable distribution of additive in the deposited coatings, a plurality of deposition steps can be used.
    Type: Application
    Filed: March 30, 2026
    Publication date: October 1, 2026
    Inventors: Alexander C. Marwitz, Brian J. Cardineau, Matthew Voss, Colin T. Carver, Kai Jiang
  • Publication number: 20260276741
    Abstract: Various embodiments include methods for determining maintenance of a DC busbar filtering electrolytic capacitor. An example includes: recording a DC busbar voltage of a capacitor in a driving circuit of a driving motor during charging capacitor, wherein the is the difference between voltages at two ends of the capacitor; determining a charging starting time point and a charging ending time point according to the recorded DC busbar voltages, and selecting a time point from time points between the charging starting time point and the charging ending time point; calculating a time constant according to a starting voltage corresponding to the charging starting time point, an ending voltage corresponding to the charging ending time point, the selected time point and the voltage corresponding to the selected time point; and determining whether it is necessary to perform maintenance for the capacitor based on the time constant.
    Type: Application
    Filed: March 28, 2023
    Publication date: September 17, 2026
    Applicant: Siemens Aktiengesellschaft
    Inventors: Kai Jiang, Yan Hua Guo
  • Publication number: 20260242793
    Abstract: A pharmaceutical composition for inhibiting NFKBIZ gene expression, and use thereof, are provided. A double-stranded nucleic acid molecule capable of targeting and regulating NFKBIZ gene expression is designed. By means of verifying the gene regulation efficiency of nucleic acid molecules, multiple nucleic acid molecules capable of inhibiting NFKBIZ gene expression are obtained from screening, and efficient inhibition of I?B-? protein expression is achieved at the protein level. In addition, use of a pharmaceutical composition formed by the conjugation of the designed nucleic acid molecules and targeting ligands is verified in ocular disease treatment.
    Type: Application
    Filed: May 8, 2026
    Publication date: August 20, 2026
    Inventors: Chuan ZHANG, Yangyang HUANG, Kai JIANG, Yuhe LIU, Haonan CUI, Kaiqing ZHANG
  • Publication number: 20260219186
    Abstract: Disclosed is a system for upconversion chemiluminescence detection based on magnetic microparticles. A sample carrying module is disposed on a working surface and configured to input, preload, and output a plurality of samples. A gripping module is configured to grip a reaction cup and a pipette tip. A sample aspiration and dispensing module is configured to aspirate one of the plurality of samples and reagents and dispense one of the plurality of samples and the reagents into the reaction cup. The reagents include at least a monoclonal antibody reagent bound with magnetic microparticles and a monoclonal antibody reagent labeled with an up-converting phosphor. A detection preparation module is configured to perform one or more cycles of mixing, incubation, and washing and separation on the sample and the reagent. An optical measurement module is configured to excite an up-converting luminescent label and detect a fluorescence signal intensity.
    Type: Application
    Filed: March 23, 2026
    Publication date: July 30, 2026
    Applicant: SUZHOU HELMEN PRECISION INSTRUMENTS CO., LTD.
    Inventors: Kai JIANG, Tao ZHANG, Ping WANG, Yang WANG, Yawei TANG
  • Publication number: 20260180327
    Abstract: Provided are a method for coordinated dispatch of hybrid energy storage systems to adapt to peak loads in extreme scenarios, and a device.
    Type: Application
    Filed: November 25, 2025
    Publication date: June 25, 2026
    Inventors: Nian LIU, Kai Jiang, Jiye Wang, Lin Yang, Wen Tang, Yuzhong Li, Xinwei Wang, Lei Wang
  • Publication number: 20260177921
    Abstract: Organometallic precursors are described for the formation of high resolution lithography patterning coatings based on metal oxide hydroxide chemistry. The precursor compositions generally comprise ligands readily hydrolysable by water vapor or other OH source composition under modest conditions. The organometallic precursors generally comprise a radiation sensitive organo ligand to tin that can result in a coating that can be effective for high resolution patterning at relatively low radiation doses and is particularly useful for EUV patterning. The precursors compositions are readily processable under commercially suitable conditions. Solution phase processing with in situ hydrolysis or vapor based deposition can be used to form the coatings.
    Type: Application
    Filed: February 16, 2026
    Publication date: June 25, 2026
    Inventors: Stephen T. Meyers, Jeremy T. Anderson, Brian J. Cardineau, Joseph B. Edson, Kai Jiang, Douglas A. Keszler, Alan J. Telecky
  • Publication number: 20260170577
    Abstract: Provided are a method for zonal joint peak shaving dispatch considering a day-ahead operation security domain, a device, a medium, and a product.
    Type: Application
    Filed: November 25, 2025
    Publication date: June 18, 2026
    Inventors: Nian LIU, Kai JIANG, Jiye WANG, Kunyu WANG, Diangang HU, Wen TANG, Zongyang LIU, Zhewei ZHANG, Lei WANG
  • Publication number: 20260155652
    Abstract: Provided are a method for generating an installed capacity of a power system, a device, a medium, and a product. The method includes: acquiring an expected upper limit of a one-time investment coefficient and an expected lower limit of a new energy consumption rate for a target power system; determining an installed capacity of the target power system by using a power system installed capacity generation model. The installed capacity is defined by an installed capacity upper bound and an installed capacity lower bound, and the power system installed capacity generation model is obtained by training a Convolutional Neural Network (CNN)-Bidirectional Long Short-Term Memory (BiLSTM)-Bidirectional Gated Recurrent Unit (BiGRU) neural network model using a training dataset. The training dataset is established using a multi-objective coronavirus disease optimization algorithm and a wave search algorithm.
    Type: Application
    Filed: November 26, 2025
    Publication date: June 4, 2026
    Inventors: Nian LIU, Kai JIANG, Yurou JIANG, Jie HUANG, Zhen WANG, Lei WANG
  • Publication number: 20260154762
    Abstract: Provided are a method for regulating a wind-photovoltaic-storage power station based on electricity, green certificate, and carbon price prediction, a device, a medium, and a product.
    Type: Application
    Filed: November 26, 2025
    Publication date: June 4, 2026
    Inventors: Nian LIU, Kai Jiang, Jie Huang, Zhen Wang, Lei Wang, Yangyang Liu
  • Publication number: 20260154478
    Abstract: Provided are a method for power production simulation and configuration optimization based on numerical simulation, a device, and a product.
    Type: Application
    Filed: November 25, 2025
    Publication date: June 4, 2026
    Inventors: Nian LIU, Kai JIANG, Jie HUANG, Zhen WANG, Lei WANG
  • Publication number: 20260144845
    Abstract: The present disclosure provides a pharmaceutical composition comprising an echinocandin analog and a preparation method for the pharmaceutical composition. Specifically, the present disclosure provides a pharmaceutical composition, comprising a compound represented by formula (I) or a pharmaceutically acceptable salt thereof, a solubilizer, and a buffer. The composition has excellent stability.
    Type: Application
    Filed: October 25, 2023
    Publication date: May 28, 2026
    Inventors: Yingfang FAN, Linmao YE, Hao CHEN, Dong AN, Qingqing MENG, Kai JIANG
  • Publication number: 20260128705
    Abstract: The present disclosure provides protection apparatus and methods for a driver. An example protection apparatus includes a meter, a loop unit, and a controller. The detection unit is configured to detect a current flowing through an inverter unit. The loop unit is configured to connect a positive terminal to a negative terminal of a DC bus or disconnect the positive terminal from the negative terminal of o the DC bus. The control unit is configured to, in response to power on of the driver, control the loop unit to connect the DC bus, and determine, based on a detection result of the detection unit, whether a three-phase AC power is connected to the three-phase motor wiring terminal, wherein in the case that a three-phase AC power is connected to the three-phase motor wiring terminal, the control unit stops.
    Type: Application
    Filed: September 30, 2022
    Publication date: May 7, 2026
    Applicant: Siemens Aktiengesellschaft
    Inventors: Kai Jiang, Yu Xu
  • Publication number: 20260109722
    Abstract: Patterning compositions are described based on organo tin dodecamers with hydrocarbyl ligands, oxo ligands, hydroxo ligands and carboxylato ligands. Alternative dodecamer embodiments have organo tin ligands in place of hydrocarbyl ligands. The organo tin ligands can be incorporated into the dodecamers from a monomer with the structure (RCC)3SnQ, where R is a hydrocarbyl group and Q is a alkyl tin moiety with a carbon bonded to the Sn atom of the monomer and with a Sn bonded as a replacement of a quaternary carbon atom with bonds to 4 carbon atoms. Some or all of the carboxylato and hydroxyl ligands can be replaced with fluoride ions. Good EUV patterning results are obtained with the dodecamer based patterning compositions.
    Type: Application
    Filed: December 11, 2025
    Publication date: April 23, 2026
    Inventors: Brian J. Cardineau, William Earley, Stephen T. Meyers, Kai Jiang, Jeremy T. Anderson
  • Patent number: 12578646
    Abstract: Organometallic precursors are described for the formation of high resolution lithography patterning coatings based on metal oxide hydroxide chemistry. The precursor compositions generally comprise ligands readily hydrolysable by water vapor or other OH source composition under modest conditions. The organometallic precursors generally comprise a radiation sensitive organo ligand to tin that can result in a coating that can be effective for high resolution patterning at relatively low radiation doses and is particularly useful for EUV patterning. The precursors compositions are readily processable under commercially suitable conditions. Solution phase processing with in situ hydrolysis or vapor based deposition can be used to form the coatings.
    Type: Grant
    Filed: March 17, 2025
    Date of Patent: March 17, 2026
    Assignee: Inpria Corporation
    Inventors: Stephen T. Meyers, Jeremy T. Anderson, Brian J. Cardineau, Joseph B. Edson, Kai Jiang, Douglas A. Keszler, Alan J. Telecky
  • Publication number: 20260036901
    Abstract: Organometallic precursor solutions containing one or more phosphonate, such as methylphosphonic acid, tert-butylphosphonic acid, diethoxyalyllphosphonate, benzylphosphonic acid, and phenylphosphonic acid, are described. Corresponding methods for forming radiation patternable coatings as well as methods for forming a pattern using a solventless developing process are also described. The incorporation of a phosphonate into an organometallic photoresist composition, such as an organotin photoresist composition, is described as a way to increase stability of organometallic precursor solutions, to improve the homogeneity of organometallic photoresist films, and/or to improve the patterning performance of organometallic photoresist coatings.
    Type: Application
    Filed: July 29, 2025
    Publication date: February 5, 2026
    Inventors: Matthew Voss, Brian J. Cardineau, Kai Jiang, Fabian Felix Eberle
  • Patent number: 12522621
    Abstract: Patterning compositions are described based on organo tin dodecamers with hydrocarbyl ligands, oxo ligands, hydroxo ligands and carboxylato ligands. Alternative dodecamer embodiments have organo tin ligands in place of hydrocarbyl ligands. The organo tin ligands can be incorporated into the dodecamers from a monomer with the structure (RCC)3SnQ, where R is a hydrocarbyl group and Q is a alkyl tin moiety with a carbon bonded to the Sn atom of the monomer and with a Sn bonded as a replacement of a quaternary carbon atom with bonds to 4 carbon atoms. Some or all of the carboxylato and hydroxyl ligands can be replaced with fluoride ions. Good EUV patterning results are obtained with the dodecamer based patterning compositions.
    Type: Grant
    Filed: July 22, 2024
    Date of Patent: January 13, 2026
    Assignee: Inpria Corporation
    Inventors: Brian J. Cardineau, William Earley, Stephen T. Meyers, Kai Jiang, Jeremy T. Anderson
  • Publication number: 20250383605
    Abstract: Patterning of organometallic radiation sensitive compositions is facilitated using alkylsulfonic acid developer compositions and patterning methods. The alkylsulfonic acid developer compositions comprise an alkylsulfonic acid composition and a solvent, such as water or an organic solvent. In some embodiments, contact with an alkylsulfonic acid developer composition can be performed on an organometallic composition having a latent image to form a developed, physical pattern. The latent image may be formed by irradiation of an organometallic composition with a pattern of radiation, such as EUV radiation. In some embodiments, contact with an alkylsulfonic acid developer composition can be performed on an organometallic composition having a physical pattern to form a higher contrast, descummed pattern.
    Type: Application
    Filed: June 17, 2025
    Publication date: December 18, 2025
    Inventors: Matthew Voss, Kai Jiang
  • Patent number: 12487522
    Abstract: Organometallic radiation resist compositions are described based on tin ions with alkyl ligands. Some of the compositions have branched alkyl ligands to provide for improved patterning contrast while maintaining a high degree of solution stability. Blends of compounds with distinct alkyl ligands can provide further improvement in the patterning. High resolution patterning with a half-pitch of no more than 25 nm can be achieved with a line width roughness of no more than about 4.5 nm. Synthesis techniques have been developed that allow for the formation of alkyl tin oxide hydroxide compositions with very low metal contamination.
    Type: Grant
    Filed: April 12, 2024
    Date of Patent: December 2, 2025
    Assignee: Inpria Corporation
    Inventors: Stephen T. Meyers, Jeremy T. Anderson, Joseph B. Edson, Kai Jiang, Douglas A. Keszler, Michael K. Kocsis, Alan J. Telecky, Brian J. Cardineau
  • Publication number: 20250341780
    Abstract: Developer compositions are described based on blends of solvents, in which the developers are particularly effective for EUV patterning using organometallic based patterning compositions. Methods for use of these developing compositions are described. The blends of solvents can be selected based on Hansen solubility parameters. Generally, one solvent has low polarity as express by the sum of ?P+?H, and a second solvent component of the developer has a higher value of ?P+?H. Corresponding solvent compositions are described.
    Type: Application
    Filed: July 11, 2025
    Publication date: November 6, 2025
    Inventors: Kai Jiang, Brian J. Cardineau, Lauren B. McQuade, Jeremy T. Anderson, Stephen T. Meyers, Michael Kocsis, Amrit K. Narasimhan