Abstract: A multi-beam charged particle system is configured for selecting a first and a second, different image acquisition property, and for acquiring a first image and a second image of a surface of a wafer with a plurality of primary charged particle beamlets. The multi-beam charged particle system is configured for image processing of the first and the second images to obtain at least one processed image. The technology can be used in applications of multi-beam charged particle system, where relatively high beam uniformity and throughput are often desirable. A corresponding method is disclosed. The system and method can yield improved image contrast.

Abstract: A multi-beam charged particle system is configured to execute a series of image acquisitions at a series of inspection sites and for determining an adjustment of an image acquisition at a subsequent inspection from previous image acquisitions at previous inspection sites. The disclosure can be applied, for example, to multi-beam charged particle beam system for high-throughput wafer inspection tasks. A method of operating a multi-beam charged particle system is provided. The system and method can exhibit improved throughput.

Abstract: Method and systems are provided for automatically generating a volume model of correction data for an X-ray based medical imaging device. A plurality of X-ray images is recorded of a body region of a patient to be examined from different positions in each case. The plurality of X-ray images is used to generate a first volume model of the body region. Image artifacts are corrected in the first volume model using the plurality of X-ray images and thus a corrected volume model is generated. The corrected volume model is used to determine a contour of an artifact volume affected by image artifacts in the first volume model and the contour of the artifact volume is defined as a volume model of correction data. The volume model of correction data is stored on a data medium and/or output via an interface.

Abstract: The system described herein relates to a particle beam apparatus for analyzing and/or for processing an object and to a method for operating a particle beam apparatus. The particle beam apparatus is designed for example as an electron beam apparatus and/or an ion beam apparatus. The particle beam apparatus comprises a beam deflection device, for example an objective lens, which is provided with a first coil and a second coil. The first coil is operated with a first coil current. The second coil is operated with a second coil current. The first coil current and/or the second coil current may always be controlled in such a way that the sum of the first coil current and the second coil current (the summation current) or the difference between the first coil current and the second coil current (the difference current) is controlled to a setpoint value.

Abstract: The system described herein relates to a particle beam apparatus for analyzing and/or for processing an object and to a method for operating a particle beam apparatus. The particle beam apparatus is designed for example as an electron beam apparatus and/or an ion beam apparatus. The particle beam apparatus comprises a beam deflection device, for example an objective lens, which is provided with a first coil and a second coil. The first coil is operated with a first coil current. The second coil is operated with a second coil current. The first coil current and/or the second coil current may always be controlled in such a way that the sum of the first coil current and the second coil current (the summation current) or the difference between the first coil current and the second coil current (the difference current) is controlled to a setpoint value.

Abstract: A particle beam device comprises a beam generator for generating a particle beam having charged particles and an electrode unit having a first electrode and a second electrode, wherein the first electrode interacts with the second electrode, in particular for guiding, shaping, aligning or correcting the particle beam. Moreover, the particle beam device comprises a low-pass filter being connected with at least one of: the first electrode and the second electrode, using an electrical connection. Additionally, the particle beam device comprises a mounting unit having an opening for the passage of the particle beam, wherein the at least one low-pass filter, the first electrode and the second electrode are arranged at the mounting unit. The electrode unit may comprise more than two electrodes, for example up to 16 electrodes.