Abstract: A method for patterning a radiation sensitive material on a substrate involves the development of a material on a substrate based on a latent image in the material with irradiated regions and non-irradiated regions to form a physically patterned material on the substrate, in which the material comprises an organotin radiation sensitive patterning material and an additive. The additive is a photoacid generator, a quencher or a mixture thereof. Patterning improvements can be achieved using a series of a baking and development step followed by a second baking at a higher temperature and a second development step following the second baking step. A precursor solution for forming an organometallic radiation patterning material can comprise an organic solvent, a dissolved organotin composition having C—Sn bonds that can cleave in response to EUV radiation, and a quencher. The additive can comprise an onium cation.

Abstract: The invention relates to a method of producing nanostructures in membranes, in which method a membrane consisting of a polymer material is irradiated with charged particles, especially ions, to produce particle tracks. The particle tracks in the membrane are etched using an etching liquid and the etching operation is stopped using a stop liquid, in such a manner that asymmetrical structures are formed. Polyimide is used as the membrane material.

Abstract: The invention relates to a method of producing nanostructures in membranes, in which method a membrane consisting of a polymer material is irradiated with charged particles, especially ions, to produce particle tracks. The particle tracks in the membrane are etched using an etching liquid and the etching operation is stopped using a stop liquid, in such a manner that asymmetrical structures are formed. Polyimide is used as the membrane material.