Patents by Inventor Kai-Yuan CHI

Kai-Yuan CHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SOFTWARE, METHODS, AND SYSTEMS FOR DETERMINATION OF A LOCAL FOCUS POINT
    Publication number: 20240355578
    Abstract: Disclosed are non-transitory computer-readable media, systems, and computer-implemented methods that describe obtaining hot spot (HS) location information with respect to a printed pattern; obtaining LFP search criteria for searching the printed pattern to determine a local focus point (LFP) for an imaging device; selecting a HS area in the printed pattern that contains a HS; and determining the LFP proximate to the HS area based on the LFP search criteria, the LFP not containing the HS.
    Type: Application
    Filed: July 2, 2024
    Publication date: October 24, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Te-Sheng WANG, Szu-Po WANG, Kai-Yuan CHI
  • Method for detecting defect in pattern
    Patent number: 9542740
    Abstract: Provided is a method of detecting a defect of a pattern using vectorization to increase accuracy and efficiency in OPC modeling and OPC verification. The method includes acquiring a target layout image associated with a target pattern, acquiring a pattern image associated with a pattern formed on a substrate, extracting an edge image from the pattern image, producing a first vector form based on the target layout image, producing a second vector form based on the edge image, and comparing the first vector form with the second vector form.
    Type: Grant
    Filed: July 15, 2014
    Date of Patent: January 10, 2017
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Ki-Hyun Kim, Kai-Yuan Chi, Dmitry Vengertsev, Seung-Hune Yang
  • METHOD FOR DETECTING DEFECT IN PATTERN
    Publication number: 20150131891
    Abstract: Provided is a method of detecting a defect of a pattern using vectorization to increase accuracy and efficiency in OPC modeling and OPC verification. The method includes acquiring a target layout image associated with a target pattern, acquiring a pattern image associated with a pattern formed on a substrate, extracting an edge image from the pattern image, producing a first vector form based on the target layout image, producing a second vector form based on the edge image, and comparing the first vector form with the second vector form.
    Type: Application
    Filed: July 15, 2014
    Publication date: May 14, 2015
    Inventors: Ki-Hyun KIM, Kai-Yuan CHI, Dmitry VENGERTSEV, Seung-Hune YANG