Patents by Inventor Kaijun Leo Zhang

Kaijun Leo Zhang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and process for deposition of thin film on semiconductor substrate while inhibiting particle formation and deposition
    Patent number: 6127286
    Abstract: Gaseous reactants capable of depositing a thin film on a semiconductor substrate are introduced into a deposition zone of a deposition apparatus through a gaseous reactants dispersion apparatus having rounded corners and smoothed anodized surfaces and maintained at a temperature ranging from about 70.degree. C. to about 85.degree. C., and preferably from about 75.degree. C. to about 80.degree. C., to inhibit the deposition and accumulation on such surfaces of charged materials capable of generating particles which may cause damage to the semiconductor substrate.
    Type: Grant
    Filed: May 11, 1998
    Date of Patent: October 3, 2000
    Assignee: LSI Logic Corporation
    Inventors: Kaijun Leo Zhang, Wilbur C. Catabay, Ming-Yi Lee