Abstract: A photolithography method includes: sequentially preparing a functional film layer, a reflective auxiliary imaging film layer and a first photoresist layer which are stacked, on a photolithography substrate; performing photolithography on the first photoresist layer to obtain a first photolithography structure; etching the reflective auxiliary imaging film layer with the first photolithography structure as a masking layer; on the pattern of the reflective auxiliary imaging film layer, sequentially preparing a second photoresist layer and a transmissive auxiliary imaging film layer which stacked; performing surface plasmon photolithography with the pattern of the reflective auxiliary imaging film layer as a mask, removing the transmissive auxiliary imaging film layer, and then developing the second photoresist layer, to obtain a second photolithography structure; and etching the functional film layer, with the second photolithography structure as a masking layer, to obtain a third photolithography structure.

Abstract: To stably heat aerosol-forming substrates in a smoking device cartridge used for an induction heating type smoking device. A smoking device cartridge (1) to be mounted in an induction heating type smoking device (70) for use includes aerosol-forming substrates (10) and a mouthpiece (30) located coaxially with the aerosol-forming substrates (10). The smoking device cartridge (1) includes a first susceptor (20) containing a first magnetic material (20a) and a second susceptor (25) containing a second magnetic material (25a). The first susceptor (20) is located inside the aerosol-forming substrates (10) to enable heating of the aerosol-forming substrates (10). The second susceptor (25) is spaced apart from the first susceptor (20), or is in contact with the first susceptor (20). A Curie temperature of the second magnetic material (25a) is higher than a Curie temperature of the first magnetic material (20a).

Abstract: A method for preparing a metal-dielectric strip array based super-resolution lens includes: performing lithography on a first material layer on a first substrate to obtain a grating structure; alternately depositing second and third material layers until the grating structure is filled up, to obtain a first transition structure, one of the second and third material layers being of metal, and the other one being of dielectric; performing planarization on the first transition structure at least reach the top of the grating structure, to obtain a second transition structure; adhering an upper surface of the second transition structure to a second substrate; removing the first substrate, and performing overturning to make the second transition structure be on the second substrate to obtain a third transition structure; and performing planarization again to at least reach the top of finally deposited second or third material layer, to obtain the super-resolution lens.

Abstract: A smoking device cartridge 10 is mounted in an induction heating type smoking device for use. The smoking device cartridge 10 includes an aerosol-forming substrate 12 having a predetermined extending direction and a predetermined circumferential direction, the aerosol-forming substrate 12 containing tobacco or non-tobacco plants as raw materials; a susceptor 13 located along the extending direction in the aerosol-forming substrate 12, the susceptor 13 being configured to be inductively heatable; a packaging member 16 covering the aerosol-forming substrate 12 along the circumferential direction; and a first support member 11 being in contact with the packaging member 16, the first support member 11 supporting one end of the aerosol-forming substrate 12 in the extending direction, the aerosol-forming substrate 12 including the susceptor 13 in the aerosol-forming substrate 12. The smoking device cartridge 10 has a gap G between the first support member 11 and the packaging member 16.

Abstract: A method for preparing a super-resolution lens based on a metal-dielectric strip array, the method comprising: performing lithography on a first material layer (3) on a first substrate (1) to obtain a grating structure (S1); alternately depositing a second material layer (5) and a third material layer (6) until the grating structure is filled up and becomes even, so as to obtain a first transition structure, wherein one of the second material layer (5) and the third material layer (6) is metal, and the other one is dielectrics (S2); performing planarization on the first transition structure, wherein the planarization depth at least reaches the top of the grating structure, so as to obtain a second transition structure (S3); curing an upper surface of the second transition structure and a second substrate (9) (S4); removing the first substrate (1), so as to transfer the second transition structure onto the second substrate (9) to obtain a third transition structure (S5); and performing planarization again, whe

Abstract: A photolithography method includes: sequentially preparing a functional film layer, a reflective auxiliary imaging film layer and a first photoresist layer which are stacked, on a photolithography substrate; performing photolithography on the first photoresist layer to obtain a first photolithography structure; etching the reflective auxiliary imaging film layer with the first photolithography structure as a masking layer; on the pattern of the reflective auxiliary imaging film layer, sequentially preparing a second photoresist layer and a transmissive auxiliary imaging film layer which stacked; performing surface plasmon photolithography with the pattern of the reflective auxiliary imaging film layer as a mask, removing the transmissive auxiliary imaging film layer, and then developing the second photoresist layer, to obtain a second photolithography structure; and etching the functional film layer, with the second photolithography structure as a masking layer, to obtain a third photolithography structure.

Abstract: A smoking device cartridge 10 is mounted in an induction heating type smoking device for use. The smoking device cartridge 10 includes an aerosol-forming substrate 12 having a predetermined extending direction and a predetermined circumferential direction, the aerosol-forming substrate 12 containing tobacco or non-tobacco plants as raw materials; a susceptor 13 located along the extending direction in the aerosol-forming substrate 12, the susceptor 13 being configured to be inductively heatable; a packaging member 16 covering the aerosol-forming substrate 12 along the circumferential direction; and a first support member 11 being in contact with the packaging member 16, the first support member 11 supporting one end of the aerosol-forming substrate 12 in the extending direction, the aerosol-forming substrate 12 including the susceptor 13 in the aerosol-forming substrate 12. The smoking device cartridge 10 has a gap G between the first support member 11 and the packaging member 16.

Abstract: A method for etching a curved substrate is provided, including: forming a conductive thin film layer with an etched pattern on the curved substrate; supplying power to the conductive thin film layer such that the conductive thin film layer has an equal potential at each position of the conductive thin film layer; etching each position of the curved substrate to an etching depth corresponding to the potential at each position of the conductive thin film layer based on the etched pattern of the conductive thin film layer, so as to obtain the curved substrate having a consistent etching depth at each position of the curved substrate. With the etching method, it is possible to etch an arbitrary curved surface to obtain a microstructure with a uniform processing depth.

Abstract: A method for etching a curved substrate is provided, including: forming a conductive thin film layer with an etched pattern on the curved substrate; supplying power to the conductive thin film layer such that the conductive thin film layer has an equal potential at each position of the conductive thin film layer; etching each position of the curved substrate to an etching depth corresponding to the potential at each position of the conductive thin film layer based on the etched pattern of the conductive thin film layer, so as to obtain the curved substrate having a consistent etching depth at each position of the curved substrate. With the etching method, it is possible to etch an arbitrary curved surface to obtain a microstructure with a uniform processing depth.

Abstract: Provided are apparatuses and methods for super resolution imaging photolithography. An exemplary apparatus may include an illumination light generation device configured to generate illumination light for imaging a pattern included in a mask through the mask. The illumination light may include a high-frequency spatial spectrum such that a high-frequency evanescent wave component of spatial spectrum information for the light is converted to a low-frequency evanescent wave component after being transmitted through the mask pattern. For example, the illumination light generation device may be configured to form the illumination in accordance with a high numerical aperture (NA) illumination mode and/or a surface plasmon (SP) wave illumination mode.

Abstract: Provided are apparatuses and methods for super resolution imaging photolithography. An exemplary apparatus may include an illumination light generation device configured to generate illumination light for imaging a pattern included in a mask through the mask. The illumination light may include a high-frequency spatial spectrum such that a high-frequency evanescent wave component of spatial spectrum information for the light is converted to a low-frequency evanescent wave component after being transmitted through the mask pattern. For example, the illumination light generation device may be configured to form the illumination in accordance with a high numerical aperture (NA) illumination mode and/or a surface plasmon (SP) wave illumination mode.